GB1311424A - Brightening compounds and their use in electrolytic tin plating - Google Patents
Brightening compounds and their use in electrolytic tin platingInfo
- Publication number
- GB1311424A GB1311424A GB1338471*[A GB1338471A GB1311424A GB 1311424 A GB1311424 A GB 1311424A GB 1338471 A GB1338471 A GB 1338471A GB 1311424 A GB1311424 A GB 1311424A
- Authority
- GB
- United Kingdom
- Prior art keywords
- furfural
- crotonaldehyde
- alkali
- tin plating
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title abstract 2
- 238000005282 brightening Methods 0.000 title 1
- 150000001875 compounds Chemical class 0.000 title 1
- 238000007747 plating Methods 0.000 title 1
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 abstract 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 239000007795 chemical reaction product Substances 0.000 abstract 3
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 239000000047 product Substances 0.000 abstract 2
- RXHWKKPOJTUKNF-UHFFFAOYSA-N 2-(furan-2-yl)penta-2,4-dienal Chemical compound O1C(=CC=C1)C(C=O)=CC=C RXHWKKPOJTUKNF-UHFFFAOYSA-N 0.000 abstract 1
- VZIRCHXYMBFNFD-HNQUOIGGSA-N 3-(2-Furanyl)-2-propenal Chemical compound O=C\C=C\C1=CC=CO1 VZIRCHXYMBFNFD-HNQUOIGGSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000011260 aqueous acid Substances 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 abstract 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/40—Radicals substituted by oxygen atoms
- C07D307/46—Doubly bound oxygen atoms, or two oxygen atoms singly bound to the same carbon atom
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Furan Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US3526170A | 1970-05-06 | 1970-05-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1311424A true GB1311424A (en) | 1973-03-28 |
Family
ID=21881579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1338471*[A Expired GB1311424A (en) | 1970-05-06 | 1971-05-05 | Brightening compounds and their use in electrolytic tin plating |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US3634212A (cg-RX-API-DMAC7.html) |
| JP (1) | JPS5524512B1 (cg-RX-API-DMAC7.html) |
| BR (1) | BR7102639D0 (cg-RX-API-DMAC7.html) |
| CA (1) | CA988452A (cg-RX-API-DMAC7.html) |
| DE (1) | DE2122263C2 (cg-RX-API-DMAC7.html) |
| ES (1) | ES390675A1 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2088388B1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1311424A (cg-RX-API-DMAC7.html) |
| NL (1) | NL7106161A (cg-RX-API-DMAC7.html) |
| SE (1) | SE375340B (cg-RX-API-DMAC7.html) |
| ZA (1) | ZA712389B (cg-RX-API-DMAC7.html) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4844780A (en) * | 1988-02-17 | 1989-07-04 | Maclee Chemical Company, Inc. | Brightener and aqueous plating bath for tin and/or lead |
| US5750017A (en) * | 1996-08-21 | 1998-05-12 | Lucent Technologies Inc. | Tin electroplating process |
| RU2123070C1 (ru) * | 1996-09-30 | 1998-12-10 | Российский химико-технологический университет им.Д.И.Менделеева | Способ приготовления блескообразующей добавки |
| US6670071B2 (en) * | 2002-01-15 | 2003-12-30 | Quallion Llc | Electric storage battery construction and method of manufacture |
| US6838114B2 (en) * | 2002-05-24 | 2005-01-04 | Micron Technology, Inc. | Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
| US6821347B2 (en) * | 2002-07-08 | 2004-11-23 | Micron Technology, Inc. | Apparatus and method for depositing materials onto microelectronic workpieces |
| US6955725B2 (en) | 2002-08-15 | 2005-10-18 | Micron Technology, Inc. | Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
| US6818249B2 (en) * | 2003-03-03 | 2004-11-16 | Micron Technology, Inc. | Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces |
| US7335396B2 (en) * | 2003-04-24 | 2008-02-26 | Micron Technology, Inc. | Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers |
| US7344755B2 (en) * | 2003-08-21 | 2008-03-18 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers |
| US7235138B2 (en) * | 2003-08-21 | 2007-06-26 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
| US7422635B2 (en) | 2003-08-28 | 2008-09-09 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
| US7056806B2 (en) * | 2003-09-17 | 2006-06-06 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces |
| US7282239B2 (en) * | 2003-09-18 | 2007-10-16 | Micron Technology, Inc. | Systems and methods for depositing material onto microfeature workpieces in reaction chambers |
| US7323231B2 (en) * | 2003-10-09 | 2008-01-29 | Micron Technology, Inc. | Apparatus and methods for plasma vapor deposition processes |
| US7581511B2 (en) * | 2003-10-10 | 2009-09-01 | Micron Technology, Inc. | Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
| US7647886B2 (en) * | 2003-10-15 | 2010-01-19 | Micron Technology, Inc. | Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
| US7258892B2 (en) | 2003-12-10 | 2007-08-21 | Micron Technology, Inc. | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
| US7906393B2 (en) * | 2004-01-28 | 2011-03-15 | Micron Technology, Inc. | Methods for forming small-scale capacitor structures |
| US7584942B2 (en) * | 2004-03-31 | 2009-09-08 | Micron Technology, Inc. | Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers |
| US20050249873A1 (en) * | 2004-05-05 | 2005-11-10 | Demetrius Sarigiannis | Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices |
| US8133554B2 (en) | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
| US7699932B2 (en) * | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
| US7156470B1 (en) * | 2004-06-28 | 2007-01-02 | Wright James P | Wheel trim hub cover |
| US20060165873A1 (en) * | 2005-01-25 | 2006-07-27 | Micron Technology, Inc. | Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes |
| US20060237138A1 (en) * | 2005-04-26 | 2006-10-26 | Micron Technology, Inc. | Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1544726A (en) * | 1924-08-28 | 1925-07-07 | Us Smelting Refining & Mining | Electrolytic refining of metals |
| FR1392257A (fr) * | 1964-04-29 | 1965-03-12 | Friedr Blasberg G M B H | Agent de brillantage pour la séparation électrolytique de dépôts d'étain à haut brillant à partir de solutions aqueuses acides de sels d'étain, et son utilisation |
| NL128321C (cg-RX-API-DMAC7.html) * | 1965-02-13 |
-
1970
- 1970-05-06 US US35261A patent/US3634212A/en not_active Expired - Lifetime
-
1971
- 1971-04-14 ZA ZA712389A patent/ZA712389B/xx unknown
- 1971-04-23 JP JP2662471A patent/JPS5524512B1/ja active Pending
- 1971-04-28 ES ES390675A patent/ES390675A1/es not_active Expired
- 1971-04-30 BR BR2639/71A patent/BR7102639D0/pt unknown
- 1971-05-04 SE SE7105758A patent/SE375340B/xx unknown
- 1971-05-05 NL NL7106161A patent/NL7106161A/xx active Search and Examination
- 1971-05-05 GB GB1338471*[A patent/GB1311424A/en not_active Expired
- 1971-05-05 DE DE2122263A patent/DE2122263C2/de not_active Expired
- 1971-05-05 CA CA112,203A patent/CA988452A/en not_active Expired
- 1971-05-06 FR FR7116345A patent/FR2088388B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2122263A1 (de) | 1971-12-09 |
| CA988452A (en) | 1976-05-04 |
| FR2088388A1 (cg-RX-API-DMAC7.html) | 1972-01-07 |
| ES390675A1 (es) | 1974-03-16 |
| ZA712389B (en) | 1972-01-26 |
| US3634212A (en) | 1972-01-11 |
| BR7102639D0 (pt) | 1973-04-19 |
| SE375340B (cg-RX-API-DMAC7.html) | 1975-04-14 |
| NL7106161A (cg-RX-API-DMAC7.html) | 1971-11-09 |
| DE2122263C2 (de) | 1981-12-03 |
| JPS5524512B1 (cg-RX-API-DMAC7.html) | 1980-06-30 |
| FR2088388B1 (cg-RX-API-DMAC7.html) | 1975-07-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |