GB2150312A - Reproducing a planar pattern on a curved surface - Google Patents
Reproducing a planar pattern on a curved surface Download PDFInfo
- Publication number
- GB2150312A GB2150312A GB08331432A GB8331432A GB2150312A GB 2150312 A GB2150312 A GB 2150312A GB 08331432 A GB08331432 A GB 08331432A GB 8331432 A GB8331432 A GB 8331432A GB 2150312 A GB2150312 A GB 2150312A
- Authority
- GB
- United Kingdom
- Prior art keywords
- blank
- block
- image
- planar
- grid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/04—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres
- G02B6/06—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Abstract
An apparatus for reproducing a planar representation, e.g. of a control or focus grid of an electron gun, on the curved surface of e.g. a metal blank (20), comprises a fibre optic block (10) in the form of a bundle of optic fibres, arranged in side-by-side relationship. One end surface (11) of the block is planar and the opposite end surface (12) is hemispherical and conforms to the blank. A light source (40) may illuminate a shadow mask (30) which bears a planar representation of the control or focus grid and a lens (50) focuses an image of the representation onto the planar end surface of the block. This image is projected onto the curved surface of the blank which may bear a layer of photo resist. After exposure, the blank may be etched using photo etch techniques to form the desired grid structure. <IMAGE>
Description
SPECIFICATION
Imaging apparatus
This invention relates to an apparatus for reproduc log a planar image on a curved surface and it relates especially, although not exclusively, to such an apparatus used in the manufacture of the control or focus grid of an electron gun.
Typically, the control or focus grid of an electron gun comprises a hemispherical, mesh-like structure.
Conventionally the grid is produced by machining a hemispherical blank of molybdenum, say, using known spark erosion (EDM) techniques. This procedure tends to be both time consuming and inconvenient; moreover wear on the spark erosion tool and misalignment of the spark erosion tool and blank tends to detract from the quality of the finished product.
It is an object of this invention to substantially alleviate the above-described problem.
According to one aspect of the invention there is provided an apparatus suitable for reproducing an optical image of a planar pattern on a curved surface, said apparatus comprising a fibre optic block consisting of a bundle of fibres arranged fixedly in side-by-side relationship, one end of the block, defined by respective ends of the fibres in the bundles, being planar and the opposite end of the block being curved and a lens arranged to focus the image of said planar pattern at said one end so that said image is projected, in use, onto a said curved surface, conforming to, and lying against, said curved end of the block.
According to another aspect of the invention there is provided a method of manufacturing a control or focus grid of an electron gun comprising the steps of:
providing a sheet metal blank for said grid having a a curved surface and bearing, at said surface, a layer of a photo resist,
using an apparatus, as defined in the immediately preceding paragraph, to project an optical image of a shadow mask, representing the structure of the grid to be manufactured, onto the exposed surface of said layer,
and then etching the blank.
In a preferred embodiment said curved surface is hemispherical. In another embodiment opposite sides of said blank are provided with respective layers of a photo resist and a first said apparatus is used to project an optical image of the shadow mask onto the exposed surface of said layer provided at one side of the blank and a second apparatus is used to project an optical image of the shadow mask onto the exposed surface of said layer provided at the opposite side of the blank.
In order that the invention may be carried into effect an embodiment is now described by reference to the only drawing which shows schematically an apparatus in accordance with the invention.
In this example, an apparatus in accordance with the invention is used in the manufacture of a control or focus grid of an electron gun; as described hereinbefore a grid of this kind usually has a
hemispherical, mesh-like structure.
Atwo-dimensional representation of the grid is
produced by suitably etching or milling a thin disc of
metal thereby to produce a shadow mask. An
apparatus of the present invention is used then to
project an optical image of the representation onto a
hemispherical blank prepared, for example, by
pressing a thin sheet of molybdenum. The form of the two-dimensional representation is such that the
projected image has the desired grid pattern.
The surface of the blank onto which the image is
projected is provided with a layer of a photo resist.
After exposure to the image, the photo resist can be
developed, and the blank etched, using known photo
etch techniques to form the desired grid structure. it will be appreciated that a positive or a negative
photo resist is used in dependence on whether the shadow mask is respectively a positive or a negative of the desired grid structure.
