GB2194341A - Capacitive acceleration sensors - Google Patents

Capacitive acceleration sensors Download PDF

Info

Publication number
GB2194341A
GB2194341A GB08716443A GB8716443A GB2194341A GB 2194341 A GB2194341 A GB 2194341A GB 08716443 A GB08716443 A GB 08716443A GB 8716443 A GB8716443 A GB 8716443A GB 2194341 A GB2194341 A GB 2194341A
Authority
GB
United Kingdom
Prior art keywords
acceleration
plate
acceleration sensor
frame
cover plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB08716443A
Other versions
GB8716443D0 (en
GB2194341B (en
Inventor
Helmut Seidel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airbus Defence and Space GmbH
Original Assignee
Messerschmitt Bolkow Blohm AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Messerschmitt Bolkow Blohm AG filed Critical Messerschmitt Bolkow Blohm AG
Publication of GB8716443D0 publication Critical patent/GB8716443D0/en
Publication of GB2194341A publication Critical patent/GB2194341A/en
Application granted granted Critical
Publication of GB2194341B publication Critical patent/GB2194341B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pressure Sensors (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

A capacitive acceleration sensor, which is produced with micromechanical production technology and etching technique, has a preferably rectangular acceleration plate (2) suspended centrally in the interior of the acceleration sensor (1) and having an even number of bending bands (3, 15) arranged symmetrically with respect to the centre plane between the upper and lower side of the acceleration plate. The acceleration plate (2) itself or conductors applied to its surfaces form one of the capacitor electrodes of two plate capacitors. The counter-electrodes (7) for this purpose are arranged on opposite surfaces of cover plates (5) separated from the acceleration plate (2) by respective gaps (6). Preferably the acceleration plate (2), the bending bands (3) and a frame (4) are worked-out monolithically from a monocrystalline substrate of silicon. <IMAGE>

Description

SPECIFICATION Capacitive acceleration sensors This invention relates to capacitive acceleration sensors.
Such an acceleration sensor is known as a result of DE-OS 32 23 987. This has a flap which is fastened to a carrier by way of two torsion holders which are arranged symmetrically and in extension of one edge of the flap.
An electrode which is applied to a plate present underneath the flap makes it possible to measure the acceleration by measuring the corresponding change in the capacitance between the flap and the electrode. Such a sensor produces a capacitance change which is a relatively complicated function of the acceleration, because the air gap between the flap and the electrode changes only in wedge-shaped manner. Furthermore, in the case of this torsion suspension, relatively great transverse sensitivities are to be expected. As a result of the arrangement of the flap being unsymmetrical in the vertical direction, also no adequate overload protection of the sensor exists.
The problem underlying the invention is, in the case of an acceleration sensor of the kind mentioned at the beginning hereof, to improve the transverse sensitivity and the overload protection.
This problem is solved, in accordance with the invention, by the provision of a capacitive acceleration sensor, which is produced with micromechanical production technology and etching technique, characterised in that an acceleration plate, having an even number of bending bands arranged symmetrically with respect to the central plane between the upper and lower side of the acceleration plate, is suspended centrally-in the interior of the acceleration sensor, in which respect either the acceleration plate itself, or conductors applied to its surfaces, form one of the capacitor electrodes of two plate capacitors, counter-electrodes of which are applied to opposite surfaces which are separated by gaps from the acceleration plate.
As a result of the arrangement of the acceleration plate suspended centrally from bending bands, the acceleration sensor in accordance with the invention has a high sensitivity which is not achieved by known sensors, even by piezoresistive sensors. There is achieved capacitance changes which rise approximately uniformly and which correspond to the applied accelerations, in which respect a high degree of overload protection is achievable and thus the possibility of a short-circuit-is reduced.
The fully symmetrical construction of the structure guarantees a very accurately defined zero-point position. Moreover, as a result of the two-sided suspension with four, preferably eight, bending bands, the transverse sensitivity is extremely low. The two-sided arrangement of the rigid cover plates with the counter-electrodes ensures a high degree of electrical safety.
The invention will be described further, by way of example, with reference to the accompanying drawings, in which: Fig. 1 is a cross-section through a first preferred embodiment of the acceleration sensor of the invention; Fig. 2 is a perspective plan view of the acceleration sensor shown in Fig. 1 with its upper cover plate omitted in accordance with the arrows Il-lI; Fig. 3 is a view comparable with that of Fig.
1 but of a second preferred embodiment of the acceleration sensor of the invention; and Fig. 4 is a view comparable with that of Figs. 1 and 3 but of a third preferred embodiment of the acceleration sensor of the invention.
Referring now in detail to the drawings, the first preferred embodiment of the acceleration sensor 1 shown in Figs. 1 and 2 comprises a central acceleration plate 2, which is suspended by means of an even number of bending bands 3, preferably eight bending bands, from a frame 4. The bending bands 3 extend from the corners of the upper and lower side of the acceleration plate 2 to the frame 4 which is arranged at a spacing around the acceleration plate 2. Present above and below the acceleration plate 2 and the frame 4, which are the same thickness, are cover plates 5, which in each case rest on the frame 4. In the cover plates 5 opposite the acceleration plate 2 and the bending bands 3 are respective depressions 6, into each of which depressions 6 is applied a metal film 7.
If the acceleration plate 2, the bending bands 3 and the frame 4 are worked-out monolithically from a monocrystalline silicon, the surfaces of the acceleration plate 2 can serve as one of the electrodes and the metallic films 7 in the cover plates 5 can serve as the other electrodes of two plate capacitors with the depressions 6 as gaps between the electrodes. Upon the effecting of accelerations, the electrodes form variable capacitances, which serve for the measurement of the acceleration. The decrease in the changing or alternating current changes by changes in the gaps 6 upon different accelerations is effected in known manner for example by a power or lead strip 8 connected to the acceleration plate 2 (see Fig. 2) and power or lead strips 9 conducted out from the metallic films 6 between the cover plates 5 and the frame (see Fig. 1).Two possibilities are available for damping the sensor 1. Firstly, the inner space formed by the gaps 6 and free spaces 11 around the acceleration plate 2 can be evacuated, save for a defined residual pressure, through a duct 12 worked into the upper cover plate 5. The second possibility consists in leaving the duct 12 open as an air duct.
To produce the first preferred embodiment, in which the acceleration plate 2, the bending beams 3 and the frame 4 are worked monolithically out of a monocrystalline substrate.
Silicon with low doping and a crystal orientation (100) is used for the substrate. The bending beams 3, which may not lie parallel to a (111) crystal plane, have to be provided with a high edge doping ( > 7 x 10'9 cm-3), so that they are made etching-resistant for the subsequent structuring process. This can be achieved by means of an appropriately doped epitaxy layer, or respectively with ion implantation or diffusion. After that, the contours of the etching pit are lithographically defined and gnisotropically etched. Into the cover plates 5, which preferably consist of glass, the depressions 6 are likewise etched out and subsequently thereto the metallic films 7 and lead strips 9 are deposited by evaporation.Finally, the cover plates 5 are connected to the frame 4 with the aid of an anodic connection technique by applying an electrical voltage at increased temperature.
In the second preferred embodiment, shown in Fig. 3 of an acceleration sensor la, instead of the bending bands 3 worked out of the uniform substrate, separate bending strips 15 are present, which are inserted between the cover plates 5 and the acceleration plate 2.
The bending strips ' 1 5 can, as shown here, consist of a dielectric coated with a metal film 16, for example of Si3N4or SiO2. Furthermore, the bending strips 15 can be directly deposited by evaporation or applied directly from a metal film or respectively a metal foil. This arrangement has the advantage that the bending strips 15 serving as central capacitor electrodes or respectively the metal films 16 can be isolated dielectrically vis-a-vis the frame 4.
In the third preferred embodiment of an acceleration sensor 1b shown in Fig. 4, the acceleration plate 2 and the bending bands 3 are thinner, by the width of the gaps 6, than the frame 4. This reduced thickness can be worked out without difficulty upon the production from a uniform substrate. This arrangement has the advantage that the cover plates 5 do not have to be separately worked.
All three embodiments of the acceleration sensor 1, 1 a and 1 b can be used directly as capacitive signal transmitters, in which respect upon the effecting of accelerations two oppo sitely changing capacitances are available, which can be wired in a suitable bridge ar rangement. Furthermore, the two measuring capacitances can be supplemented by two rigid capacitances, which make possible, between frame 4 and the cover plates 5, a temperature compensation of the measuring capacitances.
Another possibility of the signal evaluation consists in the electrical fettering or impe dance of the acceleration plate 2, in which respect this can be kept in its zero position by application of a counter-voltage. In this respect, the counter-voltage occurring upon an acceleration is measured. With this arrangement, resonance effects can be compensated out.
The embodiments shown in the figures represent the most customary kind of the acceleration sensor in accordance with the invention. It also lies within the scope of the invention to arrange at least two bending bands, which connect in the centre of a longitudinal side the upper and lower sides of the acceleration plate and of the frame. A further embodiment which is usable in practice comprises four bending bands arranged in mirrorinverted manner at only one longitudinal side of the acceleration plate, and connecting the longitudinal side to the upper and lower side of the frame. This embodiment is suitable for particularly sensitive measurements, for example for measuring the inclination of an object relative to the gravitational field of the earth.

Claims (14)

1. A capacitive acceleration sensor, which is produced with micromechanical production technology and etching technique, characterized in that an acceleration plate, having an even number of bending bands arranged symmetrically with respect to the central plane between the upper and lower side of the acceleration plate, is suspended centrally in the interior of the acceleration sensor, in which respect either the acceleration plate itself, or conductors applied to its surfaces, form one of the capacitor electrodes of two plate capacitors, counter-electrodes of which are applied to opposite surfaces which are separated by gaps from the acceleration plate.
2. An acceleration sensor as claimed in claim 1, characterized in that the acceleration plate, a frame surrounding it and the bending bands are covered on both sides, whilst leaving the gaps free, by cover plates to whose surfaces facing the acceleration plate the counterelectrodes are applied.
3. An acceleration sensor as claimed in claims 1 and 2, characterized in that the acceleration plate, the bending bands and the frame are worked monolithically from a mono crystalline substrate.
4. An acceleration sensor as claimed in claims 1 and 2, characterized in that only the acceleration plate and the frame consist of a monocrystalline substrate, and in that separate bending strips are inserted between the acceleration plate and the cover plates.
5. An acceleration sensor as claimed in claim 4, characterized in that the bending strips consist of a dielectric which is provided with a metal layer.
6. An acceleration sensor as claimed in claim 4, characterized in that the bending strips consist of a metal foil.
7. An acceleration sensor as claimed in one or more of claims 1 to 6, characterized in that the gaps between the acceleration plate with the bending bands and the cover plates are produced by etching-in of the cover plates.
8. An acceleration sensor as claimed in any one of claims 1 to 6, characterized in that the gaps between the acceleration plate with the bending bands and the cover plates are formed by a reduced thickness, of the acceleration plate opposite the frame.
9. An acceleration sensor as claimed in one or more of claims 1 to 8, characterized in that the gaps and free spaces between the acceleration plate, the cover plates and the frame are evacuated save for a defined residual pressure.
10. An acceleration sensor as claimed in one or more of claims 1 to 8, characterized in that from the gaps and the free spaces between the acceleration plate, the cover plates and the frame an air duct leads through one of the cover plates.
11. An acceleration sensor as claimed in any one of claims 1 to 10, characterized by four bending bands arranged in mirror-inverted manner on only one longitudinal side of the acceleration plate and connecting the longitudinal side to the upper and lower side of the frame.
12. An acceleration sensor as claimed in any one of claims 1 to 10, characterized by eight bending bands which are arranged in mirror-symmetrical manner at the corners of the acceleration plate and connect its upper and lower side to the frame.
13. Arí acceleration sensor as claimed in any of claims 1 to 10 wherein the acceleration plate is rectangular or square.
14. A capacitive acceleration sensor substantially as hereinbefore described with reference to and as illustrated in Figs. 1 and 2, or in Fig. 3, or in Fig. 4 of the accompanying drawings.
GB8716443A 1986-07-26 1987-07-13 Capacitive acceleration sensors Expired - Lifetime GB2194341B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863625411 DE3625411A1 (en) 1986-07-26 1986-07-26 CAPACITIVE ACCELERATION SENSOR

Publications (3)

Publication Number Publication Date
GB8716443D0 GB8716443D0 (en) 1987-08-19
GB2194341A true GB2194341A (en) 1988-03-02
GB2194341B GB2194341B (en) 1990-05-23

Family

ID=6306096

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8716443A Expired - Lifetime GB2194341B (en) 1986-07-26 1987-07-13 Capacitive acceleration sensors

Country Status (4)

Country Link
CH (1) CH673897A5 (en)
DE (1) DE3625411A1 (en)
FR (1) FR2602055B1 (en)
GB (1) GB2194341B (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2212274A (en) * 1987-11-09 1989-07-19 Vaisala Oy Capacitive accelerometer and its fabrication method
GB2232489A (en) * 1989-06-05 1990-12-12 Motorola Inc Silicon acceleration sensor
EP0459939A1 (en) * 1990-05-30 1991-12-04 Copal Company Limited Capacitive acceleration sensor with free diaphragm
US5115291A (en) * 1989-07-27 1992-05-19 Honeywell Inc. Electrostatic silicon accelerometer
EP2053413A1 (en) * 2006-11-14 2009-04-29 Panasonic Corporation Sensor
WO2010101023A1 (en) * 2009-03-04 2010-09-10 コニカミノルタホールディングス株式会社 Parallel displacement mechanism and method for manufacturing parallel displacement mechanism

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3742385A1 (en) * 1987-12-14 1989-06-22 Siemens Ag Acceleration-sensitive electronic component
US4825335A (en) * 1988-03-14 1989-04-25 Endevco Corporation Differential capacitive transducer and method of making
JPH0623782B2 (en) * 1988-11-15 1994-03-30 株式会社日立製作所 Capacitance type acceleration sensor and semiconductor pressure sensor
US4928203A (en) * 1989-02-28 1990-05-22 United Technologies Capacitive accelerometer with hinges on top and bottom surface
US4930043A (en) * 1989-02-28 1990-05-29 United Technologies Closed-loop capacitive accelerometer with spring constraint
US5008774A (en) * 1989-02-28 1991-04-16 United Technologies Corporation Capacitive accelerometer with mid-plane proof mass
US4930042A (en) * 1989-02-28 1990-05-29 United Technologies Capacitive accelerometer with separable damping and sensitivity
DD282530A5 (en) * 1989-04-24 1990-09-12 Karl Marx Stadt Tech Hochschul CAPACITIVE MICROMECHANICAL ACCELERATION SENSOR
DE3922476A1 (en) * 1989-07-06 1991-01-17 Siemens Ag CAPACITIVE MICROMECHANICAL ACCELERATION SENSOR
US5006487A (en) * 1989-07-27 1991-04-09 Honeywell Inc. Method of making an electrostatic silicon accelerometer
US5295386A (en) 1989-12-28 1994-03-22 Kazuhiro Okada Apparatus for detecting acceleration and method for testing this apparatus
US6864677B1 (en) 1993-12-15 2005-03-08 Kazuhiro Okada Method of testing a sensor
DE4016471A1 (en) * 1990-05-22 1991-11-28 Bosch Gmbh Robert MICROMECHANICAL INCLINATION SENSOR
US5233213A (en) * 1990-07-14 1993-08-03 Robert Bosch Gmbh Silicon-mass angular acceleration sensor
DE4022495A1 (en) * 1990-07-14 1992-01-23 Bosch Gmbh Robert MICROMECHANICAL SPEED SENSOR
DE4102805A1 (en) * 1991-01-31 1992-08-13 Bosch Gmbh Robert CAPACITIVE ACCELERATION SENSOR
DE9205416U1 (en) * 1992-04-21 1993-05-19 Kampfrath, Gerit, Dr. Dynamic acceleration sensor
DE4226430C2 (en) * 1992-08-10 1996-02-22 Karlsruhe Forschzent Capacitive acceleration sensor
US5824901A (en) * 1993-08-09 1998-10-20 Leica Geosystems Ag Capacitive sensor for measuring accelerations and inclinations
DE4326666C1 (en) * 1993-08-09 1995-02-23 Wild Heerbrugg Ag Capacitive sensor
DE4406342C1 (en) * 1994-02-26 1995-03-09 Kernforschungsz Karlsruhe Sensor and method for producing it
US6602216B1 (en) * 1998-05-18 2003-08-05 William E. Nordt, III Plantar fascia tension device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1163209A (en) * 1966-09-09 1969-09-04 Litton Industries Inc Accelerometer
EP0059488A1 (en) * 1978-07-21 1982-09-08 Hitachi, Ltd. Capacitive pressure sensor
GB2102579A (en) * 1981-07-14 1983-02-02 Sundstrand Data Control Force transducer flexure reed bearing electrical connections
GB2156523A (en) * 1984-03-19 1985-10-09 Draper Lab Charles S Planar inertial sensor
GB2158945A (en) * 1984-05-18 1985-11-20 Becton Dickinson Co Capacitive transducer
GB2178856A (en) * 1985-07-25 1987-02-18 Litton Systems Inc Integrated, force balanced accelerometer
GB2186085A (en) * 1986-02-04 1987-08-05 Draper Lab Charles S Vibratory digital integrating accelerometer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3709042A (en) * 1969-05-14 1973-01-09 S Lee Capacitance accelerometer
US4244225A (en) * 1979-06-08 1981-01-13 Itt Industries, Inc. Mechanical resonator arrangements
SE436936B (en) * 1981-01-29 1985-01-28 Asea Ab INTEGRATED CAPACITY SENSOR
CH642461A5 (en) * 1981-07-02 1984-04-13 Centre Electron Horloger ACCELEROMETER.

