GB2314170A - Alignment layers for liquid crystal devices - Google Patents
Alignment layers for liquid crystal devices Download PDFInfo
- Publication number
- GB2314170A GB2314170A GB9718617A GB9718617A GB2314170A GB 2314170 A GB2314170 A GB 2314170A GB 9718617 A GB9718617 A GB 9718617A GB 9718617 A GB9718617 A GB 9718617A GB 2314170 A GB2314170 A GB 2314170A
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- United Kingdom
- Prior art keywords
- photo
- irradiating
- alignment layer
- light
- process according
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
A photo-irradiating apparatus comprises a UV lamp (21) for generating UV light, a lens (22), a polarizer (23) in which the UV light is linearly polarized, and a substrate (24) exposed by the linearly polarized UV light. The UV lamp, the lens, and the polarizer are arranged in a line. The UV light is irradiated onto an alignment layer (25) and may be moved by a scan motor so as to irradiate uniformly the whole area of the alignment layer (25). In addition, the light may be obliquely irradiated onto the alignment layer (25) so that the area exposed by the light is enlarged.
Description
AN ULTRAVIOLET IRRADIATING DEVICE
FOR PHOTO-ALIGNMENT PROCESS
AND AN IRRADIATING METHOD USING THE SAME
The present invention relates to an ultraviolet irradiating device, and more particularly, but not exclusively, to an apparatus for a photo-alignment process in which the UV light is uniformly and widely irradiated to the alignment layer to obtain a large size liquid crystal display.
A conventionally used liquid crystal display is mainly a twisted nematic liquid crystal display (referred to as TNLCD), which has a changeable transmittance at each gray level according to the viewing angle. In particular, while the transmittance is symmetrical in the horizontal direction, the transmittance is asymmetrical in the vertical direction. Therefore, in the vertical direction, an inverted image phenomenon occurs so that the vertical viewing angle becomes very limited.
To overcome said problem, a multi-domain liquid crystal cell in which a pixel is divided into more than two pretilts, the pretilt defining pretilt angle and pretilt direction, has been introduced.
However, manufacturing said multi-domain liquid crystal cell by the conventional method, a reverse rubbing method, is too complicated because it comprises the following steps: the entire alignment layer is rubbed in a first rubbing direction; a photoresist as a mask is applied for blocking one domain; then the other domain is rubbed at the reverse direction to said first rubbing direction; and finally the photoresist is removed. By using a reverse rubbing process, dust and/or an electrostatic discharge is generated, so the productivity is reduced and/or the thin film transistor which drives a pixel is damaged. In addition, to eliminate completely the image inversion phenomenon, each pixel is divided into more than 4 domains. However, it is difficult to fabricate 4-domain liquid crystal cell by this reverse rubbing technique.
As another alignment method, a photo-alignment method is used. In this method, since the pretilt, defining a pretilt angle and a pretilt angle direction, is determined on the alignment layer by irradiating UV light instead of by a rubbing process, the fabricating process is simple and the damage of the substrate can be prevented. By irradiating a light into the alignment layer including a photopolymer, the photopolymer is photopolymerized by cross linking generated between the polymers.
Thereby, a pretilt on the alignment layer is determined according to the direction and the degree of cross linking of the photopolymers, the cross linking depending on the polarization direction and incident direction of the light, and photo-energy of the light absorbed into the alignment layer. In other words, the direction and the magnitude of the pretilt are determined according to the polarization direction of the UV light and the photo-energy absorbed into the alignment layer. Indeed, to make a multi-domain liquid crystal cell, each domain is respectively exposed by UV light having a different polarization direction and a different photo-energy.
Therefore, it is important to conform the uniformity of photo-energy absorbed into the alignment layer as well as the size of the spot of the light to make a large size liquid crystal display.
FIG. 1 is a view showing the conventional UV light irradiating apparatus. In FIG.1, the UV light generated from a UV lamp 1 is focused by a lens 2 and then linearly polarized by a polarizer 3. These elements are arranged in a line with a substrate. The substrate 4, coated with an alignment layer 5 which can be photo reacted, is exposed by the circular spot of the UV light, so that a pretilt is given to the alignment layer 5 formed on the substrate 4.
