GB1507664A - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
GB1507664A
GB1507664A GB1924774A GB1924774A GB1507664A GB 1507664 A GB1507664 A GB 1507664A GB 1924774 A GB1924774 A GB 1924774A GB 1924774 A GB1924774 A GB 1924774A GB 1507664 A GB1507664 A GB 1507664A
Authority
GB
United Kingdom
Prior art keywords
meth
monomer
moiety
methyl
carboxylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1924774A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Priority to GB1924774A priority Critical patent/GB1507664A/en
Publication of GB1507664A publication Critical patent/GB1507664A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1507664 Photopolymerizable compositions KODAK Ltd 1 May 1975 [2 May 1974] 19247/74 Heading C3P [Also in Division G2] Photopolymerizable compositions comprise (1) an ethylenically unsaturated monomer having a b.p. above 100‹ C., (2) an ethylenically unsaturated polymer containing groups comprising a -CX2- or -CX3- moiety (where the X symbols represent the same or different halogen a@oms), and (3) a sensitizer which is effective in increasing the speed of photocross-linking of polyvinyl cinnamate. Monomer (1) is preferably a polyacrylate or polymethacrylate ester, e.g. tetraethylene glycol dimethacrylate and pentaerythritol tetraacrylate. Polymer (2) preferably contains -CCl3 or -CBr3 moieties and may be, for example, the product obtained by reacting an alkyl (meth) acrylate/hydroxyalkyl (meth)acrylate copolymer optionally containing units of a third monomer with (i) a carboxylic acid or acid halide containing a -CX2- or -CX3 moiety, e.g. tribromoacetyl bromide and (ii) an unsaturated carboxylic acid halide, e.g. (meth) acryloyl chloride. Exemplified as sensitizers (3) are Michler's ketone; 1,2-dihydro-1-methyl-2- phenacylidenenaphtho - (1,2) - thiazole; 2,2- azino - bis - 3 - methyl - benzothiazoline; and 4 - N - n - butylamino - 2 - (4 - methoxyphenyl) benzo (b) pyrylium perchlorate. The compositions are useful as photosensitive layers in the production of lithographic plates.
GB1924774A 1975-05-01 1975-05-01 Photopolymerisable compositions Expired GB1507664A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1924774A GB1507664A (en) 1975-05-01 1975-05-01 Photopolymerisable compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1924774A GB1507664A (en) 1975-05-01 1975-05-01 Photopolymerisable compositions

Publications (1)

Publication Number Publication Date
GB1507664A true GB1507664A (en) 1978-04-19

Family

ID=10126187

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1924774A Expired GB1507664A (en) 1975-05-01 1975-05-01 Photopolymerisable compositions

Country Status (1)

Country Link
GB (1) GB1507664A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0248424A2 (en) * 1986-06-06 1987-12-09 BASF Aktiengesellschaft Photosensitive registration element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0248424A2 (en) * 1986-06-06 1987-12-09 BASF Aktiengesellschaft Photosensitive registration element
EP0248424A3 (en) * 1986-06-06 1988-11-30 Basf Aktiengesellschaft Photosensitive registration element

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee