GB2175131B - Plasma reactor and method for removing photoresist - Google Patents

Plasma reactor and method for removing photoresist

Info

Publication number
GB2175131B
GB2175131B GB08602734A GB8602734A GB2175131B GB 2175131 B GB2175131 B GB 2175131B GB 08602734 A GB08602734 A GB 08602734A GB 8602734 A GB8602734 A GB 8602734A GB 2175131 B GB2175131 B GB 2175131B
Authority
GB
United Kingdom
Prior art keywords
plasma reactor
removing photoresist
photoresist
reactor
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08602734A
Other versions
GB8602734D0 (en
GB2175131A (en
Inventor
James F Battey
Perry A Diederich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Psi Star
PSI Star Inc
Original Assignee
Psi Star
PSI Star Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Psi Star, PSI Star Inc filed Critical Psi Star
Publication of GB8602734D0 publication Critical patent/GB8602734D0/en
Publication of GB2175131A publication Critical patent/GB2175131A/en
Application granted granted Critical
Publication of GB2175131B publication Critical patent/GB2175131B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/427—Stripping or agents therefor using plasma means only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08602734A 1985-02-05 1986-02-04 Plasma reactor and method for removing photoresist Expired GB2175131B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69835785A 1985-02-05 1985-02-05

Publications (3)

Publication Number Publication Date
GB8602734D0 GB8602734D0 (en) 1986-03-12
GB2175131A GB2175131A (en) 1986-11-19
GB2175131B true GB2175131B (en) 1988-12-29

Family

ID=24804903

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08602734A Expired GB2175131B (en) 1985-02-05 1986-02-04 Plasma reactor and method for removing photoresist

Country Status (5)

Country Link
JP (1) JPS61191033A (en)
CA (1) CA1281439C (en)
DE (1) DE3603355A1 (en)
FR (1) FR2579059A1 (en)
GB (1) GB2175131B (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3847652A (en) * 1972-12-08 1974-11-12 Nasa Method of preparing water purification membranes
US4362632A (en) * 1974-08-02 1982-12-07 Lfe Corporation Gas discharge apparatus
US4192706A (en) * 1975-01-22 1980-03-11 Tokyo Shibaura Electric Co., Ltd. Gas-etching device
US4230515A (en) * 1978-07-27 1980-10-28 Davis & Wilder, Inc. Plasma etching apparatus
JPS5531154A (en) * 1978-08-28 1980-03-05 Hitachi Ltd Plasma etching apparatus
US4342901A (en) * 1980-08-11 1982-08-03 Eaton Corporation Plasma etching electrode
EP0090067B2 (en) * 1982-03-31 1991-03-20 Ibm Deutschland Gmbh Reactor for reactive ion etching, and etching process

Also Published As

Publication number Publication date
CA1281439C (en) 1991-03-12
JPS61191033A (en) 1986-08-25
DE3603355A1 (en) 1986-08-07
GB8602734D0 (en) 1986-03-12
GB2175131A (en) 1986-11-19
FR2579059A1 (en) 1986-09-19

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee