GB1237936A - - Google Patents

Abstract

1,237,936. Ion exchange apparatus. NIPPON RENSUI K.K. 18 Sept., 1968 [27 Nov., 1967], No. 44349/68. Heading BIJ. An ion exchange column (see Fig. I) is divided into ion exchange region 1, separating chamber 10 and charging chamber 3 by means of perforated supporting plates 2 and 11 which allow passage of resin and liquid and is furnished with filters 4 and 12 which allow passage of liquid only, and a partition plate 16, provided with a plurality of separating nozzles 18 and collecting nozzles 17, said partition plate 16 forming a liquid distributing chamber 13 with the base of the column. Upon passage of liquid to be treated through inlet 15 the spent resin in separating chamber 10 is discharged through pipe 14 by means of the nozzles 18 having ejecting ports 18a arranged to eject the liquid in a tangential direction about the axis of the pipe 14 and the nozzles 17 having ejecting ports 17a arranged to radially eject the liquid. When valve 19 is closed all the flow is upwards taking the resin in ion exchange region 1 with it and the exchange reaction takes place. When the supply of liquid is stopped and the liquid is caused to flow downwards the spent resin is transferred to separating chamber 10 while regenerated resin in charging chamber 3 falls into ion exchange chamber 1. This ion exchange column may be combined with a washing and regenerating system (see Fig. 4) comprising a washing tower 22 into which the liquid and spent resin are introduced via pipe 24 and the liquid flows upwards to wash the resin and is removed via discharge pipe 25, the clean resin being transferred to the regenerating and rinsing column 23 by liquid entering via pipe 24 supplemented by liquid from pipe 28 if necessary, additional liquid to aid the upward flow of resin in the regenerator 23 being added by opening valve 49. The resin moves upwards through the regenerator which comprises a lower filtering chamber 39 with filter 35, a regenerating portion 31, regenerant being introduced through pipe 37 and removed via pipe 42, a substituting portion 32, a rinsing portion 33 the rinsing liquid being introduced at pipe 43 and collected and removed at pipe 38, a filtering chamber 40 with filter 36 and a resin transfer chamber 34 with outlet for resin at pipe 41, the resin being returned to the ion exchange column by means of the water supplied from rinsing water inlet pipe 43. In a modification of the regeneration system (Fig. 5 not shown) an upright regenerating column and an upright rinsing column are combined in a U-shaped configuration, a backwash column being situated vertically above the regeneration column.