GB2286830B - Method of coating a substrate and a coating device - Google Patents

Method of coating a substrate and a coating device

Info

Publication number
GB2286830B
GB2286830B GB9502753A GB9502753A GB2286830B GB 2286830 B GB2286830 B GB 2286830B GB 9502753 A GB9502753 A GB 9502753A GB 9502753 A GB9502753 A GB 9502753A GB 2286830 B GB2286830 B GB 2286830B
Authority
GB
United Kingdom
Prior art keywords
coating
substrate
coating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9502753A
Other versions
GB9502753D0 (en
GB2286830A (en
Inventor
Uwe Albinus
Paul Allenspacher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Deutsches Zentrum fuer Luft und Raumfahrt eV
Original Assignee
Deutsche Forschungs und Versuchsanstalt fuer Luft und Raumfahrt eV DFVLR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche Forschungs und Versuchsanstalt fuer Luft und Raumfahrt eV DFVLR filed Critical Deutsche Forschungs und Versuchsanstalt fuer Luft und Raumfahrt eV DFVLR
Publication of GB9502753D0 publication Critical patent/GB9502753D0/en
Publication of GB2286830A publication Critical patent/GB2286830A/en
Application granted granted Critical
Publication of GB2286830B publication Critical patent/GB2286830B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laser Beam Processing (AREA)
  • Physical Vapour Deposition (AREA)
GB9502753A 1994-02-22 1995-02-13 Method of coating a substrate and a coating device Expired - Fee Related GB2286830B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19944405598 DE4405598C1 (en) 1994-02-22 1994-02-22 Coating method and coating apparatus

Publications (3)

Publication Number Publication Date
GB9502753D0 GB9502753D0 (en) 1995-03-29
GB2286830A GB2286830A (en) 1995-08-30
GB2286830B true GB2286830B (en) 1997-07-09

Family

ID=6510843

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9502753A Expired - Fee Related GB2286830B (en) 1994-02-22 1995-02-13 Method of coating a substrate and a coating device

Country Status (3)

Country Link
DE (1) DE4405598C1 (en)
FR (1) FR2716462B1 (en)
GB (1) GB2286830B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11210841A (en) * 1998-01-23 1999-08-03 Tsubakimoto Chain Co Timing chain with timing mark
US20230141594A1 (en) * 2020-04-09 2023-05-11 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Thermal laser evaporation system and method of providing a thermal laser beam at a source
CN113607586B (en) * 2021-07-19 2024-04-26 国网浙江省电力有限公司经济技术研究院 Drop-wall-attached flow separation test device

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631197A (en) * 1985-07-17 1986-12-23 Motorola, Inc. Apparatus and method for adjusting the frequency of a resonator by laser
EP0398375A2 (en) * 1989-05-19 1990-11-22 Sumitomo Electric Industries, Ltd. Method of fabricating oxide superconducting film
US5037521A (en) * 1989-04-13 1991-08-06 Matsushita Electric Ind., Ltd. Sputtering apparatus
EP0445897A1 (en) * 1990-02-27 1991-09-11 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Process for deposition of thin and very thin layers
US5049405A (en) * 1989-05-26 1991-09-17 Rockwell International Corporation Method of thin film deposition using laser ablation
WO1992001079A1 (en) * 1990-07-03 1992-01-23 Hermann Mai Process for depositing thin layers by laser pulse vapour deposition
US5084300A (en) * 1989-05-02 1992-01-28 Forschungszentrum Julich Gmbh Apparatus for the ablation of material from a target and coating method and apparatus
EP0469603A2 (en) * 1990-08-01 1992-02-05 Sumitomo Electric Industries, Limited A device for forming a compound oxide superconducting thin film
US5238546A (en) * 1990-03-01 1993-08-24 Balzers Aktiengesellschaft Method and apparatus for vaporizing materials by plasma arc discharge

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5015492A (en) * 1989-04-03 1991-05-14 Rutgers University Method and apparatus for pulsed energy induced vapor deposition of thin films
JPH03226565A (en) * 1990-02-01 1991-10-07 Fujikura Ltd Laser vapor deposition
DE4019965A1 (en) * 1990-06-21 1992-01-09 Deutsche Forsch Luft Raumfahrt METHOD AND DEVICE FOR COATING SUBSTRATE MATERIAL

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631197A (en) * 1985-07-17 1986-12-23 Motorola, Inc. Apparatus and method for adjusting the frequency of a resonator by laser
US5037521A (en) * 1989-04-13 1991-08-06 Matsushita Electric Ind., Ltd. Sputtering apparatus
US5084300A (en) * 1989-05-02 1992-01-28 Forschungszentrum Julich Gmbh Apparatus for the ablation of material from a target and coating method and apparatus
EP0398375A2 (en) * 1989-05-19 1990-11-22 Sumitomo Electric Industries, Ltd. Method of fabricating oxide superconducting film
US5049405A (en) * 1989-05-26 1991-09-17 Rockwell International Corporation Method of thin film deposition using laser ablation
EP0445897A1 (en) * 1990-02-27 1991-09-11 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Process for deposition of thin and very thin layers
US5238546A (en) * 1990-03-01 1993-08-24 Balzers Aktiengesellschaft Method and apparatus for vaporizing materials by plasma arc discharge
WO1992001079A1 (en) * 1990-07-03 1992-01-23 Hermann Mai Process for depositing thin layers by laser pulse vapour deposition
EP0469603A2 (en) * 1990-08-01 1992-02-05 Sumitomo Electric Industries, Limited A device for forming a compound oxide superconducting thin film

Also Published As

Publication number Publication date
FR2716462A1 (en) 1995-08-25
GB9502753D0 (en) 1995-03-29
FR2716462B1 (en) 1997-07-25
DE4405598C1 (en) 1995-09-21
GB2286830A (en) 1995-08-30

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20010213