GB2137216A - Silylation process - Google Patents
Silylation process Download PDFInfo
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- GB2137216A GB2137216A GB08407289A GB8407289A GB2137216A GB 2137216 A GB2137216 A GB 2137216A GB 08407289 A GB08407289 A GB 08407289A GB 8407289 A GB8407289 A GB 8407289A GB 2137216 A GB2137216 A GB 2137216A
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- silylation
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- 238000000034 method Methods 0.000 title claims abstract description 24
- 238000006884 silylation reaction Methods 0.000 title abstract description 15
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 11
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000010703 silicon Substances 0.000 claims abstract description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical compound BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 2
- 125000005263 alkylenediamine group Chemical group 0.000 abstract description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000003814 drug Substances 0.000 abstract 1
- 239000000543 intermediate Substances 0.000 abstract 1
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 8
- 239000005051 trimethylchlorosilane Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 6
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 6
- AOZQTURTLIEFNQ-UHFFFAOYSA-N n,n'-bis(trimethylsilyl)ethane-1,2-diamine Chemical compound C[Si](C)(C)NCCN[Si](C)(C)C AOZQTURTLIEFNQ-UHFFFAOYSA-N 0.000 description 6
- 150000002894 organic compounds Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 4
- -1 nitrogen-containing organosilicon compounds Chemical class 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- FHTGJZOULSYEOB-UHFFFAOYSA-N 2,6-di(butan-2-yl)phenol Chemical compound CCC(C)C1=CC=CC(C(C)CC)=C1O FHTGJZOULSYEOB-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- NGHVIOIJCVXTGV-ALEPSDHESA-N 6-aminopenicillanic acid Chemical compound [O-]C(=O)[C@H]1C(C)(C)S[C@@H]2[C@H]([NH3+])C(=O)N21 NGHVIOIJCVXTGV-ALEPSDHESA-N 0.000 description 2
- NGHVIOIJCVXTGV-UHFFFAOYSA-N 6beta-amino-penicillanic acid Natural products OC(=O)C1C(C)(C)SC2C(N)C(=O)N21 NGHVIOIJCVXTGV-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- JGSARLDLIJGVTE-MBNYWOFBSA-N Penicillin G Chemical compound N([C@H]1[C@H]2SC([C@@H](N2C1=O)C(O)=O)(C)C)C(=O)CC1=CC=CC=C1 JGSARLDLIJGVTE-MBNYWOFBSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexamethylene diamine Natural products NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- HNVBZKNIPZVUDV-UHFFFAOYSA-N hexoxy(trimethyl)silane Chemical compound CCCCCCO[Si](C)(C)C HNVBZKNIPZVUDV-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 239000000825 pharmaceutical preparation Substances 0.000 description 2
- 229940127557 pharmaceutical product Drugs 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- AMUGRUMFZAKWNM-UHFFFAOYSA-N trimethylsilyl heptanoate Chemical compound CCCCCCC(=O)O[Si](C)(C)C AMUGRUMFZAKWNM-UHFFFAOYSA-N 0.000 description 2
- MASDFXZJIDNRTR-UHFFFAOYSA-N 1,3-bis(trimethylsilyl)urea Chemical compound C[Si](C)(C)NC(=O)N[Si](C)(C)C MASDFXZJIDNRTR-UHFFFAOYSA-N 0.000 description 1
- BRADTAJXVOECJE-UHFFFAOYSA-N 2-hydroxysulfanylazetidine Chemical class OSC1CCN1 BRADTAJXVOECJE-UHFFFAOYSA-N 0.000 description 1
- HSHGZXNAXBPPDL-HZGVNTEJSA-N 7beta-aminocephalosporanic acid Chemical compound S1CC(COC(=O)C)=C(C([O-])=O)N2C(=O)[C@@H]([NH3+])[C@@H]12 HSHGZXNAXBPPDL-HZGVNTEJSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229930186147 Cephalosporin Natural products 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- JOOMLFKONHCLCJ-UHFFFAOYSA-N N-(trimethylsilyl)diethylamine Chemical compound CCN(CC)[Si](C)(C)C JOOMLFKONHCLCJ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229930182555 Penicillin Natural products 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- KXDAEFPNCMNJSK-UHFFFAOYSA-N benzene carboxamide Natural products NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- PLSGHLVOKRQBDY-UHFFFAOYSA-N bromo-butyl-dimethylsilane Chemical compound CCCC[Si](C)(C)Br PLSGHLVOKRQBDY-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229940124587 cephalosporin Drugs 0.000 description 1
- 150000001780 cephalosporins Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 125000004427 diamine group Chemical group 0.000 description 1
- OLLFKUHHDPMQFR-UHFFFAOYSA-N dihydroxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](O)(O)C1=CC=CC=C1 OLLFKUHHDPMQFR-UHFFFAOYSA-N 0.000 description 1
- XYKINWDHXQHRHW-UHFFFAOYSA-N ethenyl-iodo-dimethylsilane Chemical compound C[Si](C)(I)C=C XYKINWDHXQHRHW-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- GVFVNBDEGKVHNR-UHFFFAOYSA-N n,n'-bis(trimethylsilyl)hexane-1,6-diamine Chemical compound C[Si](C)(C)NCCCCCCN[Si](C)(C)C GVFVNBDEGKVHNR-UHFFFAOYSA-N 0.000 description 1
- KGQCHUUKOBTAQP-UHFFFAOYSA-N n,n'-bis[butyl(dimethyl)silyl]pentane-1,5-diamine Chemical compound CCCC[Si](C)(C)NCCCCCN[Si](C)(C)CCCC KGQCHUUKOBTAQP-UHFFFAOYSA-N 0.000 description 1
- IHLYKMGMGZRASN-UHFFFAOYSA-N n,n'-bis[dimethyl(phenyl)silyl]butane-1,4-diamine Chemical compound C=1C=CC=CC=1[Si](C)(C)NCCCCN[Si](C)(C)C1=CC=CC=C1 IHLYKMGMGZRASN-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229940056360 penicillin g Drugs 0.000 description 1
- 150000002960 penicillins Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- CSJWNHJJHIAAIG-SVOQZPEWSA-N ster Chemical compound C1=C(CO)C[C@]2(O)C(=O)C(C)=C[C@H]2[C@@]2(O)[C@H](C)[C@@H](OC(C)=O)[C@@]3(OC(=O)CCCCCCCCC)C(C)(C)[C@H]3[C@@H]21 CSJWNHJJHIAAIG-SVOQZPEWSA-N 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/188—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1896—Compounds having one or more Si-O-acyl linkages
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
Process for silylating an organic or an organosilicon compound having at least one hydroxyl group bonded to carbon or to silicon comprises contacting the compound with both (i) a bis- triorganosilyl(alkylenediamine) and (ii) a triorganohalosilane. The process can be employed for the silylation of intermediates in the production of pharmaceuticals.
Description
SPECIFICATION
Silylation process
This invention relates to a process for the silylation of organic and organosilicon com
pounds.
It is known that silyl groups may be transferred from certain organosilicon compounds to other organosilicon compounds or to organic compounds having one or more reactive hydrogen atoms in the molecule. This socalled silylation process has been employed for a number of years on a commercial scale, especially in the synthesis of pharmaceutical
products. Organosilicon compounds which have been employed as silylating agents in such a process include the trialkylchlorosilanes, for example trimethylchlorosilane, and certain nitrogen-containing organosilicon compounds, hexamethyldisilazane being one of those most commonly used. It is also known from British Patent 760 059 to employ a mixture of a silazane and a trialkylchlorosilane as the silylating agent.However, although the presently used silylating agents perform satisfactorily there has been a continuing search for silylating agents having the advantage of improved efficiency.
British Patent Application No. 21081 39 claims a process for silylating an organic or organosilicon compound wherein the silylating agent is a bis-triorganosilyl(alkylenediamine).
Such compounds have been shown to be relatively efficient with respect to the silylation of alcoholic hydroxyl groups. However, their utility as silylating agents is restricted inasmuch as they are not generally effective in the silylation of carboxylic hydroxyl groups.
We have now surprisingly found that efficient silylation of carboxylic hydroxyl groups can be effected if a triorganohalosilane is employed in conjunction with the hereinbefore described bis-triorganosilyl(alkylenediamines).
It has also been found that the presence of the triorganosilyl halosilane can, at least in some cases, further improve the efficiency of the silylation reaction with respct to alcoholic hydroxyl groups.
Accordingly the present invention provides a process for silylating an organic or an organosilicon compound which comprises contacting an organic or organo-silicon compound having in the molecule one or more hydroxyl groups bonded to carbon or to silicon with both (i) a compound having the general formula (R3Si)NH(CH2)xNH(SiR3) wherein each R represents an alkyl group having from 1 to 4 inclusive carbon atoms, the vinyl group or the phenyl group and x is an integer of from 2 to 6 inclusive and (ii) a compound having the general formula R'3SiY, wherein each R' represents an alkyl group having from 1 to 6 inclusive carbon atoms, the vinyl group or the phenyl group and Y represents a chlorine, bromine or iodine atom.
In the general formula of the compound (i) employed according to the process of this invention R may be methyl, ethyl, propyl, butyl, vinyl or phenyl and x may be any integer from 2 to 6 inclusive. Generally, in the practice of the invention the R groups are preferably methyl. Examples of the operative compounds (i) are therefore N,N'-bis(trimethylsilyl)ethylenediamine, N,N'bis(dimethylphenyl- silyl)tetramethylenediamine, N, N '-bis(butyldi- methylsilyl)pentamethylenediamine and N,N'bis(trimethylsilyl)hexamethylenediamine. The compounds (i) may be prepared by the reaction of a triorganohalosilane e.g. R3SiCI with an alkylene diamine.
In the general formula of the trioganohalosilanes (ii) R may represent a C, 6 alkyl group, the vinyl group or the phenyl group, but is normally preferably methyl or butyl. The substituent Y is preferably a chlorine atom.
Examples of compounds (ii) are trimethylchlorosilane, phenyldimethylchlorosilane, vinyldimethyliodosilane and dimethylbutylbromosilane.
Any organic or organosilicon compound having at least one -OH group bonded directly to a carbon atom or a hydroxyl group bonded to a silicon atom may be silylated according to the process of this invention. Examples of such organic and organosilicon compounds are alcohols e.g. isopropanol, n-hexanol, octadecanol and benzyl alcohol, glycols and polyglycols e.g. ethylene glycol, hexylene glycol and hydroxy-terminated poly(alkylene oxides), phenols e.g. phenol, m-cresol, p-xylenol, pyrogallol and 2,6-di-secbutylphenol, acids e.g.
heptanoic acid and benzoic acid and silanols and siloxanols e.g. diphenylsilanediol and 1,3dimethyl-1, 3-diphenyldisiloxanediol- 1 3. The process of this invention finds particular application in the silylation of certain biologically active substances or the precursors thereof, a procedure which is carried out on the commercial scale in connection with the synthesis and modification of pharmaceutical products such as penicillins, cephalosporins and ster iods.
In such commercial applications the group to be silylated is usually an -OH group, either as present in carboxy (-CO.OH) or alcoholic (EC.OH) groups. The process of this invention may be employed for example in effecting the protective silylation of penicillin G during its conversion to 6-aminopenicillanic acid, the protective silylation of 6-aminopenicillanic acid during its conversion to 6-acylamidopenicillanic acids and the protective silyation of 7aminocephalosporanic acid and 7-aminodesacetoxyphalosporanic acid during their conversion to 7-acylamidocephalosporanic acid and 7-acylamido-desacetoxycephalosporanic acid respectively. It may also be employed in the conversion of 6-acylamidopenicillanic acid sulphoxides to 7-acylamidodesacetoxycephalosporanic acids, and the preparation of the silyl esters of azetidine 2-sulphenates.
In the performance of the process of this invention the reactants (i) and (ii) may be employed in widely varying relative proportions. As little as 0.01 mole of triorganochlorosilane (ii) per mole of bis-triorganosilyl (alkylenediamine) may be used. For most efficient silyllation, however, it is preferred to employ at least one, and more preferably two, moles of (ii) per mole of (i). The total proportion of (i) and (ii) employed will depend on the desired degree of silylation of available OH groups.
Where the maximum degree of silylation is required sufficient of (i) and (ii) should be employed to provide at least one R3Si- or R'3Si- group per hydroxyl group.
The silylation reaction may be carried out in the presence or absence of a diluent. Diluents which may be employed include inert organic solvents, for example toluene, xylene, benzene and dimethyl formamide. Some reaction will in many cases take place spontaneously on mixing the reactants at normal temperatures.
If desired, however, elevated temperatures e.g. 40 to 150"C may be employed to expedite the reaction and/or facilitate recovery of the reaction product.
Example 1
N,N'-bis(trimethylsilyl)ethylenediamine (0.68g, 0.0033 mole), trimethylchlorosilane (0.369, 0.0033 mole), 2,6-di-secbutylphenol (2.069, 0.01 mole) and dry dichloromethane (5 ml) were mixed together and maintained at 30"C for 3 minutes. Examination of the mixture by gas liquid chromotography after this time had elapsed showed that 80% by weight of the phenol reactant had been converted to 2,6-secbutylphenoxy-trimethylsilane.
The process was repeated except that the
N, N'-bis(trimethylsilyl)ethylenediam ine was employed in a proportion of 0.0025 mole (0.51g) and the trimethylchlorosilane in a proportion of 0.005 mole (0.549). The yield of the silylated phenol was 88.8%.
For purposes of comparison the above described reaction was repeated employing the same reaction conditions but with the diamine/chlorosilane combination replaced in turn by known silylating agents. Sufficient of the known silylating agents was employed to provide one silyl group for each hydroxyl group.
The percentage conversions obtained were as follows:
Hexamethyldisilazane 4.2
Hexamethyldisilazane/
CH3SiCI
(equimolar mixture) 7.2
Trimethylsilyldiethylamine 20.9
N, N 'bis(trimethylsilyl)urea 9.0
Example 2
To hexan-1-ol (5.1 g, 0.05 mole) in dichloromethane (50ml) were added trimethylchlorosilane (1.819, 0.0166 mole) and N,N'bis(trimethylsily)ethlenediamine (3.449, 0.0166 mole). The mixture was stirred under reflux for 30 minutes, filtered and the solvent removed.
The residue, hexanoxytrimethylsilane, was obtained in 59% yield (5.15g).
The process was repeated except that the diamine reactant was replaced by bis(trimethylsilyl)hexamethylene diamine (0.0166 mole). The compound hexanoxytrimethylsilane was obtained in 70% yield.
Example 3
Heptanoic acid (6.59, 0.05 mole) in acetonitrile (50ml) was reacted with bis(trimethylsilyl)ethylene diamine (3.44 g, 0.0166 mole) and trimethylchlorosilane (1.819, 0.0166 mole) as described in Example 2. The desired product trimethylsilylheptanoate was obtained in 20% yield.
When the process was repeated employing 0.025 mole of trimethylchlorosilane and 0.0125 mole of the bis(trimethylsilyl)ethylenediamine the yield of the product increased to 45%.
For comparison heptanoic acid (6.5g, 0.05 mole), acetonitrile (50 ml) and bis(trimethylsilyl)ethylenediamine (6.129, 0.03 mole) were mixed together and the mixture refluxed for 30 minutes. When the solvent was removed and the remaining product fractionated no trimethylsilylheptanoate was found.
Example 4
The procedure of Example 3 was repeated except that the diamine was replaced with bis(trimethylsilyl)hexamethylene diamine. The yield of product was 50% when equimolar proportions of diamine and silane were employed and 55% when the molar proportion of trimethylchlorosilane was doubled.
Claims (5)
1. A process for silylating an organic or an organosilicon compound which comprises contacting an organic or an organosilicon compound having in the molecule one or more hydroxyl groups bonded to carbon or to silicon with both (i) a compound having the general formula (R3Si)NH(CH2)xNH(SiR3) wherein each R represents an alkyl group having from 1 to 4 inclusive carbon atoms, the vinyl group or the phenyl group and x is an integer of from 2 to 6 inclusive and (ii) a compound having the general formula R'3SiY, wherein each R' represents an alkyl group having from 1 to 6 inclusive carbon atoms, the vinyl group or the phenyl group and Y represents a chlorine, bromine or iodine atom.
2. A process as claimed in Claim 1 wherein each R is methyl.
3. A process as claimed in Claim 1 or
Claim 2 wherein each R' is methyl or butyl.
4. A process as claimed in any one of the preceding claims wherein at least one mole of (ii) is employed per mole of (i).
5. A process as claimed in Claim 1 substantially as described with reference to the
Examples herein.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08407289A GB2137216B (en) | 1983-03-30 | 1984-03-21 | Silylation process |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB838308823A GB8308823D0 (en) | 1983-03-30 | 1983-03-30 | Silylation process |
GB08407289A GB2137216B (en) | 1983-03-30 | 1984-03-21 | Silylation process |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8407289D0 GB8407289D0 (en) | 1984-04-26 |
GB2137216A true GB2137216A (en) | 1984-10-03 |
GB2137216B GB2137216B (en) | 1986-03-26 |
Family
ID=26285686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08407289A Expired GB2137216B (en) | 1983-03-30 | 1984-03-21 | Silylation process |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2137216B (en) |
-
1984
- 1984-03-21 GB GB08407289A patent/GB2137216B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB8407289D0 (en) | 1984-04-26 |
GB2137216B (en) | 1986-03-26 |
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PCNP | Patent ceased through non-payment of renewal fee |