GB2009435B - Production of transfer materials - Google Patents

Production of transfer materials

Info

Publication number
GB2009435B
GB2009435B GB7849025A GB7849025A GB2009435B GB 2009435 B GB2009435 B GB 2009435B GB 7849025 A GB7849025 A GB 7849025A GB 7849025 A GB7849025 A GB 7849025A GB 2009435 B GB2009435 B GB 2009435B
Authority
GB
United Kingdom
Prior art keywords
production
transfer materials
transfer
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7849025A
Other versions
GB2009435A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Letraset International Ltd
Original Assignee
Letraset International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Letraset International Ltd filed Critical Letraset International Ltd
Priority to GB7849025A priority Critical patent/GB2009435B/en
Publication of GB2009435A publication Critical patent/GB2009435A/en
Application granted granted Critical
Publication of GB2009435B publication Critical patent/GB2009435B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
GB7849025A 1977-11-16 1978-12-19 Production of transfer materials Expired GB2009435B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB7849025A GB2009435B (en) 1977-11-16 1978-12-19 Production of transfer materials

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB4770477 1977-11-16
GB7849025A GB2009435B (en) 1977-11-16 1978-12-19 Production of transfer materials

Publications (2)

Publication Number Publication Date
GB2009435A GB2009435A (en) 1979-06-13
GB2009435B true GB2009435B (en) 1982-06-30

Family

ID=26266113

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7849025A Expired GB2009435B (en) 1977-11-16 1978-12-19 Production of transfer materials

Country Status (1)

Country Link
GB (1) GB2009435B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2182888A (en) * 1985-11-13 1987-05-28 Colin George Thompson Method of making transfers
DE3766315D1 (en) * 1986-08-06 1991-01-03 Ciba Geigy Ag NEGATIVE PHOTORESIST BASED ON POLYPHENOLS AND EPOXY COMPOUNDS OR VINYL ETHERS.
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
US4994346A (en) * 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds

Also Published As

Publication number Publication date
GB2009435A (en) 1979-06-13

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee