GB2131748B - Silicon etch process - Google Patents

Silicon etch process

Info

Publication number
GB2131748B
GB2131748B GB08235658A GB8235658A GB2131748B GB 2131748 B GB2131748 B GB 2131748B GB 08235658 A GB08235658 A GB 08235658A GB 8235658 A GB8235658 A GB 8235658A GB 2131748 B GB2131748 B GB 2131748B
Authority
GB
United Kingdom
Prior art keywords
etch process
silicon etch
silicon
etch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08235658A
Other versions
GB2131748A (en
Inventor
Derek Joseph Day
John Charles White
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Secretary of State for Defence
Original Assignee
UK Secretary of State for Defence
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Secretary of State for Defence filed Critical UK Secretary of State for Defence
Priority to GB08235658A priority Critical patent/GB2131748B/en
Publication of GB2131748A publication Critical patent/GB2131748A/en
Application granted granted Critical
Publication of GB2131748B publication Critical patent/GB2131748B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30608—Anisotropic liquid etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
GB08235658A 1982-12-15 1982-12-15 Silicon etch process Expired GB2131748B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08235658A GB2131748B (en) 1982-12-15 1982-12-15 Silicon etch process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08235658A GB2131748B (en) 1982-12-15 1982-12-15 Silicon etch process

Publications (2)

Publication Number Publication Date
GB2131748A GB2131748A (en) 1984-06-27
GB2131748B true GB2131748B (en) 1986-05-21

Family

ID=10534981

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08235658A Expired GB2131748B (en) 1982-12-15 1982-12-15 Silicon etch process

Country Status (1)

Country Link
GB (1) GB2131748B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4968634A (en) * 1988-05-20 1990-11-06 Siemens Aktiengesellschaft Fabrication process for photodiodes responsive to blue light
US6309975B1 (en) 1997-03-14 2001-10-30 Micron Technology, Inc. Methods of making implanted structures
US7247578B2 (en) * 2003-12-30 2007-07-24 Intel Corporation Method of varying etch selectivities of a film
DE102019106964A1 (en) * 2019-03-19 2020-09-24 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung METHOD FOR STRUCTURING A SEMICONDUCTOR SURFACE AND A SEMICONDUCTOR BODY WITH A SEMICONDUCTOR SURFACE THAT HAS AT LEAST ONE STRUCTURE

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4093503A (en) * 1977-03-07 1978-06-06 International Business Machines Corporation Method for fabricating ultra-narrow metallic lines

Also Published As

Publication number Publication date
GB2131748A (en) 1984-06-27

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20001215