GB2099601B - X-ray lithography - Google Patents
X-ray lithographyInfo
- Publication number
- GB2099601B GB2099601B GB8214160A GB8214160A GB2099601B GB 2099601 B GB2099601 B GB 2099601B GB 8214160 A GB8214160 A GB 8214160A GB 8214160 A GB8214160 A GB 8214160A GB 2099601 B GB2099601 B GB 2099601B
- Authority
- GB
- United Kingdom
- Prior art keywords
- ray lithography
- lithography
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
- G03F7/2039—X-ray radiation
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/869,541 US4215192A (en) | 1978-01-16 | 1978-01-16 | X-ray lithography apparatus and method of use |
GB791199A GB2012452B (en) | 1978-01-16 | 1979-01-12 | Lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2099601A GB2099601A (en) | 1982-12-08 |
GB2099601B true GB2099601B (en) | 1983-06-02 |
Family
ID=26270210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8214160A Expired GB2099601B (en) | 1978-01-16 | 1979-01-12 | X-ray lithography |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2099601B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2383849A (en) * | 2002-01-03 | 2003-07-09 | Zarlink Semiconductor Ltd | Resist development |
-
1979
- 1979-01-12 GB GB8214160A patent/GB2099601B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2099601A (en) | 1982-12-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930112 |