Referring now to the only Figure of the drawings, the apparatus used to project an image of the representation onto the blank comprises a fibre optic block 10. This block consists of a bundle of fibres arranged fixedly, in side-by-side relationship. Opposite ends of the block, defined by the ends of the fibres, are shaped so as to provide a planar surface 11 at one end of the block and and a convex, hemispherical surface 12 at the other end. The hemispherical surface receives a closely fitting blank, shown at 20, from which the grid is to be formed and, as described hereinbefore, the surface of the blank lying adjacent to surface 12 is provided with a layer of a photo resist. A planar shadow mask bearing a representation of the grid pattern is shown schematically at 30.A light source 40 illuminates the mask and a lens 50 focuses an image of the representation at the planar surface 11 of the block.
This image is projected, in turn, onto the exposed surface of the photo resist layer carried by the blank.
After exposure to the image the layer is developed and the blank is etched using known photo etch techniques to produce the desired grid structure.
It will be appreciated that the definition of the projected image will depend both on the number of fibres used in the block and their diameter; typically 750,000 fibres, each approximately 10 > m in diameter may be used.
Instead of projecting an image of the mask onto the concave surface of blank 20, alternatively the image may be projected onto the convex surface; in this circumstance block 10 is provided with a concave rather than a convex hemispherical surface.
In an alternative embodiment, two fibre optic blocks 10, 10' having respective hemispherical surfaces 12, 12', of opposite curvature, are used. The blocks are arranged, using a suitable jig, on opposite sides of the blank so that surfaces 12, 12' fit respectively against the concave and convex surfaces of the blank. Both surfaces are provided with a layer of a photo resist and so the time required for etching is effectively halved.
It will be appreciated that although the abovedescribed example relates to an apparatus used in the manufacture of a hemispherical grid for an electron gun the present invention is intended to encompass other applications requiring reproduction of a planar image on a generally curved, but not necessarily hemispherical, surface.
Claims (7)
1. An apparatus suitable for reproducing an optical image of a planar pattern on a curved surface, said apparatus comprising a fibre optic block consisting of a bundle of fibres arranged fixedly in side-by-side relationship, one end of the block, defined by respective ends of the fibres in the bundle, being planar and the opposite end of the block being curved and a lens arranged to focus the image of said planar pattern at said one end so that said image is projected, in use, onto a said curved surface, conforming to, and lying against, said curved end of the block.
2. An apparatus according to claim 1 wherein said opposite end of the block is hemispherical and convex.
3. An apparatus according to claim 1 wherein said opposite end of the block is hemispherical and concave.
4. A method of manufacturing a control or focus grid of an electron gun comprising the steps of:
providing a sheet metal blank for said grid having a curved surface and bearing, at said surface, a layer of a photo resist,
using an apparatus according to claims 1 to 3 to project an optical image of a shadow mask, representing the structure of the grid to be manufactured, onto the exposed surface of said layer,
and then etching the blank.
5. A method according to claim 4 including providing a sheet metal blank having respective layers of a photo resist on opposite sides of the blank,
using a first said apparatus to project an optical image of the shadow mask onto the exposed surface of said layer provided at one side of the blank and using a second said apparatus to project an optical image of the shadow mask onto the exposed surface of said layer provided at the opposite side of the blank.
6. An apparatus substantially as hereinbefore described by reference to and as illustrated in the accompanying drawings.
7. A method substantially as hereinbefore described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08331432A GB2150312A (en) | 1983-11-24 | 1983-11-24 | Reproducing a planar pattern on a curved surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08331432A GB2150312A (en) | 1983-11-24 | 1983-11-24 | Reproducing a planar pattern on a curved surface |
Publications (2)
Publication Number | Publication Date |
---|---|
GB8331432D0 GB8331432D0 (en) | 1984-01-04 |
GB2150312A true GB2150312A (en) | 1985-06-26 |
Family
ID=10552307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08331432A Withdrawn GB2150312A (en) | 1983-11-24 | 1983-11-24 | Reproducing a planar pattern on a curved surface |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2150312A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0385013A1 (en) * | 1989-03-03 | 1990-09-05 | Trw Inc. | Production of precision patterns on curved surfaces |
