GB201309975D0 - Optical element arrangement with an optical element split into optical sub-elements - Google Patents

Optical element arrangement with an optical element split into optical sub-elements

Info

Publication number
GB201309975D0
GB201309975D0 GB201309975A GB201309975A GB201309975D0 GB 201309975 D0 GB201309975 D0 GB 201309975D0 GB 201309975 A GB201309975 A GB 201309975A GB 201309975 A GB201309975 A GB 201309975A GB 201309975 D0 GB201309975 D0 GB 201309975D0
Authority
GB
United Kingdom
Prior art keywords
optical element
optical
elements
sub
split
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB201309975A
Other versions
GB2513927A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to GB201309975A priority Critical patent/GB2513927A/en
Publication of GB201309975D0 publication Critical patent/GB201309975D0/en
Priority to PCT/EP2014/059395 priority patent/WO2014180931A1/en
Publication of GB2513927A publication Critical patent/GB2513927A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB201309975A 2013-05-10 2013-05-10 Optical element arrangement with an optical element split into optical sub-elements Withdrawn GB2513927A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB201309975A GB2513927A (en) 2013-05-10 2013-05-10 Optical element arrangement with an optical element split into optical sub-elements
PCT/EP2014/059395 WO2014180931A1 (en) 2013-05-10 2014-05-07 Optical element arrangement with an optical element split into optical sub-elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB201309975A GB2513927A (en) 2013-05-10 2013-05-10 Optical element arrangement with an optical element split into optical sub-elements

Publications (2)

Publication Number Publication Date
GB201309975D0 true GB201309975D0 (en) 2013-07-17
GB2513927A GB2513927A (en) 2014-11-12

Family

ID=48805745

Family Applications (1)

Application Number Title Priority Date Filing Date
GB201309975A Withdrawn GB2513927A (en) 2013-05-10 2013-05-10 Optical element arrangement with an optical element split into optical sub-elements

Country Status (2)

Country Link
GB (1) GB2513927A (en)
WO (1) WO2014180931A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011076549A1 (en) * 2011-05-26 2012-11-29 Carl Zeiss Smt Gmbh Optical arrangement in a microlithographic projection exposure apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6225027B1 (en) * 1998-08-06 2001-05-01 Euv Llc Extreme-UV lithography system
WO2005081060A2 (en) * 2004-02-25 2005-09-01 Carl Zeiss Smt Ag Device consisting of at least one optical element
JP5199068B2 (en) * 2005-05-09 2013-05-15 カール・ツァイス・エスエムティー・ゲーエムベーハー Optical element adjustment assembly
JP4883775B2 (en) * 2006-08-11 2012-02-22 キヤノン株式会社 Optical apparatus, exposure apparatus, and device manufacturing method
DE102010043498A1 (en) * 2010-11-05 2012-05-10 Carl Zeiss Smt Gmbh Projection objective of a microlithographic projection exposure apparatus designed for EUV, and method for optical adjustment of a projection objective
JP6093753B2 (en) * 2011-03-23 2017-03-08 カール・ツァイス・エスエムティー・ゲーエムベーハー EUV mirror mechanism, optical system with EUV mirror mechanism, and method of operating an optical system with EUV mirror mechanism
DE102011076549A1 (en) * 2011-05-26 2012-11-29 Carl Zeiss Smt Gmbh Optical arrangement in a microlithographic projection exposure apparatus
DE102011077223B4 (en) * 2011-06-08 2013-08-14 Carl Zeiss Smt Gmbh measuring system
WO2013004278A1 (en) * 2011-07-01 2013-01-10 Carl Zeiss Smt Gmbh Optical imaging arrangement with individually actively supported components

Also Published As

Publication number Publication date
GB2513927A (en) 2014-11-12
WO2014180931A1 (en) 2014-11-13

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)