GB1495529A - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
GB1495529A
GB1495529A GB2738474A GB2738474A GB1495529A GB 1495529 A GB1495529 A GB 1495529A GB 2738474 A GB2738474 A GB 2738474A GB 2738474 A GB2738474 A GB 2738474A GB 1495529 A GB1495529 A GB 1495529A
Authority
GB
United Kingdom
Prior art keywords
groups
ferrocene
cyclopentadienyl
repeating
carbonymethylthioferrocene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2738474A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Priority to GB2738474A priority Critical patent/GB1495529A/en
Publication of GB1495529A publication Critical patent/GB1495529A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1495529 Negative working photo-sensitive materials KODAK Ltd 22 May 1975 [20 June 1974] 27384/74 Heading G2C [Also in Division C3] Lithographic materials comprise a support having a layer comprising (a) a reactive polymer containing repeating olefinic groups and repeating groups comprising two or three chlorine or bromine atoms bonded to a single carbon atom and (b) a metallocene, viz a metal bis # cyclopentadienyl in which one or both cyclopentadienyl groups may be substituted, e.g. with a cinnamoyl or carbonymethyl thio group. The polymers referred to are those disclosed inter alia in Specification No. 1463816. Metallocenes exemplified are carbonymethylthioferrocene, 1.1' dicinnamoyl ferrocene and ferrocene. A polyunsaturated ester e.g. pentaerythritol tetracrylate may be included in the composition to improve shelf life.
GB2738474A 1975-05-22 1975-05-22 Photosensitive compositions Expired GB1495529A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2738474A GB1495529A (en) 1975-05-22 1975-05-22 Photosensitive compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2738474A GB1495529A (en) 1975-05-22 1975-05-22 Photosensitive compositions

Publications (1)

Publication Number Publication Date
GB1495529A true GB1495529A (en) 1977-12-21

Family

ID=10258731

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2738474A Expired GB1495529A (en) 1975-05-22 1975-05-22 Photosensitive compositions

Country Status (1)

Country Link
GB (1) GB1495529A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2427635A1 (en) * 1978-05-31 1979-12-28 Eastman Kodak Co COMPOSITION OF PHOTOSENSITIVE POLYMER AND ITS APPLICATION IN LITHOGRAPHY

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2427635A1 (en) * 1978-05-31 1979-12-28 Eastman Kodak Co COMPOSITION OF PHOTOSENSITIVE POLYMER AND ITS APPLICATION IN LITHOGRAPHY
US4229519A (en) 1978-05-31 1980-10-21 Eastman Kodak Company Photo-polymerizable water-developable composition and elements

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee