GB201508098D0 - Perforated sheet with optimised thermal emission behaviour - Google Patents

Perforated sheet with optimised thermal emission behaviour

Info

Publication number
GB201508098D0
GB201508098D0 GBGB1508098.9A GB201508098A GB201508098D0 GB 201508098 D0 GB201508098 D0 GB 201508098D0 GB 201508098 A GB201508098 A GB 201508098A GB 201508098 D0 GB201508098 D0 GB 201508098D0
Authority
GB
United Kingdom
Prior art keywords
perforated sheet
thermal emission
emission behaviour
optimised thermal
optimised
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB1508098.9A
Other versions
GB2538259A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
China Triumph International Engineering Co Ltd
Original Assignee
China Triumph International Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by China Triumph International Engineering Co Ltd filed Critical China Triumph International Engineering Co Ltd
Priority to GB1508098.9A priority Critical patent/GB2538259A/en
Publication of GB201508098D0 publication Critical patent/GB201508098D0/en
Publication of GB2538259A publication Critical patent/GB2538259A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
GB1508098.9A 2015-05-12 2015-05-12 Perforated sheet with optimised thermal emission behaviour Withdrawn GB2538259A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1508098.9A GB2538259A (en) 2015-05-12 2015-05-12 Perforated sheet with optimised thermal emission behaviour

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1508098.9A GB2538259A (en) 2015-05-12 2015-05-12 Perforated sheet with optimised thermal emission behaviour

Publications (2)

Publication Number Publication Date
GB201508098D0 true GB201508098D0 (en) 2015-06-24
GB2538259A GB2538259A (en) 2016-11-16

Family

ID=53489496

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1508098.9A Withdrawn GB2538259A (en) 2015-05-12 2015-05-12 Perforated sheet with optimised thermal emission behaviour

Country Status (1)

Country Link
GB (1) GB2538259A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59914510D1 (en) * 1999-03-29 2007-11-08 Antec Solar Energy Ag Apparatus and method for coating substrates by vapor deposition by means of a PVD process
KR101015277B1 (en) * 2008-12-10 2011-02-15 삼성모바일디스플레이주식회사 evaporation source
CN101525743B (en) * 2009-04-23 2011-06-15 浙江嘉远格隆能源股份有限公司 Method for depositing semi-conductor film on substrate by using close-space sublimation technology and device thereof

Also Published As

Publication number Publication date
GB2538259A (en) 2016-11-16

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)