FR2686427A1 (en) * | 1992-01-20 | 1993-07-23 | Essilor Int | Optical combination and exposure device employing such a combination |
WO1998047049A1 (en) * | 1997-04-11 | 1998-10-22 | Hughes Electronics Corporation | Apertured nonplanar electrodes and forming methods |
WO2002103455A2 (en) * | 2001-06-18 | 2002-12-27 | Bmc Industries, Inc. | Method and apparatus for imaging with fiber optic arrays on non-flat surfaces |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1031827A (en) * | 1962-12-29 | 1966-06-02 | Texas Instruments Inc | Thermally responsive electrical switch |
GB1180914A (en) * | 1966-04-07 | 1970-02-11 | Int Photon Corp | Improvements in or relating to Photographic Type-composing Machines. |
GB1483878A (en) * | 1975-08-02 | 1977-08-24 | Pilkington Perkin Elmer Ltd | Optical apparatus |
GB2094056A (en) * | 1981-03-03 | 1982-09-08 | English Electric Valve Co Ltd | Photocathodes |
-
1983
- 1983-11-24 GB GB08331432A patent/GB2150312A/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1031827A (en) * | 1962-12-29 | 1966-06-02 | Texas Instruments Inc | Thermally responsive electrical switch |
GB1180914A (en) * | 1966-04-07 | 1970-02-11 | Int Photon Corp | Improvements in or relating to Photographic Type-composing Machines. |
GB1483878A (en) * | 1975-08-02 | 1977-08-24 | Pilkington Perkin Elmer Ltd | Optical apparatus |
GB2094056A (en) * | 1981-03-03 | 1982-09-08 | English Electric Valve Co Ltd | Photocathodes |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0385013A1 (en) * | 1989-03-03 | 1990-09-05 | Trw Inc. | Production of precision patterns on curved surfaces |
FR2686427A1 (en) * | 1992-01-20 | 1993-07-23 | Essilor Int | Optical combination and exposure device employing such a combination |
US5347398A (en) * | 1992-01-20 | 1994-09-13 | Essilor International Cie Generale D'optique | Optical system for forming an image of a plane on a spherical surface |
WO1998047049A1 (en) * | 1997-04-11 | 1998-10-22 | Hughes Electronics Corporation | Apertured nonplanar electrodes and forming methods |
US5934965A (en) * | 1997-04-11 | 1999-08-10 | Hughes Electronics Corporation | Apertured nonplanar electrodes and forming methods |
WO2002103455A2 (en) * | 2001-06-18 | 2002-12-27 | Bmc Industries, Inc. | Method and apparatus for imaging with fiber optic arrays on non-flat surfaces |
WO2002103455A3 (en) * | 2001-06-18 | 2003-11-20 | Bmc Ind Inc | Method and apparatus for imaging with fiber optic arrays on non-flat surfaces |
US6682875B2 (en) * | 2001-06-18 | 2004-01-27 | Bmc Industries, Inc. | Method and apparatus for imaging with fiber optic arrays on non-flat surfaces |
Also Published As
Publication number | Publication date |
---|---|
GB8331432D0 (en) | 1984-01-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6835535B2 (en) | Microlens arrays having high focusing efficiency | |
EP0234059B1 (en) | Rear-projection screen | |
US7170682B2 (en) | Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method | |
US4609259A (en) | Process for producing micro Fresnel lens | |
US4523807A (en) | Method for making a member having microstructure elements arranged thereon | |
US3906520A (en) | Apparatus for producing a high contrast visible image from an object | |
US4789222A (en) | Illuminating optical system | |
EP0855623A3 (en) | Projection exposure method and apparatus | |
EP1091230A3 (en) | Projection optical system that projects an image of a pattern formed on a reticle onto a substrate | |
JPH05217840A (en) | Manufacture of semiconductor device and projection alignerlising the same | |
GB2150312A (en) | Reproducing a planar pattern on a curved surface | |
JP4817907B2 (en) | Photomask for forming resist pattern, method for manufacturing the same, and method for forming resist pattern using the photomask | |
US5456798A (en) | Methods and apparatus for processing curved surface | |
JPH10233361A (en) | Exposure and exposure mask | |
CA2172015A1 (en) | Method for Adjusting a Position of a Solid-State Image Detector in a Given Image-Forming Optical System | |
JPS60124822A (en) | Pattern forming method using reduced projection- exposure device | |
US4964704A (en) | Optical system for use of a laser processing machine | |
US6441909B1 (en) | Pattern projection measurement grating | |
JPS5789731A (en) | Focusing screen | |
US7092165B2 (en) | Microlens arrays having high focusing efficiency | |
KR100377206B1 (en) | Pattern formation method and semiconductor device manufacturing method using this method | |
JP2000162414A (en) | Manufacture of reflection mirror, reflection illuminating device, or semiconductor exposing device | |
JPS62160401A (en) | Optical parts and production thereof | |
JPS57107034A (en) | Exposure equipment for contraction projection | |
WO2002010805A1 (en) | Microlens arrays having high focusing efficiency |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |