GB2136987B - Alignment of two members e.g. a photomask and wafer spaced parallel planes - Google Patents
Alignment of two members e.g. a photomask and wafer spaced parallel planesInfo
- Publication number
- GB2136987B GB2136987B GB08405979A GB8405979A GB2136987B GB 2136987 B GB2136987 B GB 2136987B GB 08405979 A GB08405979 A GB 08405979A GB 8405979 A GB8405979 A GB 8405979A GB 2136987 B GB2136987 B GB 2136987B
- Authority
- GB
- United Kingdom
- Prior art keywords
- photomask
- alignment
- members
- spaced parallel
- parallel planes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47462683A | 1983-03-11 | 1983-03-11 |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8405979D0 GB8405979D0 (en) | 1984-04-11 |
GB2136987A GB2136987A (en) | 1984-09-26 |
GB2136987B true GB2136987B (en) | 1986-08-06 |
Family
ID=23884353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08405979A Expired GB2136987B (en) | 1983-03-11 | 1984-03-07 | Alignment of two members e.g. a photomask and wafer spaced parallel planes |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS59168445A (en) |
DE (1) | DE3408764A1 (en) |
GB (1) | GB2136987B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2710967B2 (en) * | 1988-11-22 | 1998-02-10 | 株式会社日立製作所 | Manufacturing method of integrated circuit device |
GB0518096D0 (en) * | 2005-09-06 | 2005-10-12 | Fleet Line Markers Ltd | Alignment apparatus |
US9046783B2 (en) | 2012-03-27 | 2015-06-02 | Panasonic Intellectual Property Management Co., Ltd. | Photomask, and pattern formation method and exposure apparatus using the photomask |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4037969A (en) * | 1976-04-02 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Zone plate alignment marks |
FR2436967A1 (en) * | 1978-09-19 | 1980-04-18 | Thomson Csf | METHOD FOR OPTICAL ALIGNMENT OF PATTERNS IN TWO CLOSE PLANS AND ALIGNMENT DEVICE IMPLEMENTING SUCH A METHOD |
-
1984
- 1984-03-07 GB GB08405979A patent/GB2136987B/en not_active Expired
- 1984-03-09 DE DE19843408764 patent/DE3408764A1/en not_active Ceased
- 1984-03-09 JP JP59044177A patent/JPS59168445A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS59168445A (en) | 1984-09-22 |
GB8405979D0 (en) | 1984-04-11 |
GB2136987A (en) | 1984-09-26 |
DE3408764A1 (en) | 1984-09-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930307 |