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1163209A (en) * 1966-09-09 1969-09-04 Litton Industries Inc Accelerometer
EP0059488A1 (en) * 1978-07-21 1982-09-08 Hitachi, Ltd. Capacitive pressure sensor
GB2102579A (en) * 1981-07-14 1983-02-02 Sundstrand Data Control Force transducer flexure reed bearing electrical connections
GB2156523A (en) * 1984-03-19 1985-10-09 Draper Lab Charles S Planar inertial sensor
GB2158945A (en) * 1984-05-18 1985-11-20 Becton Dickinson Co Capacitive transducer
GB2178856A (en) * 1985-07-25 1987-02-18 Litton Systems Inc Integrated, force balanced accelerometer
GB2186085A (en) * 1986-02-04 1987-08-05 Draper Lab Charles S Vibratory digital integrating accelerometer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2212274A (en) * 1987-11-09 1989-07-19 Vaisala Oy Capacitive accelerometer and its fabrication method
GB2232489A (en) * 1989-06-05 1990-12-12 Motorola Inc Silicon acceleration sensor
GB2232489B (en) * 1989-06-05 1993-11-03 Motorola Inc Double-integrating silicon acceleration sensing device
US5115291A (en) * 1989-07-27 1992-05-19 Honeywell Inc. Electrostatic silicon accelerometer
EP0459939A1 (en) * 1990-05-30 1991-12-04 Copal Company Limited Capacitive acceleration sensor with free diaphragm
US5253526A (en) * 1990-05-30 1993-10-19 Copal Company Limited Capacitive acceleration sensor with free diaphragm
EP2053413A1 (en) * 2006-11-14 2009-04-29 Panasonic Corporation Sensor
EP2053413A4 (en) * 2006-11-14 2011-11-16 Panasonic Corp Sensor
US8201449B2 (en) 2006-11-14 2012-06-19 Panasonic Corporation Sensor
WO2010101023A1 (en) * 2009-03-04 2010-09-10 コニカミノルタホールディングス株式会社 Parallel displacement mechanism and method for manufacturing parallel displacement mechanism

Also Published As

Publication number Publication date
DE3625411A1 (en) 1988-02-04
GB8716443D0 (en) 1987-08-19
FR2602055A1 (en) 1988-01-29
FR2602055B1 (en) 1989-12-22
DE3625411C2 (en) 1988-05-11
CH673897A5 (en) 1990-04-12
GB2194341B (en) 1990-05-23

Similar Documents

Publication Publication Date Title
GB2194341A (en) Capacitive acceleration sensors
US5495761A (en) Integrated accelerometer with a sensitive axis parallel to the substrate
US5205171A (en) Miniature silicon accelerometer and method
US5483834A (en) Suspended diaphragm pressure sensor
JP3327595B2 (en) 3-axis accelerometer
US5388460A (en) Capacitive sensor for detecting a physical value such as acceleration
US4736629A (en) Micro-miniature accelerometer
RU2144680C1 (en) Shielded variable-capacitance transducer
US5008774A (en) Capacitive accelerometer with mid-plane proof mass
US8136400B2 (en) Accelerometer
US10884020B2 (en) Accelerometer
JPH06302832A (en) Acceleration sensor
JPH04326033A (en) Pressure or acceleration sensor
GB2212274A (en) Capacitive accelerometer and its fabrication method
US10527642B2 (en) Acceleration sensor
SU1346058A3 (en) Triaxial electrostatic accelerometer
JP2586406B2 (en) Capacitive acceleration sensor
JP2003248016A (en) Capacitance-type accelerometer
US6909158B2 (en) Capacitance type dynamical quantity sensor
JPH09318656A (en) Electrostatic capacity type acceleration sensor
US20050066704A1 (en) Method and device for the electrical zero balancing for a micromechanical component
JPH05187947A (en) Capacitance type pressure sensor
US20160091526A1 (en) Sensor
JPH04329371A (en) Electrostatic capacity type dynamic quantity sensor
JP2865552B2 (en) Capacitive pressure sensor

Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PE20 Patent expired after termination of 20 years

Effective date: 20070712