GB1331852A - Radiation sensitive polymers - Google Patents
Radiation sensitive polymersInfo
- Publication number
- GB1331852A GB1331852A GB1587371A GB1587371A GB1331852A GB 1331852 A GB1331852 A GB 1331852A GB 1587371 A GB1587371 A GB 1587371A GB 1587371 A GB1587371 A GB 1587371A GB 1331852 A GB1331852 A GB 1331852A
- Authority
- GB
- United Kingdom
- Prior art keywords
- hexanediol
- hydroxy
- radiation sensitive
- sensitive polymers
- azidosulphonylcarbanilates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3917870A | 1970-05-20 | 1970-05-20 | |
US9344570A | 1970-11-27 | 1970-11-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1331852A true GB1331852A (en) | 1973-09-26 |
Family
ID=26715885
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1587371A Expired GB1331852A (en) | 1970-05-20 | 1971-05-19 | Radiation sensitive polymers |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE767412A (xx) |
CA (1) | CA972097A (xx) |
CH (3) | CH583753A5 (xx) |
DE (1) | DE2123623A1 (xx) |
FR (1) | FR2091827A5 (xx) |
GB (1) | GB1331852A (xx) |
-
1971
- 1971-05-12 DE DE19712123623 patent/DE2123623A1/de active Pending
- 1971-05-18 CH CH78372A patent/CH583753A5/xx not_active IP Right Cessation
- 1971-05-18 CH CH732171A patent/CH579290A/xx unknown
- 1971-05-18 CH CH732171D patent/CH732171A4/xx unknown
- 1971-05-19 FR FR7118300A patent/FR2091827A5/fr not_active Expired
- 1971-05-19 GB GB1587371A patent/GB1331852A/en not_active Expired
- 1971-05-19 BE BE767412A patent/BE767412A/xx unknown
-
1972
- 1972-04-27 CA CA111,452A patent/CA972097A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CA972097A (en) | 1975-07-29 |
FR2091827A5 (xx) | 1972-01-14 |
CH579290A (xx) | 1976-08-31 |
DE2123623A1 (de) | 1971-12-02 |
BE767412A (fr) | 1971-11-19 |
CH583753A5 (xx) | 1977-01-14 |
CH732171A4 (xx) | 1976-02-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |