GB2286830B - Method of coating a substrate and a coating device - Google Patents
Method of coating a substrate and a coating deviceInfo
- Publication number
- GB2286830B GB2286830B GB9502753A GB9502753A GB2286830B GB 2286830 B GB2286830 B GB 2286830B GB 9502753 A GB9502753 A GB 9502753A GB 9502753 A GB9502753 A GB 9502753A GB 2286830 B GB2286830 B GB 2286830B
- Authority
- GB
- United Kingdom
- Prior art keywords
- coating
- substrate
- coating device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laser Beam Processing (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19944405598 DE4405598C1 (en) | 1994-02-22 | 1994-02-22 | Coating method and coating apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9502753D0 GB9502753D0 (en) | 1995-03-29 |
GB2286830A GB2286830A (en) | 1995-08-30 |
GB2286830B true GB2286830B (en) | 1997-07-09 |
Family
ID=6510843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9502753A Expired - Fee Related GB2286830B (en) | 1994-02-22 | 1995-02-13 | Method of coating a substrate and a coating device |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE4405598C1 (en) |
FR (1) | FR2716462B1 (en) |
GB (1) | GB2286830B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11210841A (en) * | 1998-01-23 | 1999-08-03 | Tsubakimoto Chain Co | Timing chain with timing mark |
US20230141594A1 (en) * | 2020-04-09 | 2023-05-11 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Thermal laser evaporation system and method of providing a thermal laser beam at a source |
CN113607586B (en) * | 2021-07-19 | 2024-04-26 | 国网浙江省电力有限公司经济技术研究院 | Drop-wall-attached flow separation test device |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4631197A (en) * | 1985-07-17 | 1986-12-23 | Motorola, Inc. | Apparatus and method for adjusting the frequency of a resonator by laser |
EP0398375A2 (en) * | 1989-05-19 | 1990-11-22 | Sumitomo Electric Industries, Ltd. | Method of fabricating oxide superconducting film |
US5037521A (en) * | 1989-04-13 | 1991-08-06 | Matsushita Electric Ind., Ltd. | Sputtering apparatus |
EP0445897A1 (en) * | 1990-02-27 | 1991-09-11 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Process for deposition of thin and very thin layers |
US5049405A (en) * | 1989-05-26 | 1991-09-17 | Rockwell International Corporation | Method of thin film deposition using laser ablation |
WO1992001079A1 (en) * | 1990-07-03 | 1992-01-23 | Hermann Mai | Process for depositing thin layers by laser pulse vapour deposition |
US5084300A (en) * | 1989-05-02 | 1992-01-28 | Forschungszentrum Julich Gmbh | Apparatus for the ablation of material from a target and coating method and apparatus |
EP0469603A2 (en) * | 1990-08-01 | 1992-02-05 | Sumitomo Electric Industries, Limited | A device for forming a compound oxide superconducting thin film |
US5238546A (en) * | 1990-03-01 | 1993-08-24 | Balzers Aktiengesellschaft | Method and apparatus for vaporizing materials by plasma arc discharge |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5015492A (en) * | 1989-04-03 | 1991-05-14 | Rutgers University | Method and apparatus for pulsed energy induced vapor deposition of thin films |
JPH03226565A (en) * | 1990-02-01 | 1991-10-07 | Fujikura Ltd | Laser vapor deposition |
DE4019965A1 (en) * | 1990-06-21 | 1992-01-09 | Deutsche Forsch Luft Raumfahrt | METHOD AND DEVICE FOR COATING SUBSTRATE MATERIAL |
-
1994
- 1994-02-22 DE DE19944405598 patent/DE4405598C1/en not_active Expired - Fee Related
-
1995
- 1995-02-13 GB GB9502753A patent/GB2286830B/en not_active Expired - Fee Related
- 1995-02-22 FR FR9502049A patent/FR2716462B1/en not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4631197A (en) * | 1985-07-17 | 1986-12-23 | Motorola, Inc. | Apparatus and method for adjusting the frequency of a resonator by laser |
US5037521A (en) * | 1989-04-13 | 1991-08-06 | Matsushita Electric Ind., Ltd. | Sputtering apparatus |
US5084300A (en) * | 1989-05-02 | 1992-01-28 | Forschungszentrum Julich Gmbh | Apparatus for the ablation of material from a target and coating method and apparatus |
EP0398375A2 (en) * | 1989-05-19 | 1990-11-22 | Sumitomo Electric Industries, Ltd. | Method of fabricating oxide superconducting film |
US5049405A (en) * | 1989-05-26 | 1991-09-17 | Rockwell International Corporation | Method of thin film deposition using laser ablation |
EP0445897A1 (en) * | 1990-02-27 | 1991-09-11 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Process for deposition of thin and very thin layers |
US5238546A (en) * | 1990-03-01 | 1993-08-24 | Balzers Aktiengesellschaft | Method and apparatus for vaporizing materials by plasma arc discharge |
WO1992001079A1 (en) * | 1990-07-03 | 1992-01-23 | Hermann Mai | Process for depositing thin layers by laser pulse vapour deposition |
EP0469603A2 (en) * | 1990-08-01 | 1992-02-05 | Sumitomo Electric Industries, Limited | A device for forming a compound oxide superconducting thin film |
Also Published As
Publication number | Publication date |
---|---|
FR2716462A1 (en) | 1995-08-25 |
GB9502753D0 (en) | 1995-03-29 |
FR2716462B1 (en) | 1997-07-25 |
DE4405598C1 (en) | 1995-09-21 |
GB2286830A (en) | 1995-08-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20010213 |