GB2343992B - High density plasmas - Google Patents

High density plasmas

Info

Publication number
GB2343992B
GB2343992B GB9825324A GB9825324A GB2343992B GB 2343992 B GB2343992 B GB 2343992B GB 9825324 A GB9825324 A GB 9825324A GB 9825324 A GB9825324 A GB 9825324A GB 2343992 B GB2343992 B GB 2343992B
Authority
GB
United Kingdom
Prior art keywords
high density
density plasmas
plasmas
density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB9825324A
Other versions
GB9825324D0 (en
GB2343992A (en
Inventor
Michael John Thwaites
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasma Quest Ltd
Original Assignee
Plasma Quest Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Quest Ltd filed Critical Plasma Quest Ltd
Priority to GB9825324A priority Critical patent/GB2343992B/en
Publication of GB9825324D0 publication Critical patent/GB9825324D0/en
Publication of GB2343992A publication Critical patent/GB2343992A/en
Application granted granted Critical
Publication of GB2343992B publication Critical patent/GB2343992B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
GB9825324A 1998-11-20 1998-11-20 High density plasmas Expired - Lifetime GB2343992B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9825324A GB2343992B (en) 1998-11-20 1998-11-20 High density plasmas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9825324A GB2343992B (en) 1998-11-20 1998-11-20 High density plasmas

Publications (3)

Publication Number Publication Date
GB9825324D0 GB9825324D0 (en) 1999-01-13
GB2343992A GB2343992A (en) 2000-05-24
GB2343992B true GB2343992B (en) 2001-06-20

Family

ID=10842685

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9825324A Expired - Lifetime GB2343992B (en) 1998-11-20 1998-11-20 High density plasmas

Country Status (1)

Country Link
GB (1) GB2343992B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2419894B (en) 2004-10-22 2009-08-26 Plasma Quest Ltd Sputtering system
GB201006567D0 (en) 2010-04-20 2010-06-02 Plasma Quest Ltd High density plasma source
CN107779836B (en) * 2017-12-08 2019-12-03 合肥鑫晟光电科技有限公司 A kind of magnetic control sputtering device and its Distribution of Magnetic Field adjusting method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0064288A1 (en) * 1981-05-04 1982-11-10 Optical Coating Laboratory, Inc. Method and apparatus for the production and utilization of activated molecular beams
EP0489407A2 (en) * 1990-12-03 1992-06-10 Applied Materials, Inc. Plasma reactor using UHF/VHF resonant antenna source, and processes
EP0774886A1 (en) * 1995-11-15 1997-05-21 Applied Materials, Inc. Method and apparatus for generating a plasma
EP0790328A1 (en) * 1996-02-13 1997-08-20 The BOC Group plc Thin film deposition
EP0837490A2 (en) * 1996-10-17 1998-04-22 Applied Materials, Inc. A method to eliminate coil sputtering in an inductively coupled plasma (ICP) source

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0064288A1 (en) * 1981-05-04 1982-11-10 Optical Coating Laboratory, Inc. Method and apparatus for the production and utilization of activated molecular beams
EP0489407A2 (en) * 1990-12-03 1992-06-10 Applied Materials, Inc. Plasma reactor using UHF/VHF resonant antenna source, and processes
EP0774886A1 (en) * 1995-11-15 1997-05-21 Applied Materials, Inc. Method and apparatus for generating a plasma
EP0790328A1 (en) * 1996-02-13 1997-08-20 The BOC Group plc Thin film deposition
EP0837490A2 (en) * 1996-10-17 1998-04-22 Applied Materials, Inc. A method to eliminate coil sputtering in an inductively coupled plasma (ICP) source

Also Published As

Publication number Publication date
GB9825324D0 (en) 1999-01-13
GB2343992A (en) 2000-05-24

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PE20 Patent expired after termination of 20 years

Expiry date: 20181119