GB2175131B - Plasma reactor and method for removing photoresist - Google Patents
Plasma reactor and method for removing photoresistInfo
- Publication number
- GB2175131B GB2175131B GB08602734A GB8602734A GB2175131B GB 2175131 B GB2175131 B GB 2175131B GB 08602734 A GB08602734 A GB 08602734A GB 8602734 A GB8602734 A GB 8602734A GB 2175131 B GB2175131 B GB 2175131B
- Authority
- GB
- United Kingdom
- Prior art keywords
- plasma reactor
- removing photoresist
- photoresist
- reactor
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US69835785A | 1985-02-05 | 1985-02-05 |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8602734D0 GB8602734D0 (en) | 1986-03-12 |
GB2175131A GB2175131A (en) | 1986-11-19 |
GB2175131B true GB2175131B (en) | 1988-12-29 |
Family
ID=24804903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08602734A Expired GB2175131B (en) | 1985-02-05 | 1986-02-04 | Plasma reactor and method for removing photoresist |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS61191033A (en) |
CA (1) | CA1281439C (en) |
DE (1) | DE3603355A1 (en) |
FR (1) | FR2579059A1 (en) |
GB (1) | GB2175131B (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3847652A (en) * | 1972-12-08 | 1974-11-12 | Nasa | Method of preparing water purification membranes |
US4362632A (en) * | 1974-08-02 | 1982-12-07 | Lfe Corporation | Gas discharge apparatus |
US4192706A (en) * | 1975-01-22 | 1980-03-11 | Tokyo Shibaura Electric Co., Ltd. | Gas-etching device |
US4230515A (en) * | 1978-07-27 | 1980-10-28 | Davis & Wilder, Inc. | Plasma etching apparatus |
JPS5531154A (en) * | 1978-08-28 | 1980-03-05 | Hitachi Ltd | Plasma etching apparatus |
US4342901A (en) * | 1980-08-11 | 1982-08-03 | Eaton Corporation | Plasma etching electrode |
EP0090067B2 (en) * | 1982-03-31 | 1991-03-20 | Ibm Deutschland Gmbh | Reactor for reactive ion etching, and etching process |
-
1986
- 1986-02-03 CA CA000500981A patent/CA1281439C/en not_active Expired - Lifetime
- 1986-02-04 DE DE19863603355 patent/DE3603355A1/en not_active Withdrawn
- 1986-02-04 FR FR8601507A patent/FR2579059A1/en not_active Withdrawn
- 1986-02-04 JP JP2135786A patent/JPS61191033A/en active Pending
- 1986-02-04 GB GB08602734A patent/GB2175131B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CA1281439C (en) | 1991-03-12 |
JPS61191033A (en) | 1986-08-25 |
GB8602734D0 (en) | 1986-03-12 |
DE3603355A1 (en) | 1986-08-07 |
FR2579059A1 (en) | 1986-09-19 |
GB2175131A (en) | 1986-11-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |