GB2029017B - Control of deposition of thin films - Google Patents
Control of deposition of thin filmsInfo
- Publication number
- GB2029017B GB2029017B GB7927951A GB7927951A GB2029017B GB 2029017 B GB2029017 B GB 2029017B GB 7927951 A GB7927951 A GB 7927951A GB 7927951 A GB7927951 A GB 7927951A GB 2029017 B GB2029017 B GB 2029017B
- Authority
- GB
- United Kingdom
- Prior art keywords
- deposition
- control
- thin films
- films
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000008021 deposition Effects 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/08—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D5/00—Control of dimensions of material
- G05D5/02—Control of dimensions of material of thickness, e.g. of rolled material
- G05D5/03—Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB7927951A GB2029017B (en) | 1978-08-18 | 1979-08-10 | Control of deposition of thin films |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB7833927 | 1978-08-18 | ||
GB7927951A GB2029017B (en) | 1978-08-18 | 1979-08-10 | Control of deposition of thin films |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2029017A GB2029017A (en) | 1980-03-12 |
GB2029017B true GB2029017B (en) | 1982-10-13 |
Family
ID=26268606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB7927951A Expired GB2029017B (en) | 1978-08-18 | 1979-08-10 | Control of deposition of thin films |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2029017B (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4367044A (en) * | 1980-12-31 | 1983-01-04 | International Business Machines Corp. | Situ rate and depth monitor for silicon etching |
FR2531774A1 (en) * | 1982-08-12 | 1984-02-17 | Cit Alcatel | DEVICE FOR CONTROLLING THE THICKNESS OF LOWLY ABSORBENT THIN LAYERS |
US4676883A (en) * | 1986-03-03 | 1987-06-30 | Sierracin Corporation | Optical disk transmission monitor for deposited films |
EP0290657A1 (en) * | 1987-05-15 | 1988-11-17 | KSB Aktiengesellschaft | Method and device for measuring the optical properties of thin layers |
FR2649419B1 (en) * | 1989-07-06 | 1991-09-20 | France Etat | METHOD FOR CONTROLLING THE THICKNESS OF AN ANTI-REFLECTIVE LAYER AND INSTALLATION FOR IMPLEMENTING IT |
DE3925536A1 (en) * | 1989-08-02 | 1991-02-07 | Leybold Ag | ARRANGEMENT FOR THICKNESSING OF THICK FILMS |
US5117192A (en) * | 1990-01-12 | 1992-05-26 | Leybold Inficon Inc. | Control circuitry for quartz crystal deposition monitor |
US5112642A (en) * | 1990-03-30 | 1992-05-12 | Leybold Inficon, Inc. | Measuring and controlling deposition on a piezoelectric monitor crystal |
JP4345158B2 (en) * | 1999-10-15 | 2009-10-14 | ソニー株式会社 | Optical component manufacturing apparatus and manufacturing method |
PL1602919T3 (en) | 2004-06-01 | 2008-06-30 | Applied Mat Gmbh & Co Kg | Measuring device for the survey of the transmittance of a coating |
-
1979
- 1979-08-10 GB GB7927951A patent/GB2029017B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2029017A (en) | 1980-03-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |