GB1517961A - Photosensitive composition and process for preparing same - Google Patents

Photosensitive composition and process for preparing same

Info

Publication number
GB1517961A
GB1517961A GB21939/75A GB2193975A GB1517961A GB 1517961 A GB1517961 A GB 1517961A GB 21939/75 A GB21939/75 A GB 21939/75A GB 2193975 A GB2193975 A GB 2193975A GB 1517961 A GB1517961 A GB 1517961A
Authority
GB
United Kingdom
Prior art keywords
screen
photo
coated
photosensitive composition
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB21939/75A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE2522225A priority Critical patent/DE2522225C2/en
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to GB21939/75A priority patent/GB1517961A/en
Publication of GB1517961A publication Critical patent/GB1517961A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F263/00—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00
    • C08F263/02—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00 on to polymers of vinyl esters with monocarboxylic acids
    • C08F263/04—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00 on to polymers of vinyl esters with monocarboxylic acids on to polymers of vinyl acetate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/23—Azo-compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/23—Azo-compounds
    • C08K5/235—Diazo and polyazo compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/08—Copolymers of styrene
    • C08L25/10—Copolymers of styrene with conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L31/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid; Compositions of derivatives of such polymers
    • C08L31/02—Homopolymers or copolymers of esters of monocarboxylic acids
    • C08L31/04—Homopolymers or copolymers of vinyl acetate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C08L33/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Abstract

1517961 Photo-sensitive materials NIPPON PAINT CO Ltd 21 May 1975 21939/75 Heading G2C [Also in Division C3] The photo-sensitive layer of a printing screen is prepared from a composition comprising a watersoluble graft polymer obtained by graft polymerization of acrylonitride on a partially hydrolyzed polyvinyl acetate, a polymer emulsion and a water-soluble diazo compound. The said layer is coated on e.g. a polyester, silk, nylon or steel wire screen, preferably supported by a wooden or metallic frame, and the coated screen is contacted with a positive carrying a design or pattern, the assembly then being exposed to U.V. light. The unexposed areas are then removed by immersion of the screen in warm water.
GB21939/75A 1975-05-20 1975-05-21 Photosensitive composition and process for preparing same Expired GB1517961A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE2522225A DE2522225C2 (en) 1975-05-20 1975-05-20 Aqueous photosensitive mixture and its use for the production of screen printing stencils
GB21939/75A GB1517961A (en) 1975-05-20 1975-05-21 Photosensitive composition and process for preparing same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2522225A DE2522225C2 (en) 1975-05-20 1975-05-20 Aqueous photosensitive mixture and its use for the production of screen printing stencils
GB21939/75A GB1517961A (en) 1975-05-20 1975-05-21 Photosensitive composition and process for preparing same

Publications (1)

Publication Number Publication Date
GB1517961A true GB1517961A (en) 1978-07-19

Family

ID=25768918

Family Applications (1)

Application Number Title Priority Date Filing Date
GB21939/75A Expired GB1517961A (en) 1975-05-20 1975-05-21 Photosensitive composition and process for preparing same

Country Status (2)

Country Link
DE (1) DE2522225C2 (en)
GB (1) GB1517961A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2533227A1 (en) * 1982-09-21 1984-03-23 Polychrome Corp COATING COMPOSITION IN THE FORM OF A PHOTOSENSITIVE LATEX AND PRINTING PLATE CONTAINING THE SAME
GB2205843A (en) * 1987-06-15 1988-12-21 Sanyo Kokusaku Pulp Co Photosensitive composition
US5264318A (en) * 1987-06-15 1993-11-23 Sanyo-Kokusaku Pulp Co., Ltd. Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU557375B2 (en) * 1981-06-19 1986-12-18 Sericol Group Ltd. Photo sensitive compositions and their use
JPH01180540A (en) * 1988-01-12 1989-07-18 Sanyo Kokusaku Pulp Co Ltd Image forming method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL275561A (en) * 1961-03-15
DE2057473C2 (en) * 1970-11-23 1982-04-08 Hoechst Ag, 6000 Frankfurt Photosensitive mixture
US3853561A (en) * 1970-11-26 1974-12-10 Hoechst Ag Process for the preparation of screen printing stencils using intermediate support for light sensitive layer
IT948621B (en) * 1971-02-19 1973-06-11 Howson Algraphy Ltd PROCEDURE FOR PRODUCING LITHOGRAPHIC PRINTING PLATES AND PLATES THIS OBTAINED

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2533227A1 (en) * 1982-09-21 1984-03-23 Polychrome Corp COATING COMPOSITION IN THE FORM OF A PHOTOSENSITIVE LATEX AND PRINTING PLATE CONTAINING THE SAME
GB2127167A (en) * 1982-09-21 1984-04-04 Polychrome Corp Water developable light sensitive compositions and printing plates
GB2205843A (en) * 1987-06-15 1988-12-21 Sanyo Kokusaku Pulp Co Photosensitive composition
DE3800131A1 (en) * 1987-06-15 1988-12-29 Sanyo Kokusaku Pulp Co LIGHT SENSITIVE COMPOSITION
GB2205843B (en) * 1987-06-15 1991-12-11 Sanyo Kokusaku Pulp Co Photosensitive composition
US5264318A (en) * 1987-06-15 1993-11-23 Sanyo-Kokusaku Pulp Co., Ltd. Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin

Also Published As

Publication number Publication date
DE2522225C2 (en) 1983-12-08
DE2522225A1 (en) 1976-12-09

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940521