GB1141918A - A microwave oscillating semiconductor device - Google Patents

A microwave oscillating semiconductor device

Info

Publication number
GB1141918A
GB1141918A GB5333166A GB5333166A GB1141918A GB 1141918 A GB1141918 A GB 1141918A GB 5333166 A GB5333166 A GB 5333166A GB 5333166 A GB5333166 A GB 5333166A GB 1141918 A GB1141918 A GB 1141918A
Authority
GB
United Kingdom
Prior art keywords
layer
wafer
impurity concentration
produced
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5333166A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MATSHUSHITA ELECTRONICS CORP
Original Assignee
MATSHUSHITA ELECTRONICS CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MATSHUSHITA ELECTRONICS CORP filed Critical MATSHUSHITA ELECTRONICS CORP
Publication of GB1141918A publication Critical patent/GB1141918A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03BGENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B7/00Generation of oscillations using active element having a negative resistance between two of its electrodes
    • H03B7/12Generation of oscillations using active element having a negative resistance between two of its electrodes with frequency-determining element comprising distributed inductance and capacitance
    • H03B7/14Generation of oscillations using active element having a negative resistance between two of its electrodes with frequency-determining element comprising distributed inductance and capacitance active element being semiconductor device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03BGENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B9/00Generation of oscillations using transit-time effects
    • H03B9/12Generation of oscillations using transit-time effects using solid state devices, e.g. Gunn-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Inductance-Capacitance Distribution Constants And Capacitance-Resistance Oscillators (AREA)

Abstract

1,141,918. Semi-conductor devices. MATSUSHITA ELECTRONICS CORP. 29 Nov., 1966 [16 Dec., 1965], No. 53331/66. Heading H1K. A semi-conductor device capable of generating microwave oscillations comprises a germanium junction diode produced in a substrate having an impurity concentration in the range 10<SP>15</SP> to 10<SP>18</SP> atoms. cm<SP>-3</SP>, the oscillation being produced by applying a reverse bias greater than the breakdown voltage. As shown, Fig. 1, an N-type germanium wafer 4, having an impurity concentration within the specified range, is placed on a layer of tin solder 5 and an iron-nickel alloy plate 6. A layer 2 of indium is placed on the other face of wafer 4 and the assembly heated to alloy layer 2 to the wafer to form a P-type layer 3. The device is then electrolytically etched and encapsulated. A plurality of devices may be produced by epitaxially depositing a layer on a substrate of the opposite conductivity type having an impurity concentration within the specified range, applying an electrode to the grown layer by evaporation or soldering and then cutting up the wafer. Suitable diodes may also be produced by diffusion. An encapsulated diode may be mounted in a waveguide (10) provided with impedance matching screws (11) and supplied with a suitable reverse biasing voltage to generate electrical oscillations, Fig. 3 (not shown). The oscillations are stated to comprise a number of overlapping waves, and the critical frequency (i.e. that of the wave having the lowest frequency) increases with increasing impurity concentration of the substrate.
GB5333166A 1965-12-16 1966-11-29 A microwave oscillating semiconductor device Expired GB1141918A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7883965 1965-12-16

Publications (1)

Publication Number Publication Date
GB1141918A true GB1141918A (en) 1969-02-05

Family

ID=13672984

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5333166A Expired GB1141918A (en) 1965-12-16 1966-11-29 A microwave oscillating semiconductor device

Country Status (4)

Country Link
BE (1) BE691292A (en)
CH (1) CH448186A (en)
GB (1) GB1141918A (en)
NL (1) NL146647B (en)

Also Published As

Publication number Publication date
CH448186A (en) 1967-12-15
NL6617632A (en) 1967-06-19
NL146647B (en) 1975-07-15
DE1541494A1 (en) 1972-01-13
DE1541494B2 (en) 1973-02-08
BE691292A (en) 1967-05-16

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