GB2089110B - High power pulsed electron beam annealing system - Google Patents

High power pulsed electron beam annealing system

Info

Publication number
GB2089110B
GB2089110B GB8132399A GB8132399A GB2089110B GB 2089110 B GB2089110 B GB 2089110B GB 8132399 A GB8132399 A GB 8132399A GB 8132399 A GB8132399 A GB 8132399A GB 2089110 B GB2089110 B GB 2089110B
Authority
GB
United Kingdom
Prior art keywords
electron beam
high power
pulsed electron
annealing system
power pulsed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8132399A
Other languages
English (en)
Other versions
GB2089110A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Department of Energy
Original Assignee
US Department of Energy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by US Department of Energy filed Critical US Department of Energy
Publication of GB2089110A publication Critical patent/GB2089110A/en
Application granted granted Critical
Publication of GB2089110B publication Critical patent/GB2089110B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
GB8132399A 1980-11-26 1981-10-27 High power pulsed electron beam annealing system Expired GB2089110B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/210,488 US4371774A (en) 1980-11-26 1980-11-26 High power linear pulsed beam annealer

Publications (2)

Publication Number Publication Date
GB2089110A GB2089110A (en) 1982-06-16
GB2089110B true GB2089110B (en) 1984-10-03

Family

ID=22783101

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8132399A Expired GB2089110B (en) 1980-11-26 1981-10-27 High power pulsed electron beam annealing system

Country Status (5)

Country Link
US (1) US4371774A (cg-RX-API-DMAC7.html)
JP (1) JPS57117247A (cg-RX-API-DMAC7.html)
DE (1) DE3146961A1 (cg-RX-API-DMAC7.html)
FR (1) FR2494905A1 (cg-RX-API-DMAC7.html)
GB (1) GB2089110B (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HU190959B (en) * 1984-04-20 1986-12-28 Gyulai,Jozsef,Hu Method and apparatus for the irradiation of solid materials with ions
US4680474A (en) * 1985-05-22 1987-07-14 Varian Associates, Inc. Method and apparatus for improved ion dose accuracy
US5433836A (en) * 1991-03-25 1995-07-18 Commonwealth Scientific And Industrial Research Organization Arc source macroparticle filter
KR101843212B1 (ko) 2010-05-28 2018-03-28 인스터튜트 오브 지오라지컬 앤드 뉴클리어 싸이언시즈 리미티드 자기 나노클러스터
US9535100B2 (en) 2012-05-14 2017-01-03 Bwxt Nuclear Operations Group, Inc. Beam imaging sensor and method for using same
US9383460B2 (en) 2012-05-14 2016-07-05 Bwxt Nuclear Operations Group, Inc. Beam imaging sensor
GB2519511A (en) * 2013-09-27 2015-04-29 Zeiss Carl Microscopy Gmbh Particle optical system having a liner tube and/or compensating coils

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3812319A (en) * 1968-06-10 1974-05-21 I Brukovsky Automatic control of the duty cycle of an electron beam heating device
US3708722A (en) * 1970-12-18 1973-01-02 Erie Technological Prod Inc Semiconductor device with soldered terminals and plastic housing and method of making the same
US4066863A (en) * 1974-06-26 1978-01-03 International Business Machines Corporation Method and system for automatically correcting aberrations of a beam of charged particles
GB1454196A (en) * 1974-07-04 1976-10-27 Sokolov B G Electron beam apparatus
US4127762A (en) * 1974-09-24 1978-11-28 Paton Boris E Method for controlling and stabilizing fusion depth in electron-beam welding and device for effecting same
US4091256A (en) * 1975-01-16 1978-05-23 The United States Of America As Represented By The Secretary Of The Air Force Pulsed atomic beam apparatus
DE2519537C2 (de) * 1975-05-02 1982-11-04 Leybold-Heraeus GmbH, 5000 Köln Elektronenstrahlgerät für Heiz-, Schmelz- und Verdampfungszwecke mit Ablenksystemen
US3999097A (en) * 1975-06-30 1976-12-21 International Business Machines Corporation Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system
US4038484A (en) * 1976-06-21 1977-07-26 Airco, Inc. Electron beam heating system
US4182958A (en) * 1977-05-31 1980-01-08 Rikagaku Kenkyusho Method and apparatus for projecting a beam of electrically charged particles
US4199689A (en) * 1977-12-21 1980-04-22 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam exposing method and electron beam apparatus
US4283631A (en) * 1980-02-22 1981-08-11 Varian Associates, Inc. Bean scanning and method of use for ion implantation

Also Published As

Publication number Publication date
FR2494905A1 (fr) 1982-05-28
JPS57117247A (en) 1982-07-21
FR2494905B1 (cg-RX-API-DMAC7.html) 1985-04-19
DE3146961A1 (de) 1982-06-24
GB2089110A (en) 1982-06-16
US4371774A (en) 1983-02-01

Similar Documents

Publication Publication Date Title
DE2963753D1 (en) Laser beam annealing
JPS57114232A (en) Electron beam drawing system
DE3176789D1 (en) High temperature ion beam source
JPS57105953A (en) Electron beam projecting device
GB2086651B (en) Device for irradiating with electron beams
JPS56104434A (en) Laser annealing method
EP0113168A3 (en) Electron beam window
JPS56146544A (en) I beam
JPS5788789A (en) High energy laser
DE3373752D1 (en) Agile beam laser
JPS56155582A (en) Power increasing device for laser beam
JPS57114233A (en) Electron beam drawing system
DE3570153D1 (en) Device for the irradiation of matter by an electron beam
JPS57196444A (en) Electron beam emission device
GB8304935D0 (en) Electron beam focussing
DE3172441D1 (en) Electron beam exposure system
JPS54112173A (en) Electron beam system
DE3173312D1 (en) Electron beam exposure system
GB2089110B (en) High power pulsed electron beam annealing system
GB2065362B (en) Electron beam-switched discharge for rapidly pulsed lasers
JPS56153655A (en) Electron beam pulse generator
DE3067625D1 (en) Electron beam system
JPS5793528A (en) Electron beam device
DE3062881D1 (en) Electron beam irradiation apparatus
JPS56165577A (en) Chamber for electron beam welding

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee