GB1497193A - Boron doping of semiconductors - Google Patents
Boron doping of semiconductorsInfo
- Publication number
- GB1497193A GB1497193A GB3078577A GB3078577A GB1497193A GB 1497193 A GB1497193 A GB 1497193A GB 3078577 A GB3078577 A GB 3078577A GB 3078577 A GB3078577 A GB 3078577A GB 1497193 A GB1497193 A GB 1497193A
- Authority
- GB
- United Kingdom
- Prior art keywords
- glass
- bao
- ceramic body
- semiconductors
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title 1
- 229910052796 boron Inorganic materials 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000002241 glass-ceramic Substances 0.000 abstract 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 abstract 1
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 abstract 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 abstract 1
- 239000012159 carrier gas Substances 0.000 abstract 1
- 238000002425 crystallisation Methods 0.000 abstract 1
- 230000008025 crystallization Effects 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000002019 doping agent Substances 0.000 abstract 1
- 238000011065 in-situ storage Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000006132 parent glass Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
- C03C10/0045—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents containing SiO2, Al2O3 and MgO as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0054—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing PbO, SnO2, B2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
- C30B31/165—Diffusion sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Ceramic Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Glass Compositions (AREA)
Abstract
1497193 Glass-ceramics OWENS-ILLINOIS Inc 7 Jan 1975 [20 Dec 1974] 30785/77 Divided out of 1497191 Heading C1M [Also in Division H1] A dopant source for the diffusion of B into Si and/or Ge from a vapour containing B 2 O 3 , preferably in a carrier gas, comprises a rigid, dimensionally-stable glass-ceramic body having the following composition (all proportions are expressed as mole per cent): SiO 2 40-60 (preferably 40-55) Al 2 O 3 10-30 B 2 O 3 20-40 alkaline earth oxide, selected from BaO, MgO, CaO, SrO 3-20 (preferably 5-15) and wherein the BaO content is 1-15 (preferably 3-15). The glass-ceramic contains substantially no alkali metal oxides (<0À5). Processes for manufacturing the glass-ceramic body by thermal in situ crystallization of a parent glass body are disclosed.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/534,860 US3962000A (en) | 1974-01-07 | 1974-12-20 | Barium aluminoborosilicate glass-ceramics for semiconductor doping |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1497193A true GB1497193A (en) | 1978-01-05 |
Family
ID=24131820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3078577A Expired GB1497193A (en) | 1974-12-20 | 1975-01-07 | Boron doping of semiconductors |
Country Status (4)
Country | Link |
---|---|
CA (1) | CA1061100A (en) |
DE (5) | DE2559841C2 (en) |
FR (1) | FR2295566A1 (en) |
GB (1) | GB1497193A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013208799A1 (en) * | 2013-05-14 | 2014-11-20 | Heraeus Quarzglas Gmbh & Co. Kg | SiO2-based barrier layer for high-temperature diffusion and coating processes |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL125167C (en) | 1963-01-17 | |||
DE1596848B1 (en) * | 1966-12-31 | 1970-10-08 | Jenaer Glaswerk Schott & Gen | Alkaline-oxide-free, thermally highly resilient glass-ceramic with low dielectric losses produced from a glass by heat treatment |
GB1143907A (en) * | 1967-07-10 | 1969-02-26 | Marconi Co Ltd | Improvements in or relating to methods of manufacturing semiconductor devices |
-
1975
- 1975-01-07 GB GB3078577A patent/GB1497193A/en not_active Expired
- 1975-09-29 CA CA236,611A patent/CA1061100A/en not_active Expired
- 1975-10-11 DE DE19752559841 patent/DE2559841C2/en not_active Expired
- 1975-10-11 DE DE19752560268 patent/DE2560268C2/en not_active Expired
- 1975-10-11 DE DE19752560267 patent/DE2560267C2/en not_active Expired
- 1975-10-11 DE DE19752559840 patent/DE2559840C2/en not_active Expired
- 1975-10-11 DE DE19752545628 patent/DE2545628A1/en active Pending
- 1975-12-11 FR FR7537950A patent/FR2295566A1/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013208799A1 (en) * | 2013-05-14 | 2014-11-20 | Heraeus Quarzglas Gmbh & Co. Kg | SiO2-based barrier layer for high-temperature diffusion and coating processes |
Also Published As
Publication number | Publication date |
---|---|
DE2559840C2 (en) | 1983-09-22 |
FR2295566A1 (en) | 1976-07-16 |
FR2295566B1 (en) | 1979-07-06 |
DE2559841C2 (en) | 1983-10-20 |
DE2560268C2 (en) | 1985-03-07 |
DE2560267C2 (en) | 1985-05-23 |
DE2545628A1 (en) | 1976-07-01 |
CA1061100A (en) | 1979-08-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |