GB2252870A - Quantum dot structure - Google Patents
Quantum dot structure Download PDFInfo
- Publication number
- GB2252870A GB2252870A GB9102582A GB9102582A GB2252870A GB 2252870 A GB2252870 A GB 2252870A GB 9102582 A GB9102582 A GB 9102582A GB 9102582 A GB9102582 A GB 9102582A GB 2252870 A GB2252870 A GB 2252870A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrode
- potential
- quantum dot
- potential well
- electron gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002096 quantum dot Substances 0.000 title claims abstract description 19
- 239000004065 semiconductor Substances 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 7
- 230000005533 two-dimensional electron gas Effects 0.000 claims abstract description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 7
- 238000005513 bias potential Methods 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/122—Single quantum well structures
- H01L29/127—Quantum box structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/341—Structures having reduced dimensionality, e.g. quantum wires
Abstract
A quantum dot structure comprising semiconductor material has a controllable well configuration (10) formed in a two dimensional electron gas utilising a potential applied to a surface electrode (7). The lateral extent of the well (in direction x) is controlled by means of an electrode (8) which applies a potential to the two dimensional electron gas. <IMAGE>
Description
QUANTUM DOT STRUCTURE
DESCRIPTION
This invention relates to a quantum dot structure capable of providing a potential well for constraining small numbers of electrons in a semiconductor device.
Several fabrication methods have been used hitherto in order -to produce a quantum dot, which is a structure for confining small numbers of electrons in a semiconductor device. [Reed & Kink "Nanostructure Physics and Fabrication - Academic Press 1989 ] . A quantum dot utilises a potential well which permits a quantum mechanical standing wave to be established for e.g. a single electron. Quantum dots have been formed by mesa etching, the resulting dots having a well defined structure. However, the size of the confining potential well cannot be altered. Electrostatic confinement has also been used to provide a range of quantum dot structures. However, the use of only one electrode limits the configuration of quantum dot that can be achieved and the resulting dot is not readily tunable in size.
An object of the invention is to provide an improved quantum dot structure having a potential well which is tunable both in terms of energy depth and lateral extent.
In accordance with the present invention there is provided a quantum dot structure comprising a semiconductor material, means associated with the semiconductor material to produce an essentially two dimensional electron gas therein, first electrode means for forming a potential well in the semiconductor material for retaining an electron therein, and second electrode means for forming an electrical connection with said electron gas, for permitting a lateral bias field to be applied via said electron gas to said potential well for modifying the width thereof.
Thus, in accordance with the invention, the quantum dot structure can be tuned in terms of its potential energy depth by applying a variable bias potential to the first electrode, and the well can be tuned in terms of its lateral extent by applying a variable bias field to the second electrode.
Preferably, a third electrode is disposed centrally of the first electrode for modifying the depth of the potential well in order to provide further control of the shape thereof.
In order that the invention may be more fully understood an embodiment thereof will now be described by way of example with reference to the accompanying drawings in which:
Figure 1 is a schematic sectional view of a semiconductor including a quantum dot structure according to the invention;
Figure 2 is a schematic perspective view of the top surface of the device shown in Figure 1;
Figure 3 is a schematic diagram of the potential well established by the arrangement shown in Figures 1 and 2; and
Figure 4 shows a modification to the device shown in
Figure 1 wherein a third central electrode is provided.
Referring to Figure 1, the quantum dot structure is shown fabricated in GaAs semiconductor. The device comprises a GaAs substrate 1 on which is grown a GaAs hetero layer 2 which forms a hetero junction with an overlying GaAlAs layer 3. The hetero junction is overlaid with a dielectric passivation layer, typically undoped GaAs 4. As well kndwn in the art, the hetero junction produces a two dimensional electron gas 5 in the GaAs layer 2.
In order to form the quantum dot structure, a circular ring 6 is cut into the overlying layers 3, 4 so as to provide a central disc shaped portion thereof 3a, 4a.
The metalisation layer 7 is then laid over the annular ring and the layers 4, 4a. A perspective view of the top of the device, showing the metalisation layer 7, is shown in Figure 2. The metalisation layer 7 constitutes a first electrode for the quantum dot structure in the form of a ring. A second metallic electrode 8 is formed in contact with the top surface of the GaAs layer 2 so as to make electrical connection with the two dimensional electron gas 5.
In use, bias potentials are applied to the first and second electrodes 7, 8 with a result that a potential barrier and well is formed in the semiconductor beneath the ring 6. Equipotentials for the well are shown in dotted outline in Figure 1 and a more detailed perspective schematic view of the equal potential configuration is shown in Figure 3. Thus, it will be seen that the potential well is in the shape of an atol having a central well portion 10 and outlying flank portions 11. The advantage of the structure shown in
Figure 1 is that by increasing the bias potential applied to the first electrode 7, the depth of the well portion 10 can be controlled i.e. increased or decreased. Furthermore, by increasing the bias potential applied to the second electrode 8, an increased "pinching" field can be applied in the direction of arrows X so as to reduce the diameter of the potential well.Thus, the lateral extent of the well can be controlled by means of the second electrode 8. By increasing the potential on electrode 8, both the equipotentials 9 and 10 are squeezed inwardly.
Similarly, by reducing the potential on electrode 8, the well is permitted to relax laterally outwardly.
A modification to Figure 1 is shown in Figure 4 wherein the central disc portion 3a, 4a of Figure 1 is cut away centrally to form an annulus and the resulting central portion is filled with a third electrode 11. The third electrode 11 provides an additional control for the depth of the potential well 10 independently -of the potential applied to ring electrode 6, which can then be used separately to control the overall shape of the atol shaped equipotential configuration.
It will be appreciated that many such quantum dot structures can be integrated into a single semiconductor device with a high packing density. Furthermore, since the size of the potential well 10 is tunable and thus could be used as a tunable laser or as a device having resonant tunnelling operation. The structure should operate at room temperature for a double vertical well resonant tunnelling structure. The structure also permits vertical electron transport measurements to be made.
Claims (6)
1. A quantum dot structure comprising a semiconductor material, means associated with the semiconductor material to produce an essentially two dimensional electron gas therein, first electrode means for forming a potential well in the semiconductor material for retaining an electron therein, and second electrode means for applying an electrical potential to said electron gas, for permitting a lateral bias field to be applied via said electron gas to said potential well for modifying the width thereof.
2. A structure according to claim 1 wherein said first electrode is in the form of a circular ring whereby to form a potential well of circular cross section whereby the bias potential applied to the second electrode modifies the diameter of said potential well.
3. A structure according to claim 1 or 2 including a third electrode disposed centrally of the first electrode for modifying the depth of the potential well.
4. A structure according to any preceding claim including a GaAs substrate, hetero junction means on the substrate for establishing said electron gas, dieletric means covering said hetero junction means, and a ring cut in said dielectric, the first electrode being formed in said cut ring.
5. A structure according to claim 4 including a central opening formed in said dielectric within the ring, said third electrode being formed in said central opening.
6. A quantum dot structure substantially as hereinbefore described with reference to the accompanying drawings.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9102582A GB2252870B (en) | 1991-02-06 | 1991-02-06 | Quantum dot structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9102582A GB2252870B (en) | 1991-02-06 | 1991-02-06 | Quantum dot structure |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9102582D0 GB9102582D0 (en) | 1991-03-27 |
GB2252870A true GB2252870A (en) | 1992-08-19 |
GB2252870B GB2252870B (en) | 1994-09-07 |
Family
ID=10689661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9102582A Expired - Fee Related GB2252870B (en) | 1991-02-06 | 1991-02-06 | Quantum dot structure |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2252870B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6744065B1 (en) | 1997-11-21 | 2004-06-01 | Btg International Limited | Single electron devices |
-
1991
- 1991-02-06 GB GB9102582A patent/GB2252870B/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6744065B1 (en) | 1997-11-21 | 2004-06-01 | Btg International Limited | Single electron devices |
Also Published As
Publication number | Publication date |
---|---|
GB9102582D0 (en) | 1991-03-27 |
GB2252870B (en) | 1994-09-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0254568B1 (en) | A semiconductor laser device | |
US4752934A (en) | Multi quantum well laser with parallel injection | |
US6148017A (en) | Laser diode/modulator combination | |
US4683484A (en) | Lateral confinement of charge carriers in a multiple quantum well structure | |
US4893161A (en) | Quantum-well acoustic charge transport device | |
US6682949B2 (en) | Semiconductor laser and production method thereof | |
JPH02231777A (en) | Resonance tunnel optoelectronic device | |
EP0272096B1 (en) | A semiconductor laser device | |
JP2531655B2 (en) | Semiconductor device | |
JP2851318B2 (en) | Tunable DFB laser | |
US5101414A (en) | Electrically wavelength tunable semiconductor laser | |
WO2003007445A1 (en) | Semiconductor quantum dot⋅device | |
JPS63316484A (en) | Quantum effect semiconductor device | |
US4802181A (en) | Semiconductor superlattice light emitting sevice | |
JPH04218994A (en) | Semiconductor light emitting device | |
US5179567A (en) | Semiconductor laser device, method of fabricating the same and optical system of utilizing the same | |
JPH09219542A (en) | Hybrid electronic device, especially josephson transistor | |
GB2252870A (en) | Quantum dot structure | |
JPH0677609A (en) | Tunable laser diode | |
JPH0786678A (en) | Semiconductor laser device | |
US5661076A (en) | Method for fabricating a vertical-cavity surface-emitting laser diode | |
US5283445A (en) | Quantum semiconductor device employing quantum boxes for enabling compact size and high-speed operation | |
US5294807A (en) | Quantum effect device in which conduction between a plurality of quantum dots or wires is achieved by tunnel transition | |
US5345461A (en) | Semiconductor laser high optical gain quantum well | |
JP2876642B2 (en) | Quantum well laser |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20040206 |