When irradiating UV light to the alignment layer by the conventional UV irradiating apparatus, however, the size of the UV lamp 1 is limited, so the exposed circular area 6 on the alignment layer 5 is also small as shown in FIG.
2a. In addition, to get a uniform pretilt on the alignment layer, the available alignment layer size is smaller than the area corresponding to the plateau of the graph of FIG. 2b having a uniform photo-energy, but the area is restricted by the lamp size.
Accordingly, it is difficult to employ this UV irradiating apparatus for a large liquid crystal display. In addition, there is a problem that the UV light cannot be uniformly irradiated onto the entire alignment layer, so that the absorbed energy on the whole alignment layer is not uniform.
It is an object of the present invention to provide an ultraviolet light irradiating apparatus for a photo-alignment process which can be used in a large size liquid crystal display.
It is another object of the present invention to provide a method for irradiating ultraviolet light onto an alignment layer to provide a uniform photo-energy absorbed into the alignment layer for a large size liquid crystal display.
In one embodiment, the UV irradiating apparatus comprises a UV lamp generating UV light, a lens and a polarizer in which the UV light is linearly polarized. The apparatus is used to irradiate a substrate coated with an alignment layer including a photo-reacting polymer such as polysiloxane based materials.
The UV lamp, the lens, and the polarizer are arranged in a line, above the substrate. The UV light is irradiated to the substrate at a certain angle with respect to the substrate. Accordingly, the alignment layer is exposed by an elliptical spot of UV light, which provides a larger exposed area than a conventional circular dot.
In one embodiment, the UV lamp, the lens, and the polarizer are mounted into a casing and moved above the substrate by a scan motor so as to scan uniformly the whole area of the alignment layer. The irradiated spot of light is moved from one end of the alignment layer to the other end of the alignment layer, so as to provide uniformity of irradiation even to the peripheral alignment layer. After the irradiated spot has scanned one line across the alignment layer, the spot of light is moved to the next line, the distance between adjacent lines being less than or equal to Smm which guarantees a beam uniformity. Thereby, the photo-energy absorbed into the whole alignment layer is uniform.
For a better understanding of the invention, embodiments will now be described by way of example, with reference to the accompanying drawings, in which:
FIG. 1 is a view showing the conventional UV light irradiating apparatus for a photo-alignment process.
FIG. 2a is a plan view showing the spot of the UV light irradiated onto the alignment layer when the conventional UV light irradiating apparatus of FIG. 1 is used.
FIG. 2b is a graph showing a photo-energy according to the alignment layer area of FIG. 2a.
FIG. 3 is a view showing a first embodiment of the UV light irradiating apparatus according to the present invention.
FIG. 4a is a plan view showing the spot of the UV light irradiated onto the alignment layer when the UV light irradiating apparatus of FIG. 3 is used.
FIG. 4b is a graph showing the photo-energy according to the alignment layer area of FIG. 4a.
FIG. 5 is a view showing a second embodiment of the UV light irradiating apparatus according to the present invention.
FIG. 6a is a plan view showing the exposed area of the UV light irradiated onto the alignment layer when the UV light irradiating apparatus of FIG. 5 is used.
FIG. 6b is a graph showing the photo-energy according to the alignment layer area of FIG. 6a.
FIG. 3 is a view showing a first embodiment of the present invention. The UV light is generated from a UV lamp 11, for example, a Hg lamp, and focused by a lens 12. This focused UV light is polarized by a polarizer 13 and irradiated to the substrate 14 on which a photo-reacting alignment layer 15 is coated. The UV lamp 11, the lens 12, and the polarizer 13 are arranged in a line and they are slanted of an angle 0 with respect to the substrate 14. Namely, the alignment layer 15 coated on the substrate 14 is exposed with elliptical spot 16 of the light as shown in FIG. 4a. Therefore, the exposed area 16 in the alignment layer 15 is larger than conventional area 6 in accordance with the slanted angle 0. To get the larger exposed area 16, the irradiation direction is more slanted with respect to the alignment layer 15.
In FIG. 4b 'S' indicates the range over which uniform photo-energy is irradiated by the lamp, and 'A' indicates the range of the alignment layer. The range corresponding to spot of the light S covers the range of alignment layer A.
Therefore, the whole alignment layer A is exposed with the elliptical spot S having uniform photo-energy, the spot S being larger than a conventional circle spot of the light.
FIG. 5 isa view showing a second embodiment of the present invention. In this embodiment, the UV lamp 21, the lens 22, and the polarizer 23 are mounted into the casing 20. The casing 20 is moved above a substrate 24 coated with photoreacting alignment layer 25 by a scan motor (not shown) to scan the whole area of the alignment layer 25. Alternatively, the substrate 24 may be moved by the scan motor, while the casing remains stationary. In either case, the whole area of the substrate is uniformly exposed by the moving UV light and given a uniform photo-energy, so that a pretilt determined on the alignment layer is uniform.
One method for scanning the UV light into the alignment layer 25 is shown in
FIG. 6a. If the irradiating direction is perpendicular to the substrate, the spot 26 of the light is circular. The start spot SXlyl for irradiating UV light is a tangent between extension lines from a first horizontal line Sxl and a first vertical line S of the alignment layer 25.
In addition, the end spot SxDyn for irradiating UV light is a tangent between extension lines from a last horizontal line Sxn and a last vertical line S,, of the alignment layer 25.
More particularly, the start spot Sx,yl is moved along with the first horizontal line Sxl until the spot passes the last vertical line S,,, then the spot is moved down in the direction of the last vertical line Syn in an interval retaining the beam uniformity, such as 5mm. In the second line Sx2, the spot is moved in the reverse direction to the previous moving direction. The spot 26 of UV light is continuously moved until it reaches the last spot SxDy,, in the last horizontal line Sxn. Thereby, every area in the alignment layer 16 is exposed with the same amount of the UV light spot 26.
The photo-energy absorbed into the range A of the alignment layer is uniform, as shown in FIG. 6b, because the spot is overlapped the same number of times throughout the range A by movement of scan motor. Thereby, a large size liquid crystal display can be fabricated.
Although in said embodiments, polarized light is used to provide photo-energy onto the alignment layer, unpolarized light can be adopted simply by removing a polarizer from the irradiating apparatus.
In addition, to obtain a multi-domain liquid crystal display in which each domain has a different pretilt, the polarizer is rotated to form each domain. Thus, a domain of the alignment layer 15 has a pretilt determined by irradiating a UV light having a particular polarization direction just onto the certain domain using a mask. The other domain is also exposed by UV light having a different polarization direction from the initially irradiated UV light by rotating the polarizer, so that a multi-domain liquid crystal cell such as two-domain or fourdomain liquid crystal cell, etc, can be obtained.
In the above mentioned UV irradiating apparatus, since the UV light is obliquely irradiated to the alignment layer or scanned the whole area of the alignment layer, the wider area of the alignment layer is uniformly exposed by the UV light.
Having described this invention as related to the embodiment shown in the accompanying drawings, it is our intention that the invention be not limited by any of the details of description, unless otherwise specified, but rather by construed broadly within its spirit and scope as set out in the accompanying claims.
Claims (31)
1. A photo-irradiating device for a photo-alignment process, comprising a movable photo-irradiating unit, movable relative to an alignment layer and in a regular order, for exposing the alignment layer with a light to provide a pretilt depending upon a photo-energy amount absorbed by the alignment layer.
2. A photo-irradiating device for a photo-alignment process according to
Claim 1, wherein the movable photo-irradiating unit includes a lamp for generating the light and a lens for focusing the light.
3. A photo-irradiating device for a photo-alignment process according to
Claim 2, wherein the lamp includes a Hg lamp for generating ultraviolet light.
4. A photo-irradiating device for a photo-alignment process according to
Claim 1, 2, or 3, wherein the movable photo-irradiating unit further includes a casing, the lamp and the lens being mounted into the casing.
5. A photo-irradiating device for a photo-alignment process according to
Claim 1, 2, 3, or 4, wherein the photo-irradiating unit further includes a polarizer for polarizing the light.
6. A photo-irradiating device for a photo-alignment process according to
Claim 5, wherein said polarizer is rotatable.
7. A photo-irradiating device for a photo-alignment process according to any one of Claims 1 to 6, further comprising a mask for controlling the photo-energy amount provided on a domain of the alignment layer to provide a multi-domain cell.
8. A photo-irradiating device for a photo-alignment process according to any one of Claims 1 to 7, wherein the movable photo-irradiating unit includes a scan motor for moving the movable photo-irradiating unit in the regular order.
9. A photo-irradiating device for a photo-alignment process, comprising:
a movable means for supporting a substrate coated with an alignment
layer; and
a fixed photo-irradiating unit for irradiating a light onto the alignment
layer to provide a pretilt depending upon the light.
10. A photo-irradiating device for a photo-alignment process according to
Claim 9, wherein the fixed photo-irradiating unit includes a lamp for generating the light and a lens for focusing the light.
11. A photo-irradiating device for a photo-alignment process according to
Claim 10, wherein the lamp includes a Hg lamp for generating ultraviolet light.
12. A photo-irradiating device for a photo-alignment process according to
Claim 9, 10 or 11, further comprising a polarizer for polarizing the light.
13. A photo-irradiating device for a photo-alignment process according to
Claim 12, wherein said polarizer is rotatable.
14. A photo-irradiating device for a photo-alignment process according to
Claim 9, 10, 11, 12 or 13, further comprising a mask for controlling a photoenergy amount provided in a domain of the alignment layer to provide a multidomain cell.
15. A photo-irradiating device for a photo-alignment process according to any one of Claims 1 to 14, wherein the movable means includes a scan motor for moving the movable means in a regular order.
16. An irradiating method for photo-alignment process, comprising steps of:
generating a light;
focusing the light; and
scanning the light into an alignment layer including a photo-polymer to
provide a pretilt depending upon the light, the alignment layer having a
first vertical side, a second vertical side opposite the first vertical side, a
first horizontal side being a perpendicular side of the first vertical side and
the second vertical side, and a second horizontal side opposite the first
horizontal side.
17. An irradiating method for a photo-alignment process according to Claim 16, wherein the photo polymer includes polysiloxane based materials.
18. An irradiating method for a photo-alignment process according to Claim 16 or 17, further comprising the step of polarizing the light before the irradiating step.
19. An irradiating method for a photo-alignment process according to Claim 18, wherein the polarizing step includes the substep of providing a different polarized light on each domain of the alignment layer.
20. An irradiating method for a photo-alignment process according to Claim 16, 17, 18 or 19, further comprising the step of controlling the transmittance of the light before the irradiating step for providing a photo-energy amount in each domain of the alignment layer to form a multi-domain cell.
21. An irradiating method for a photo-alignment process according to Claim 16, 17, 18, 19 or 20, wherein the scanning step includes the substep of scanning outside of the alignment layer to provide a uniform photo-energy amount to the periphery of the alignment layer.
22. An irradiating method for a photo-alignment process according to any one of Claims 16 to 21, wherein the scanning step includes the substep of continuously scanning the light on the alignment layer along a line, starting from a first tangent of the first vertical side and the first horizontal side the first line to a last tangent of the second vertical side and the second horizontal side in a regular order.
23. A photo-irradiating device according to any one of Claims 1 to 15, comprising a substrate coated with the alignment layer.
24. A device for setting the pretilt of an alignment layer, the device comprising means for supporting the alignment layer, means for irradiating a portion of an area of the alignment area with a beam, and means for causing relative movement between the beam and to the alignment layer such that, in use, the whole of said area is irradiated to substantially the same degree.
25. A device according to Claim 24, wherein the irradiating means is arranged such that, in use, the alignment layer is irradiated obliquely.
26. A method of setting the pretilt of an alignment layer, the method comprising providing a beam of radiation for irradiating a portion of an area of the alignment layer, and causing relative movement between the beam and the alignment layer such that the whole of said area is irradiated to substantially the same degree.
27. A method according to Claim 26, wherein said beam irradiates the alignment layer obliquely.
28. A photo-irradiating device substantially as hereinbefore described with reference to and/or as illustrated in any one of or any combination of Figs. 3 to 6b of the accompanying drawings.
29. A device for setting the pretilt of an alignment layer substantially as hereinbefore described with reference to and/or as illustrated in any one of or any combination of Figs. 3 to 6b of the accompanying drawings.
30. An irradiating method substantially as hereinbefore described with reference to and/or as illustrated in any one of or any combination of Figs. 3 to 6b of the accompanying drawings.
31. A method of setting the pretilt of an alignment layer substantially as hereinbefore described with reference to and/or as illustrated in any one of or any combination of Figs. 3 to 6b of the accompanying drawings.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960002463A KR0169063B1 (en) | 1996-02-01 | 1996-02-01 | Apparatus of irradiation ultraviolet light for photo-orientation |
| KR1019960037076A KR100191135B1 (en) | 1996-08-30 | 1996-08-30 | Light irradiation method |
| GB9702048A GB2309794B (en) | 1996-02-01 | 1997-01-31 | An ultraviolet irradiating device for photo-alignment process and an irradiating method using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB9718617D0 GB9718617D0 (en) | 1997-11-05 |
| GB2314170A true GB2314170A (en) | 1997-12-17 |
| GB2314170B GB2314170B (en) | 1998-07-15 |
Family
ID=27268706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9718617A Expired - Lifetime GB2314170B (en) | 1996-02-01 | 1997-01-31 | An ultraviolet irradiating device for photo-alignment process and an irradiating method using the same |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB2314170B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1353217A1 (en) * | 2002-03-29 | 2003-10-15 | JSR Corporation | Optical alignment method and liquid crystal display element |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1489816A (en) * | 1975-12-12 | 1977-10-26 | Marconi Co Ltd | Apparatus for producing linear movement |
| GB2046928A (en) * | 1979-04-11 | 1980-11-19 | Gerber Scientific Instr Co | Photodrafting |
| GB2215477A (en) * | 1988-03-01 | 1989-09-20 | Ferranti Plc | Apparatus for use in producing a multiple image mask to be employed in photolithographic processing |
| EP0491368A2 (en) * | 1990-12-18 | 1992-06-24 | R.R. Donnelly & Sons Company | Method and apparatus for making print imaging media |
-
1997
- 1997-01-31 GB GB9718617A patent/GB2314170B/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1489816A (en) * | 1975-12-12 | 1977-10-26 | Marconi Co Ltd | Apparatus for producing linear movement |
| GB2046928A (en) * | 1979-04-11 | 1980-11-19 | Gerber Scientific Instr Co | Photodrafting |
| GB2215477A (en) * | 1988-03-01 | 1989-09-20 | Ferranti Plc | Apparatus for use in producing a multiple image mask to be employed in photolithographic processing |
| EP0491368A2 (en) * | 1990-12-18 | 1992-06-24 | R.R. Donnelly & Sons Company | Method and apparatus for making print imaging media |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1353217A1 (en) * | 2002-03-29 | 2003-10-15 | JSR Corporation | Optical alignment method and liquid crystal display element |
| CN1450394B (en) * | 2002-03-29 | 2010-04-28 | Jsr株式会社 | Optical alignment method and liquid crystal display element |
| US7787085B2 (en) | 2002-03-29 | 2010-08-31 | Jsr Corporation | Optical alignment method and liquid crystal display element |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2314170B (en) | 1998-07-15 |
| GB9718617D0 (en) | 1997-11-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
| PE20 | Patent expired after termination of 20 years |
Expiry date: 20170130 |