GB2274468B - Phosphorous effusion apparatus and method for molecular beam epitaxy - Google Patents

Phosphorous effusion apparatus and method for molecular beam epitaxy

Info

Publication number
GB2274468B
GB2274468B GB9400672A GB9400672A GB2274468B GB 2274468 B GB2274468 B GB 2274468B GB 9400672 A GB9400672 A GB 9400672A GB 9400672 A GB9400672 A GB 9400672A GB 2274468 B GB2274468 B GB 2274468B
Authority
GB
United Kingdom
Prior art keywords
phosphorous
molecular beam
beam epitaxy
effusion
effusion apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB9400672A
Other versions
GB2274468A (en
GB9400672D0 (en
Inventor
Fernando Fernandez-Pol Briones
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Consejo Superior de Investigaciones Cientificas CSIC
Riber SA
Original Assignee
Consejo Superior de Investigaciones Cientificas CSIC
Riber SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from ES09300063A external-priority patent/ES2067381B1/en
Application filed by Consejo Superior de Investigaciones Cientificas CSIC, Riber SA filed Critical Consejo Superior de Investigaciones Cientificas CSIC
Publication of GB9400672D0 publication Critical patent/GB9400672D0/en
Publication of GB2274468A publication Critical patent/GB2274468A/en
Application granted granted Critical
Publication of GB2274468B publication Critical patent/GB2274468B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
GB9400672A 1993-01-14 1994-01-14 Phosphorous effusion apparatus and method for molecular beam epitaxy Expired - Lifetime GB2274468B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ES09300063A ES2067381B1 (en) 1993-01-14 1993-01-14 PHOSPHORUS EFFUSION CELL FOR EPITAXIA OF MOLECULAR BEAMS.
GB9400573A GB9400573D0 (en) 1993-01-14 1994-01-13 Phosphorus effusion cell for molecular beam epitaxy

Publications (3)

Publication Number Publication Date
GB9400672D0 GB9400672D0 (en) 1994-03-09
GB2274468A GB2274468A (en) 1994-07-27
GB2274468B true GB2274468B (en) 1996-09-18

Family

ID=26154688

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9400672A Expired - Lifetime GB2274468B (en) 1993-01-14 1994-01-14 Phosphorous effusion apparatus and method for molecular beam epitaxy

Country Status (1)

Country Link
GB (1) GB2274468B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6030458A (en) * 1997-02-14 2000-02-29 Chorus Corporation Phosphorus effusion source

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0132322A2 (en) * 1983-06-29 1985-01-30 Stauffer Chemical Company Thermal crackers for forming pnictide films in high vacuum processes
EP0154072A2 (en) * 1984-02-17 1985-09-11 Stauffer Chemical Company Production of high purity white phosphorus
US5041719A (en) * 1990-06-01 1991-08-20 General Electric Company Two-zone electrical furnace for molecular beam epitaxial apparatus
US5156815A (en) * 1988-09-08 1992-10-20 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0132322A2 (en) * 1983-06-29 1985-01-30 Stauffer Chemical Company Thermal crackers for forming pnictide films in high vacuum processes
EP0154072A2 (en) * 1984-02-17 1985-09-11 Stauffer Chemical Company Production of high purity white phosphorus
US5156815A (en) * 1988-09-08 1992-10-20 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
US5041719A (en) * 1990-06-01 1991-08-20 General Electric Company Two-zone electrical furnace for molecular beam epitaxial apparatus

Also Published As

Publication number Publication date
GB2274468A (en) 1994-07-27
GB9400672D0 (en) 1994-03-09

Similar Documents

Publication Publication Date Title
EP0741545A4 (en) Method and system for laser thermokeratoplasty
SG49655A1 (en) Elongated structural member and method and apparatus for making same
EP0631049A3 (en) Laser ignition methods and apparatus for combustors.
GB2290495B (en) Laser marking system and laser marking method
ZA941031B (en) Method and apparatus for freezing
GB9400881D0 (en) Method and apparatus for verifying geometry
HK1018168A1 (en) Method and apparatus for integer division
EP0799330A4 (en) A method and apparatus for varying the flux of a molecular beam produced by a molecular beam epitaxy cell
GB2322560B (en) Laser scanning method and apparatus
ZA935287B (en) Apparatus and method for forming piles
GB9705233D0 (en) Molecular beam epitaxy apparatus and method
GB2277820B (en) Method and apparatus for simplifying interlock hardware
GB9400573D0 (en) Phosphorus effusion cell for molecular beam epitaxy
EP0725711A4 (en) Method and apparatus for cutting piled fabric
GB2284405B (en) Method and apparatus for vehicle alignment
HU9303059D0 (en) Alpha-phosphonosulfonate squalene synthetase inhibitors and method for producing them
AU4853293A (en) Method and apparatus for treating fuel
GB9325993D0 (en) Method and apparatus for connection
GB2274468B (en) Phosphorous effusion apparatus and method for molecular beam epitaxy
EP0737858A4 (en) Method and apparatus for adjusting electron-beam device
AU1300695A (en) Method and apparatus for heat-treating yarns and products prepared therefrom
EP0568177A3 (en) Epitaxial growth method and apparatus for doping nitrogen
KR960004312B1 (en) Making apparatus and method for nitrogen
GB9216711D0 (en) Method and apparatus for providing an anchorage point
GB2282937B (en) Method and apparatus for implementing hunt groups

Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Expiry date: 20140113