GB1586095A - Process for the preparation of lower alkyl 2-(n-r'-pyrryl)-a-lower alkanoic acid esters - Google Patents
Process for the preparation of lower alkyl 2-(n-r'-pyrryl)-a-lower alkanoic acid esters Download PDFInfo
- Publication number
- GB1586095A GB1586095A GB3476077A GB3476077A GB1586095A GB 1586095 A GB1586095 A GB 1586095A GB 3476077 A GB3476077 A GB 3476077A GB 3476077 A GB3476077 A GB 3476077A GB 1586095 A GB1586095 A GB 1586095A
- Authority
- GB
- United Kingdom
- Prior art keywords
- group
- loweralkyl
- copper
- loweralkoxy
- phenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002253 acid Substances 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 53
- 150000002148 esters Chemical class 0.000 title claims description 10
- 125000000217 alkyl group Chemical group 0.000 title abstract description 4
- 238000002360 preparation method Methods 0.000 title description 22
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims abstract description 55
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 29
- 238000006243 chemical reaction Methods 0.000 claims abstract description 21
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 6
- 239000001257 hydrogen Substances 0.000 claims abstract description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 18
- 125000005843 halogen group Chemical group 0.000 claims description 18
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 claims description 18
- 239000003446 ligand Substances 0.000 claims description 15
- -1 loweralkoxy Chemical group 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 9
- OXHNLMTVIGZXSG-UHFFFAOYSA-N 1-Methylpyrrole Chemical group CN1C=CC=C1 OXHNLMTVIGZXSG-UHFFFAOYSA-N 0.000 claims description 7
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 claims description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 5
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 4
- 150000001450 anions Chemical group 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 239000011541 reaction mixture Substances 0.000 claims description 4
- BPELEZSCHIEMAE-UHFFFAOYSA-N salicylaldehyde imine Chemical compound OC1=CC=CC=C1C=N BPELEZSCHIEMAE-UHFFFAOYSA-N 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 125000002827 triflate group Chemical group FC(S(=O)(=O)O*)(F)F 0.000 claims description 4
- 150000008282 halocarbons Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 3
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 2
- 150000004699 copper complex Chemical class 0.000 claims description 2
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 claims description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 abstract description 4
- 125000005907 alkyl ester group Chemical group 0.000 abstract 2
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 abstract 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 description 13
- 230000001737 promoting effect Effects 0.000 description 13
- 125000005595 acetylacetonate group Chemical group 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 9
- YVPJCJLMRRTDMQ-UHFFFAOYSA-N ethyl diazoacetate Chemical compound CCOC(=O)C=[N+]=[N-] YVPJCJLMRRTDMQ-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate trihydrate Substances [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 4
- ZKXWKVVCCTZOLD-FDGPNNRMSA-N copper;(z)-4-hydroxypent-3-en-2-one Chemical compound [Cu].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O ZKXWKVVCCTZOLD-FDGPNNRMSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- OORBYQVSQSXKRG-UHFFFAOYSA-N ethyl 2-(1-methylpyrrol-2-yl)acetate Chemical compound CCOC(=O)CC1=CC=CN1C OORBYQVSQSXKRG-UHFFFAOYSA-N 0.000 description 3
- BSQHTIJMZDDKAZ-UHFFFAOYSA-N ethyl 2-(1h-pyrrol-2-yl)acetate Chemical compound CCOC(=O)CC1=CC=CN1 BSQHTIJMZDDKAZ-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000001632 sodium acetate Substances 0.000 description 3
- 235000017281 sodium acetate Nutrition 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- FUGKCSRLAQKUHG-UHFFFAOYSA-N 5-chloro-2-hydroxybenzaldehyde Chemical compound OC1=CC=C(Cl)C=C1C=O FUGKCSRLAQKUHG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical compound BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 2
- 239000012035 limiting reagent Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- ZFYIQPIHXRFFCZ-QMMMGPOBSA-N (2s)-2-(cyclohexylamino)butanedioic acid Chemical compound OC(=O)C[C@@H](C(O)=O)NC1CCCCC1 ZFYIQPIHXRFFCZ-QMMMGPOBSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- SYYOUHJJSOLSJD-UHFFFAOYSA-N 2-(1-methylpyrrol-2-yl)acetic acid Chemical class CN1C=CC=C1CC(O)=O SYYOUHJJSOLSJD-UHFFFAOYSA-N 0.000 description 1
- GVUHUYQEAGMUNJ-UHFFFAOYSA-N 2-(1h-pyrrol-2-yl)acetic acid Chemical class OC(=O)CC1=CC=CN1 GVUHUYQEAGMUNJ-UHFFFAOYSA-N 0.000 description 1
- OFQCQIGMURIECL-UHFFFAOYSA-N 2-[2-(diethylamino)ethyl]-2',6'-dimethylspiro[isoquinoline-4,4'-oxane]-1,3-dione;phosphoric acid Chemical compound OP(O)(O)=O.O=C1N(CCN(CC)CC)C(=O)C2=CC=CC=C2C21CC(C)OC(C)C2 OFQCQIGMURIECL-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- 229910017610 Cu(NO3) Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 1
- ZCZCUEJLJIYKID-UHFFFAOYSA-L [Cu+2].[O-]S(F)(=O)=O.[O-]S(F)(=O)=O Chemical compound [Cu+2].[O-]S(F)(=O)=O.[O-]S(F)(=O)=O ZCZCUEJLJIYKID-UHFFFAOYSA-L 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229940121363 anti-inflammatory agent Drugs 0.000 description 1
- 239000002260 anti-inflammatory agent Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- ITUFJMIZRRRYMT-UHFFFAOYSA-N copper 2-hydroxybenzaldehyde Chemical compound [Cu+2].OC1=CC=CC=C1C=O.OC1=CC=CC=C1C=O ITUFJMIZRRRYMT-UHFFFAOYSA-N 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- YRNNKGFMTBWUGL-UHFFFAOYSA-L copper(ii) perchlorate Chemical compound [Cu+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O YRNNKGFMTBWUGL-UHFFFAOYSA-L 0.000 description 1
- SBTSVTLGWRLWOD-UHFFFAOYSA-L copper(ii) triflate Chemical compound [Cu+2].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F SBTSVTLGWRLWOD-UHFFFAOYSA-L 0.000 description 1
- JIDMEYQIXXJQCC-UHFFFAOYSA-L copper;2,2,2-trifluoroacetate Chemical compound [Cu+2].[O-]C(=O)C(F)(F)F.[O-]C(=O)C(F)(F)F JIDMEYQIXXJQCC-UHFFFAOYSA-L 0.000 description 1
- JBKWHOFHGZQDRX-UHFFFAOYSA-L copper;2,4,6-trinitrophenolate Chemical compound [Cu+2].[O-]C1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O.[O-]C1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O JBKWHOFHGZQDRX-UHFFFAOYSA-L 0.000 description 1
- ITUFJMIZRRRYMT-UHFFFAOYSA-L copper;2-formylphenolate Chemical compound [Cu+2].[O-]C1=CC=CC=C1C=O.[O-]C1=CC=CC=C1C=O ITUFJMIZRRRYMT-UHFFFAOYSA-L 0.000 description 1
- ILVZMCMEHGKWFH-UHFFFAOYSA-N copper;2-hydroxybenzaldehyde Chemical class [Cu+2].OC1=CC=CC=C1C=O ILVZMCMEHGKWFH-UHFFFAOYSA-N 0.000 description 1
- NYQDWOFSGPEVSI-UHFFFAOYSA-N copper;5-chloro-2-hydroxybenzaldehyde Chemical compound [Cu+2].OC1=CC=C(Cl)C=C1C=O.OC1=CC=C(Cl)C=C1C=O NYQDWOFSGPEVSI-UHFFFAOYSA-N 0.000 description 1
- RIOSFUBRIQHOMS-UHFFFAOYSA-L copper;benzenesulfonate Chemical compound [Cu+2].[O-]S(=O)(=O)C1=CC=CC=C1.[O-]S(=O)(=O)C1=CC=CC=C1 RIOSFUBRIQHOMS-UHFFFAOYSA-L 0.000 description 1
- SSOVMNXYUYFJBU-UHFFFAOYSA-L copper;ethanesulfonate Chemical compound [Cu+2].CCS([O-])(=O)=O.CCS([O-])(=O)=O SSOVMNXYUYFJBU-UHFFFAOYSA-L 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- OSMQVBUFTAZVCC-UHFFFAOYSA-N ethyl 2-(1-ethylpyrrol-2-yl)acetate Chemical compound CCOC(=O)CC1=CC=CN1CC OSMQVBUFTAZVCC-UHFFFAOYSA-N 0.000 description 1
- GNWJRJHNOLWEFV-UHFFFAOYSA-N ethyl acetate;1-methylpyrrole Chemical class CCOC(C)=O.CN1C=CC=C1 GNWJRJHNOLWEFV-UHFFFAOYSA-N 0.000 description 1
- UQSQSQZYBQSBJZ-UHFFFAOYSA-M fluorosulfonate Chemical compound [O-]S(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-M 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- XIZNAOUORZTQBH-UHFFFAOYSA-N methyl 2-(1-ethylpyrrol-2-yl)acetate Chemical compound CCN1C=CC=C1CC(=O)OC XIZNAOUORZTQBH-UHFFFAOYSA-N 0.000 description 1
- CGYVDYLHQYNGFC-UHFFFAOYSA-N methyl 2-(1-methylpyrrol-2-yl)acetate Chemical compound COC(=O)CC1=CC=CN1C CGYVDYLHQYNGFC-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 1
- 238000006053 organic reaction Methods 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 125000001484 phenothiazinyl group Chemical class C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229940075930 picrate Drugs 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-M picrate anion Chemical compound [O-]C1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- SGIRBTNMPLJAKF-UHFFFAOYSA-N propan-2-yl 2-(1-methylpyrrol-2-yl)acetate Chemical compound CC(C)OC(=O)CC1=CC=CN1C SGIRBTNMPLJAKF-UHFFFAOYSA-N 0.000 description 1
- VFWIAHUFZBPNLM-UHFFFAOYSA-N propyl 2-(1-methylpyrrol-2-yl)acetate Chemical compound CCCOC(=O)CC1=CC=CN1C VFWIAHUFZBPNLM-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229940066767 systemic antihistamines phenothiazine derivative Drugs 0.000 description 1
- 125000006337 tetrafluoro ethyl group Chemical group 0.000 description 1
- UPSPUYADGBWSHF-UHFFFAOYSA-N tolmetin Chemical compound C1=CC(C)=CC=C1C(=O)C1=CC=C(CC(O)=O)N1C UPSPUYADGBWSHF-UHFFFAOYSA-N 0.000 description 1
- 229960001017 tolmetin Drugs 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/337—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
- C07F1/005—Compounds containing elements of Groups 1 or 11 of the Periodic Table without C-Metal linkages
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- Chemical & Material Sciences (AREA)
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
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- Pyrrole Compounds (AREA)
Abstract
2-(N-R'-pyrryl)- alpha -alkanoic acid lower alkyl esters, wherein R' is hydrogen or lower primary alkyl, are obtained isomer-selectively and in high yield and purity if, in the reaction of N-R'-pyrrole with an alpha -diazoalkanoic acid lower alkyl ester, a copper(II) complex of the formula <IMAGE> or <IMAGE> is employed as a promoter, the symbols used being defined in Patent Claim 1. Novel complexes of this type, namely acetylacetonato-copper(II) trifluoromethylsulphonate are obtained by reacting copper acetylacetonate with trifluoromethylsulphonic acid.
