GB2173918B - Stripping solutions for positive photoresists - Google Patents
Stripping solutions for positive photoresistsInfo
- Publication number
- GB2173918B GB2173918B GB08606846A GB8606846A GB2173918B GB 2173918 B GB2173918 B GB 2173918B GB 08606846 A GB08606846 A GB 08606846A GB 8606846 A GB8606846 A GB 8606846A GB 2173918 B GB2173918 B GB 2173918B
- Authority
- GB
- United Kingdom
- Prior art keywords
- positive photoresists
- stripping solutions
- stripping
- solutions
- photoresists
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Detergent Compositions (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08606846A GB2173918B (en) | 1985-03-29 | 1986-03-19 | Stripping solutions for positive photoresists |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB858508333A GB8508333D0 (en) | 1985-03-29 | 1985-03-29 | Composition for integated circuits |
GB08606846A GB2173918B (en) | 1985-03-29 | 1986-03-19 | Stripping solutions for positive photoresists |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8606846D0 GB8606846D0 (en) | 1986-04-23 |
GB2173918A GB2173918A (en) | 1986-10-22 |
GB2173918B true GB2173918B (en) | 1988-11-02 |
Family
ID=26289067
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08606846A Expired GB2173918B (en) | 1985-03-29 | 1986-03-19 | Stripping solutions for positive photoresists |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2173918B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4303923A1 (en) * | 1993-02-10 | 1994-08-11 | Microparts Gmbh | Process for removing plastics from microstructures |
CN100334508C (en) * | 2003-01-10 | 2007-08-29 | ๅๅไป | Photoresist demoulding coposition and model forming method by using said composition |
-
1986
- 1986-03-19 GB GB08606846A patent/GB2173918B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2173918A (en) | 1986-10-22 |
GB8606846D0 (en) | 1986-04-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19970319 |