Description
(54) PROCESS FOR THE PREPARATION OF LOWERALKYL
2-(N-R'-PYRRYL)-a-LOWERALKANOIC ACID ESTERS
(71) -We, McNEIL LABORATORIES, INCORPORATED, a Corporation organised and existing under the laws of the State of Pennsylvania, United States of America, of
Camp Hill Road, Fort Washington, State of Pennsylvania, United States of America, do hereby declare the invention for which we pray that a patent may be granted to us, and the method by which it is to be performed, to be particularly described in and by the following statement:
The present invention relates to a process for the preparation of loweralkyl 2-(N-R'pyrryl)-a-loweralkanoic acid esters and, more particularly, for the preparation of loweralkyl 2-(N-methylpyrryl) acetic acid esters.
Lower alkyl 2-(N-R -pyrryl-a-loweralkanoic acid esters comprise a very useful class of compounds, being intermediates for the preparation of phenothiazine derivatives (see, for example, British Patent No. 823,733) and for the synthesis of the well-known antiinflammatory agent tolmetin and its analogues (see, for example, U.S. Patent No.
3,752,826), and are represented by the following generic formula:
wherein R is a loweralkyl group; R' is a hydrogen atom or a primary loweralkyl group; and
R" is a hydrogen atom or a loweralkyl group.
The prior art method for the preparation of compounds of this type is by the decomposition of a loweralkyl a-diazoloweralkanoate of formula (II), in the presence of an
N-R'-pyrrole of formula (III), with copper bronze as a catalyst or promoting agent. See, for example, H. Rapoport and E. Jorgensen, J. Org. Chem., 14, 664(1949). By the term "promoting agent" as used herein is meant a material which effects or facilitates a chemical reaction even when employed in a much less than a stoichiometric amount (i.e., which functions as a catalyst, in the usual sense of the term, but which may be chemically altered during the course of the reaction). Given the chemical modification of the promoting agent, it necessarily differs from a true catalyst, which by definition remains unchanged by the reaction that it induces.
It has recently been discovered that this prior art preparative procedure does not yield only the desired 2-isomer but also yields some of the 3-isomer of formula (IV), as a by-product. This prior art process is illustrated by the following:
CH-COOR 1 N2iCOOR coDer.bronze) (I) + (III) (11) wherein R, R', and R" are as previously defined.
As these two isomers are practically inseparable it is desirable to have a process whereby one obtains a reaction product as enriched as possible in the desired 2-isomer (as "pure" as possible). As used herein, the term "pure" refers specifically to the degree of enrichment in the favored 2-isomer (i.e., to the relative amount of the desired 2-isomer compared to the undesired 3-isomer). The greater the ratio of 2-isomer to 3-isomer, the more "pure" the product mixture is said to be. Throughout the present application, this "purity" will be represented as the percent of the total amount of loweralkyl (N-R'-pyrryl)-a-loweralkanoic acid ester which is the desired 2-isomer.
It is also desirable to have a process which produces as much of the desirable 2-isomer as possible, regardless of the purity thereof. This characteristic will be referred to as the "yield" of the reaction and will be based upon the limiting reagent loweralkyl a-diazoloweralkanoate.
The prior art procedure is less than desirable in both the purity and the yield of the product. For example, the prior art preparative method for N-methylpyrrole acetic acid ethyl esters generally produces a product mixture having a purity of about 82% of the desired 2-isomer and a yield of the desired 2-isomer of about 32%, based on the ethyl diazoacetate. It should be noted at this point that, for this particular product, the literature often reports yields based upon N-methylpyrrole rather than ethyl diazoacetate. these yields appear considerably larger than those as calculated herein because they are not based upon the limiting reagent, ethyl diazoacetate. For valid comparison of two percentage yields, they must both be based on the same starting material. Throughout this application all yields are based on the amount of loweralkyl a-diazoloweralkanoate consumed in the reaction.
It is known in the chemical art that the effect of different types of catalysts on an individual reaction, or on related reactions, is very difficult to predict. A given catalyst may be ineffective in one reaction, while being the catalyst of choice in a closely related reaction.
Different catalysts may result in different products or different ratios of products from the same starting materials. This unpredictability with respect to copper catalysts in diazo compound reactions is discussed, for example, on page 251 of "The Reaction of Diazoacetic
Esters with Alkenes, Alkynes, Heterocyclic and Aromatic Compounds", Chapter 3, in
Organic Reactions, 18, 217 (1970), by V. Dane and E.W. Warnhoff.
It has now surprisingly been discovered that the yield of the desired 2-isomer can be significantly increased and, in some cases, the purity of the product improved through the use of the copper (II) 1,3-diketonate, copper (II) salicylaldehyde, copper (II) monoamino1,3-diketonate, and copper (I1) salicylaldimine complexes of the invention as promoting agents.
According to the present invention there is provided a process for preparing a loweralkyl 2-(N-R'-pyrryl)-a-loweralkanoic acid ester of the formula:
wherein R is a loweralkyl group, R' is a hydrogen atom or a primary loweralkyl group, and
R" is a hydrogen atom or a loweralkyl group, which process comprises reacting an
N-R'-pyrrole of the formula:
wherein R' is as above defined with a loweralky a-diazoloweralkanoate of the formula:
wherein R and R" are as defined above, in the presence of a copper complex of the formula;
wherein: n is the integer 1 or 2;
X is an anion derived from a monoprotic strong acid, lower-alkoxy or phenoxy;
is a 1 ,3-diketonate or salicylaldehyde ligand capable of forming a bidentate complex with copper (II); and
is a monoamino-1,3-diketonate or salicylaldimine ligand capable of forming a bidentate complex with copper (II) wherein R12 is a hydrogen atom, or a lower alkyl; loweralkoxy; hydroxy; loweralkylamino; diloweralkylamino; phenyl substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group, or a halogen atom; phenylloweralkyl; phenylloweralkyl in which said phenyl is substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group, or a halogen atom; phenylamino, and phenylamino in which said phenyl is substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group or a halogen atom; provided that the R12 groups on both ligands taken together may also be:
wherein a and b are integers such that a + b is from 1 to 6, and R13 is a hydrogen atom, a loweralkyl, phenyl, or phenyl group substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group or a halogen atom;
wherein c is an integer from 3 to 5;
(iii) o-phenylene or o-phenyline substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group or a halogen atom; or
(iv) -(CH2)d-[NR14-(CH2),If-NR1S-(CH2)g, wherein d, e, and g are each 2 or 3,f is0 or 1, and R14 and R15 are each independently a hydrogen atom or a loweralkyl group.
A. Complexes with dioxo ligands
In the dioxo copper (II) salicylaldehyde and 1,3-diketonate complexes (promoting agents) of the formula:
wherein n is as above defined, and X is an anion derived from a monoprotic strong acid, such anions may be, for example, -OSO2CF3, picrate, hexafluorophosphate, nitrate, perchlorate, halide, loweralkylsulfonate, arenesulfonate, such as benzenesulfonate, toluenesulfonate and naphthalenesulfonate, fluoborate, trifluoracetate or fluorosulfate.
The group
is intended to encompass all salicylaldehyde and 1 ,3-diketonate ligands capable of forming bidentate complexes with copper (II), whatever the substitution thereon. When n is 2, the two ligands may be the same or different.
It should be understood that certain 1 ,3-diketonate ligands, because of their molecular geometry, are incapable of forming bidentate complexes with copper (II). Examples of 1,3-diketones which are unsuitable for making such copper complexes are
Since the keto groups on these compounds are directed away from each other due to the molecular geometry, these compounds cannot function as bidentate ligands.
The expression "1,3-diketonate" includes, for example, compounds of formula
wherein R1 and R3 are each independently a loweralkyl, loweralkoxy, perfluoroloweralky, phenyl, 2-thienyl or ss-naphthyl groups and R2 is a hydrogen atom or a loweralkyl group.
Also included within the expression "1,3-diketonate" are the semicyclic 1,3-diketonates exemplified by the following:
wherein R4 is a loweralkyl, loweralkoxy, phenyl or perfluoroloweralkyl group; m is 0 or 1; and R5 is a loweralkyl or perfluoroloweralky group.
The expression "salicylaldehyde" includes, for example, compounds of formula
wherein R6 and R, are each independently a hydrogen or halogen atom, or a nitro, lower alkoxy or loweralkyl group; provided that R6 and R7 are oriented meta to each other if both are other than hydrogen atoms; and R8 is a hydrogen atom, a loweralkyl or perfluoroloweralkyl group.
Also included within the expression "salicylaldehyde" is the bicyclic compound of formula:
wherein R8 is as previously defined.
By the terms "loweralkyl' and "loweralkoxy" as used herein are meant straight or branched chain saturated aliphatic hydrocarbon radicals having from one to six carbon atoms such as, methyl, ethyl, isopropyl or pentyl, and methoxy, ethoxy, isopropoxy or pentoxy. By the term "primary loweralkyl" is meant a loweralkyl group in which the bonding carbon atom is unbranched such as, methyl, ethyl, isobutyl or pentyl, but excluding, for example, isopropyl and sec-butyl.
By the term "perfluoroloweralkyl" is meant a loweralkyl group in which all of the hydrogen atoms have been replaced by fluoro such as, trifluoromethyl or tetrafluoroethyl. The term "halo" includes fluoro, chloro, bromo, and iodo; and the term "halide" includes fluoride, chloride, bromide, and iodide.
The 1,3-diketones useful for preparation of the copper (II) 1,3-diketonate complexes are generally known or may be readily prepared according to the procedures described in Org.
Syn., Coll. Vol. 3, 16, 17, 251(1951) or C. R. Hauser, Org. Reactions, 8, 59 (1954). The salicylaldehydes useful for the preparation of the said complexes are also generally known.
The preferred copper (II) 1 ,3-diketonate and copper (II) salicylaldehyde complexes (promoting agents) may be represented by the following formulae:
wherein Rg and R10 are each independently a loweralkyl, perfluoroloweralkyl, phenyl, loweralkoxy, or 2-thienyl group.
wherein Xis a OSO2CF3 or OCH3 group; and
wherein R11 is a hydrogen or halogen atom, or a nitro or loweralkoxy group.
Certain of the complexes of formula (XIV) are novel (e.g., those wherein X' is -OSO2CF3). They may be prepared by metathesis of an appropriate complex of formula (X) with one equivalent of a suitable strong acid such as HOSO2CF3.
The remaining dioxo complexes are generally known or may be readily prepared according to the procedures described by, for example, E. W. Berg and J. T. Truemper, J.
Phys. Chem., 64, 487 (1960); J. H. Bertrand and R. L. Kaplan, Inorg. Chem., 4, 1657 (1965); or K. Clarke, J. Chem. Soc. 245 (1963). This latter reference teaches the preparation of the following complexes.
wherein A is a chlorine, bromine or iodine atom or a nitro group; and B is a methoxy or nitro group or a chlorine atom.
B. Complexes with oxoamino ligands
In the oxoamino copper (II) complexes of the formula: the radical
is as defined above.
These oxoamino copper (II) salicylaldimine and copper (II) monoamino-1.3-diketonate complexes and the ligands from which thev are made are generally known or may be readily prepared according to the procedures described bv R. H. Holm. et al: Prog. in Inorg.
Chem.. 7. 83(1966) and references contained therein. The ligands are conveniently prepared by reacting the appropriate corresponding dioxo ligand with an equivalent amount of the appropriate amine.
Preferred oxoamino copper (II) complexes may be represented by the following formula:
wherein R12 is as above defined.
The complexes wherein both R12 groups are taken together may be illustrated by the following: selected from class (i) above:
wherein a and b are as previously defined.
More preferred oxoamino copper (II) complexes ma! be represented by the following formulae:
wherein: Rt. R-. Rs. and Rl2 are as previously defined.
Most preferred copper (II) salicylaldimine complexes (promoting agents) may be represented by the following formula:
wherein R12 is a hydrogen atom or a loweralkyl; phenyl or phenyl group substituted with from one to three members which are each a loweralkyl or loweralkoxy group, or a halogen atom or a phenylloweralkyl group.
In one embodiment of the method of the present invention the N-R'-pyrrole is present in excess, preferably about three equivalents for every equivalent of the loweralkyl a-diazoloweralkanoate. The promoting agent is a compound of formula (V) or (XVI), and is present in an amount of from 0.1 to 2 mol percent, but preferably 1 mol percent based on the loweralkyl a-diazoloweralkanoate. The reaction may be conducted in the N-R'-pyrrole as solvent; a halogenated hydrocarbon, such as methylene chloride, chloroform, bromoform, carbon tetrachloride or 1,2-dichloroethane; an aliphatic hydrocarbon, such as cyclohexane or heptane; or an aromatic hydrocarbon, such as benzene, toluene or xylene.
The preferred solvent is the N-R'-pyrrole itself, or a halogenated hydrocarbon, which is convenient for attainment of the required reaction temperature. The reaction mixture may be heated up to as high as 110 C., but a convenient operating temperature range is from 30 to 800C. The preferred operating temperature depends upon the particular promoting agent used.
A small portion of the loweralkyl a-diazoloweralkanoate is added initially for reasons of safety; i.e., to prevent an accumulation of the reagent which could result in the violent and sudden production of heat and nitrogen gas. Once nitrogen evolution has begun, the remainder of the loweralkyl a-diazoloweralkanoate is added drop by drop maintaining a temperature sufficient for smooth and steady nitrogen evolution by warming or cooling as needed. Subsequent to addition of the loweralkyl a-diazoloweralkanoate, the mixture may be heated to ensure completion of the reaction, but this is frequently unnecessary.
The mixture of the desired 2-isomer and the undesired 3-isomer may be isolated by known techniques, for example by distillation.
A preferred process of the invention is that wherein the N-R'-pyrrole is N-methylpyrrole.
A more preferred process of the invention is that wherein the promoting agent is a compound of formula (XI) wherein Rg is a methyl group and Rlo is a phenyl group or Rg and Rlo are both loweralkyl groups, a compound of formula (XII), a compound of formula (XIV) wherein Xis a methoxy group, and compounds of formula (XX) wherein R12 is a hydrogen atom, or an isopropyl, p-chlorophenyl or benzyl group. These more preferred processes result in very high purity of the desired 2-isomer.
A second more preferred process of the invention is that wherein the promoting agent is a compound of the formula (XI) wherein Rg is a methyl group and Rlo is a perfluoroloweralkyl group or Rg and Rlo are both perfluoroloweralkyl groups, a compound of formula (XIV) wherein X' is an OSO2CF3 group, and compounds of formula (XV) wherein R11 is a chlorine or hydrogen atom, or a nitro group. These more preferred processes result in a large increase in yield of the desired 2-isomer.
Better yield and generally better purity are obtained through use of the promoting agents and processes of the invention. The purity of the reaction mixture is as high as 93-94% in some cases and generally the same as or better than in the prior art, while the yield of the desired 2-isomer is increased by at least 10% and by as much as 50% over the yield in the prior art methods.
The present invention is further illustrated by the following examples:
EXAMPLE I
Ethyl 2- (N-methylpyrryl) acetate
In a flask is placed 9.72 grams (120 mmol) N-methyl pyrrole and 158 mg (.016 mmole; 1.5 mol%) Cu(acetylacetonate)2 abbreviated herein as "Cu(acac)2". The mixture is heated to 50"C. after which a few drops of the 4.56 grams (40 mmol) ethyl diazoacetate are added with stirring. Nitrogen gas is evolved after about 1 minute and the mixture darkens, whereupon the remainder of the ethyl diazoacetate is added drop by drop over a period of 15 minutes. The reaction mixture is then heated and stirred for a further 45 minutes to insure completion of the reaction.
The excess and unreacted N-methylpyrrole is recovered by distillation of the product mixture in vacuo, after which the residue is flash distilled at a pot temperature of 80-100 C.
(0.5 torr) to yield 2.40 grams of yellow liquid (36% yield based on ethyl diazoacetate) comprising 91% of the desired ethyl 2-(N-methylpyrryl) acetate.
EXAMPLE II Ethyl 2-pyrrylacetate
Following the procedure of Example I, but substituting an equivalent amount of pyrrole for the N-methylpyrrole used therein, resulted in 50% yield (based on ethyl diazoacetate) of the desired ethyl 2-pyrrylacetate in 94% purity. For comparison, the prior art process using copper bronze as the promoting agent resulted in only 38% yield (based on ethyl diazoacetate) of the desired ethyl 2-pyrrylacetate in 92% purity.
EXAMPLE III
The purity and yields of the desired 2-isomer ethyl 2-(N-methylpyrryl)acetate obtained following the procedure of Example I but using equivalent amounts of illustrative catalysts of the invention for the Cu(acac)2 used therein are shown in the following table, wherein Y and P stand for percentage yield and percentage purity, respectively: Formula R9 R10 X' R11 R12 Y P (XI) CH3 phenyl - - - 37 90
CH3 CF3 - - - 43 79 t-butyl t-butyl - - - 36 89
CF3 CF3 - - - 44 78 phenyl phenyl - - - 37 87
CH3 OC2H5 - - - 41 84 2-thienyl CF3 - - - 40 83 (XII) - - - - - 40 89 (XIII) - - - - - 39 86 (XIV) - - OSO2CF3 - - 47 81 - - OCH3 - - 40 90 Formula R9 R10 X' R11 R12 Y P (XV) - - - Cl - 48 80 - - - H - 45 83 - - - NO2 - 47 75 - - - OCH3 - 42 83 (XX) - - - - H 46 91 - - - - OH 42 82 - - - - CH(CH3)2 47 94 - - - - benzyl 44 94 - - - - p-ClC6H4 47 90 - - - - -CH2CH2-* 37 89 - - - - -(CH2CH2)2NH* 37 89 - - - - -(CH2CH2NHCH2)2* 38 89 *both R12 groups taken together PREPARATION I Bis(S-chlorosalicylaldehyde) Copper(ll)
To a solution of 1.61g of copper (II) nitrate trihydrate and 1.25g of sodium acetate in 25 ml of deionized water is added a warm solution of 2.08g of 5-chlorosalicylaldehyde in 25 ml of 95% ethanol. The mixture is stirred at 450-500C for 15 minutes, cooled, and filtered.
The yellow-green solid which results, Bis(5-chlorosalicylaldehyde) copper (II), is rinsed with water and 95% ethanol and dried in vacuo.
PREPARATION II
Following the procedure of Preparation I,but substituting for the 5-chlorosalicylaldehyde used therein, an equivalent amount of the suitable starting material, there are prepared the following representative complexes:
Bis(benzoylacetonato) Copper(II);
Bis(2-acetyltetralonato) Copper(II); Bis(2-acetylcyclohexanonato) Copper(II); Bis 1,1,1,2,2,3,3 ,-heptafluoro-7 ,7-dimethyloctane-4,6-dionato) Copper(II);
Bis(3-trifluoroacetylcamphorato) Copper(II);
Bis(2,4-heptanedionato) Copper(II); Bis(1,1,1-trifluoropentane-2,4-dionato) Copper(II); Bis[1 ,1,1,5,5 ,5-hexafluoropentane-2 ,4-dionato] Copper(II);
Bis(3-methylpentane-2,-dionato) Copper(II);
Bis(ethylacetoacetato) Copper(II); Bis(3-pivaloyl camphorato Copper(II); Bis(2-furoylacetonato) Copper(II); and Bis dibenzoylmethanato) Copper(II).
PREPARATION III (Acetylacetonato) Copper(ll) trifluoromethylsulfonate
A suspension of 262 mg. (1 mmole) of Cu(acac)2 in 3 ml of dichloromethane is treated dropwise with stirring with 150 mg (1 mmole) of trifluoromethyl sulfonic acid. The resulting green solution is decanted from a small amount of residual solid and diluted with hexane, whereupon a green precipitate, (acetylacetonato) Copper(II) trifluoromethylsulfonate, results, m.p. 182"C.
PREPARATION IV
Following the procedure of Preparation III, but substituting for the Cu(acac)2 and the trifluoromethylsulfonic acid used therein, the equivalent amount of suitable starting materials, there are prepared the following complexes:
(Acetylacetonato) Copper (II) trifluoroacetate;
(Benzoylacetonato) Copper (II) fluorosulfate; (Acetylacetonato) Copper (II) picrate;
(Acetylacetonato) Copper (II) hexafluorophosphate;
(Acetylacetonato) Copper (II) nitrate;
(Acetylacetonato) Copper (II) perchlorate;
(Acetylacetonato) Copper (II) chloride;
(Acetylacetonato) Copper (II) ethylsulfonate; (Acetylacetonato) Copper (II) benzenesulfonate; (Acetylacetonato) Copper (II) fluoborate.
PREPARATION V
Bis- ( -salicylaldiminoethyl) amine Copper (II)
To a solution of 2.44g (20 mmol) of salicylaldehyde in 20 ml of absolute ethanol was added 1.03g (10 mmol) of diethylenetriamine and the whole was allowed to stand at ambient temperature for one hour. A solution of Copper (II) acetate (from 2.42g of
Cu(NO3)2.3H2O and 1.7g of sodium acetate) in 20 ml of deionized water was added, and the whole was allowed to stand for 18 hours. The resulting purple crystals were collected by filtration, washed with 75% aqueous ethanol, and dried in vacuo at 70" to yield Bis-( -salicylaldiminoethyl)amine Copper(II); m.p. ca. 240"C (dec).
PREPARATION VI
Following the procedure of Preparation V, but substituting an equivalent amount of triethylenetetramine for the diethylenetriamine used therein, there is prepared: 1,2-Bis(P-salicylaldiminoethylamino)ethane Copper (II); m.p. ca. 240"C (dec).
EXAMPLE IV
Following the procedure of Example I, but substituting for the N-methylpyrrole and ethyl diazoacetate used therein equivalent amounts of the appropriate starting materials, the following 2-pyrrylacetic acid esters are produced in increased yield or yield and purity over the prior art process:
Methyl 2-(N-methylpyrryl)acetate;
Methyl 2-(N-ethylpyrryl)acetate;
Ethyl 2-(N-ethylpyrryl)acetate;
n-Propyl 2-(N-methylpyrryl)acetate;
Isopropyl 2-(N-methylpyrryl)acetate;
Methyl 2-(N-methylpyrryl)-a-propionate; Butyl 2-(N-ethylpyrryl)-α-propionate; Ethyl 2-(N-n-propylpyrryl)-α-isovalerate; and
Methyl 2-(N-isobutylpyrryl)-α-acetate.
PREPARATION VII
Bis(Salicylaldimino) Copper (11) Following the procedure of S. V. Sheat and T. N. Waters, Inorg. Nucl. Chem., 26, 1221 (1965), 500 mg of bis(salicylaldehyde) copper (II) was combined with 5 ml of 10% ammonium hydroxide and the mixture was stirred vigorously for one hour. The solid was filtered off and dried in air, affording 410 mg of pale green powder identified by its ultraviolet spectrum as bis(salicylaldimino) copper (II).
PREPARATION VIII
Bis(N-isopropylsalicylaldimino) Copper (II) Following the procedures of L. Sacconi et al, J. Chem. Soc., 1964, 274, 1.22g of salicylaldehyde (10 mmol) in 10 ml of absolute ethanol was treated with 590 mg of isopropylamine (10 mmol) at ca. 150. The reaction was stoppered to prevent loss of the volatile amine and allowed to stand for one hour. A solution of 1.21g of Cu (NO3)2.3H2O and 0.85g of sodium acetate in 10 ml of deionized water was added with stirring. Filtration afforded bis(N-isopropylsalicylaldimino) copper (II) as a brown solid (air-dried); m.p.
140-143.
PREPARATION IX Following the procedure of Preparation VIII, but substituting equivalent amounts of the appropriate salicylaldehyde or 1,3-diketone and amine or hydrazine for the salicylaldehyde and isopropylamine used therein, the following are prepared: Bis(N-hydroxysalicylaldimino) Copper (II); Bis(N-benzylsalicylaIdimino) Copper (II); Bis[N-(p-chlorophenyI)salicylaldimino Copper Bis N- n-hexyl)salicylaldimino] Copper (II);
Bis[N-(p-tolyl)salicylaldimino] Copper (II);
Bis[N-(p-chlorobenzyl)salicylaldimino] Copper (II);
Bis[N-methoxysalicylaldimino] Copper (II);
Bis[N-methylaminosalicylaldimino] Copper (II);
Bis[N-(dimethylamino)salicylaldimino] Copper (II)
Bis[N-(phenylamino)salicylaldimino] Copper (II);
Bis[N-(p-chlorophenylamino)salicylaldimino] Copper (II);
The above Examples have been provided by way of illustration and not to limit the scope of the present invention, which scope is defined by the following claims.
Claims (19)
1. A process for preparing a loweralkyl 2-(N-R'-pyrryl)-a-loweralkanoic acid ester of the formula:
wherein R is a loweralkyl group; R' is a hydrogen atom or a primary loweralkyl group; and
R" is a hydrogen atom or a loweralkyl group, which process comprises reacting an
N-R'-pyrrole of the formula:
wherein R' is as above defined with a loweralkyl a-diazoloweralkanoate of the formula:
wherein R and R" are as defined above, in the presence of a copper complex of the formula:
wherein: n is the integer 1 or 2;
X is an anion derived from a monoprotic strong acid, loweralkoxy or phenoxy;
is a 1 ,3-diketonate or salicylaldehyde ligand capable of forming a bidentate complex with copper (II); and
is a monoamine-1, 3-diketonate or salicylaldimine ligand capable of forming a bidentate complex with copper (II) wherein R12 is a hydrogen atom, or a loweralkyl; loweralkoxy; hydroxy; loweralkylamino; diloweralkylamino; phenyl substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group, or a halogen atom; phenylloweralkyl; phenylloweralkyl in which said phenyl is substituted with from one to three members which are each indpendently a loweralkyl or loweralkoxy group, or a halogen atom; phenylamino, and phenylamino in which said phenyl is substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group or a halogen atom; provided that the R12 groups on both ligands taken together may also be:
wherein a and b are integers such that a + b is from 1 to 6, and R13 is a hydrogen atom, a loweralkyl, phenyl, or phenyl group substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group or a halogen atom;
wherein c is an integer from 3 to 5;
(iii) o-phenylene or o-phenyline substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group or a halogen atom; or
(iv) -(CH2)d- [NR14-(CH2)e] f-NR15-(CH2)-,wherein d, e, and g are each 2 or 3, f isO or 1, and R14 and R15 are each independently a hydrogen atom or a loweralkyl group.
2. A process as claimed in claim 1 wherein
is:
(a) a compound of formula
wherein R1 and R3 are each, independently, a loweralkyl, loweralkoxy, perfluoroloweralkyl, phenyl, 2-thienyl or ss-naphthyl group; and R2 is a hydrogen atom or a loweralkyl group;
(b) a compound of formula
wherein R4 is a loweralkyl, loweralkoxy, phenyl or perfluoroloweralkyl group; and m is 0 or 1; (c) a compound of formula
wherein R5 is a loweralkyl or perfluoroloweralkyl group; or
(d) a compound of formula
wherein R6 and R7 are each independently a hydrogen or halogen atom, or a nitro, loweralkoxy or loweralkyl group; provided that R6 and R7 are oriented meta to each other if both are other than hydrogen atoms; and R8 is a hydrogen- atom, a loweralkyl or perfluoroloweralkyl group.
3. A process as claimed in claim 1 wherein
is the group:
wherein R6, R7, and R8 are as defined in claim 2 and R12 is as defined in claim 1.
4. A process as claimed in claim 1 wherein the copper (II) complex is selected from:
wherein Rg and R10 are each independently a loweralkyl, perfluoroloweralkyl, phenyl, loweralkoxy, or 2-thienyl group; Xis a OSO2CF3 or OCH3 group; R11 is a hydrogen or halogen atom, or a nitro or loweralkoxy group; and R12 is a hydrogen atom, or a loweralkyl, phenyl or phenyl group substituted with from one to three members which are each independently a loweralkyl or loweralkoxy group or a halogen atom; or a phenylloweralkyl group.
5. A process as claimed in claim 4 wherein the copper (II) complex is:
wherein Rg and R10 are each independently a loweralkyl, perfluoroloweralkyl, phenyl, loweralkoxy or 2-thienyl group.
6. A process as claimed in claim 4 wherein the copper (II) complex is:
7. A process as claimed in claim 4 wherein the copper (II) complex is:
8. A process as claimed in claim 4 wherein the copper (II) complex is:
wherein X' is a OSO2CF3 or OCH3 group.
9. A process as claimed in claim 4 wherein the copper (II) complex is:
wherein R11 is a hydrogen or halogen atom, or a nitro or loweralkoxy group.
10. A process as claimed in claim 4 wherein the copper (II) complex is:
wherein R9 is methyl group and Rlo is a phenyl group or R9 and R10 are both t-butyl groups; and R12 is a hydrogen atom, or an isopropyl, p-chlorophenyl or benzyl group.
11. A process as claimed in claim 4 wherein the copper (II) complex is:
wherein R9 is a methyl or trifluoromethyl group; Rlo is a trifluoromethyl group, and Rii is a chlorine or hydrogen atom, or a nitro group.
12. A process as claimed in any one of the preceding claims wherein the N-R'-pyrrole is present in excess, based on the loweralkyl a-diazoloweralkanoate.
13. A process as claimed in any one of the preceding claims wherein the copper (II) complex is present in an amount of 1 mol percent of the amount of loweralkyl a-diazoloweralkanoate.
14. A process as claimed in any one of the preceding claims wherein the reaction mixture is heated to a temperature in the range of from 30 to 80"C during the reaction.
15. A process as claimed in any one of the preceding claims wherein the N-R'-pyrrole is
N-methylpyrrole.
16. A process as claimed in any one of the preceding claims wherein the N-R'-pyrrole acts as a solvent for the reaction.
17. A process as claimed in any one of claims 1 to 15 wherein the reaction is carried out in a halogenated hydrocarbon solvent.
18. A process as claimed in claim 1 substantially as hereinbefore described with reference to any one of the Examples.
19. A loweralkyl 2-(N-R'-pyrryl)-a-loweralkanoic acid ester whenever prepared by a process as claimed in any one of the preceding claims.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71640576A | 1976-08-23 | 1976-08-23 | |
US05/785,004 US4136097A (en) | 1976-08-23 | 1977-04-06 | Process and promoting agents for the preparation of loweralkyl 2-(N-R'-pyrryl)-alpha-loweralkanoic acid esters |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1586095A true GB1586095A (en) | 1981-03-18 |
Family
ID=27109527
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3476077A Expired GB1586095A (en) | 1976-08-23 | 1977-08-18 | Process for the preparation of lower alkyl 2-(n-r'-pyrryl)-a-lower alkanoic acid esters |
Country Status (6)
Country | Link |
---|---|
AT (1) | ATA608177A (en) |
CA (1) | CA1076586A (en) |
CH (1) | CH634833A5 (en) |
DE (1) | DE2737946A1 (en) |
FR (1) | FR2362835A1 (en) |
GB (1) | GB1586095A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2862262D1 (en) * | 1978-10-27 | 1983-07-07 | Mcneilab Inc | Process of reducing a loweralkyl 1-loweralkyl-pyrrole-2-glyoxylate to a loweralkyl 1-loweralkyl-pyrrole-2-acetate |
-
1977
- 1977-08-18 GB GB3476077A patent/GB1586095A/en not_active Expired
- 1977-08-19 FR FR7725451A patent/FR2362835A1/en active Granted
- 1977-08-19 CA CA285,099A patent/CA1076586A/en not_active Expired
- 1977-08-22 AT AT608177A patent/ATA608177A/en not_active Application Discontinuation
- 1977-08-23 CH CH1031777A patent/CH634833A5/en not_active IP Right Cessation
- 1977-08-23 DE DE19772737946 patent/DE2737946A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
FR2362835B1 (en) | 1983-01-14 |
ATA608177A (en) | 1982-11-15 |
DE2737946A1 (en) | 1978-03-09 |
FR2362835A1 (en) | 1978-03-24 |
CH634833A5 (en) | 1983-02-28 |
CA1076586A (en) | 1980-04-29 |
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