GB1057992A - Improvements in semiconductor injection recombination radiation sources - Google Patents

Improvements in semiconductor injection recombination radiation sources

Info

Publication number
GB1057992A
GB1057992A GB1809865A GB1809865A GB1057992A GB 1057992 A GB1057992 A GB 1057992A GB 1809865 A GB1809865 A GB 1809865A GB 1809865 A GB1809865 A GB 1809865A GB 1057992 A GB1057992 A GB 1057992A
Authority
GB
United Kingdom
Prior art keywords
layer
electrode
semi
selenide
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1809865A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1057992A publication Critical patent/GB1057992A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/28Materials of the light emitting region containing only elements of Group II and Group VI of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H05B33/145Arrangements of the electroluminescent material

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Luminescent Compositions (AREA)
  • Light Receiving Elements (AREA)

Abstract

A semi-conductor injection recombination radiation source consists of a layered structure comprising a support, a first electrode, a semi-conductive layer of a P-type chalcogenide grown from the vapour phase, an N-type semi-conductive layer, and a second electrode. A chalcogenide is defined as an oxide, sulphide, selenide. <PICT:1057992/C4-C5/1> or telluride of a metal. As shown, a layer 2 of iridium is sputtered on to a glass plate 1 and covered with a thin layer of silver by vapour deposition. A layer 4 of zinc selenide is vapour deposited in vacuo on to layer 2 and is then heated in an atmosphere of argon to diffuse the silver into layer 4 to make it P-conductive. A transparent electrode 6 of indium oxide is applied to layer 4 and the device is heated to diffuse indium from electrode 6 into layer 4 to form N-type region 5. The device is mounted in a transparent envelope and when forward biased emits radiation through electrode 6. Electrode 2 may also be of transparent material or alternatively electrode 2 and substrate 1 may form a reflective surface. Layer 4 may also be doped by the vapour deposition of an acceptor simultaneously with the deposition of the semi-conductor material. Layer 4 may be produced by the reaction of vapours of hydrogen selenide and zinc chloride at the surface of the substrate. Cadmium telluride is also mentioned as a suitable semi-conductor material. A plurality of devices may be produced on a single support and may be combined with photo-sensitive layers to produce opto-electronic devices.
GB1809865A 1964-05-02 1965-04-29 Improvements in semiconductor injection recombination radiation sources Expired GB1057992A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6404898A NL6404898A (en) 1964-05-02 1964-05-02

Publications (1)

Publication Number Publication Date
GB1057992A true GB1057992A (en) 1967-02-08

Family

ID=19789992

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1809865A Expired GB1057992A (en) 1964-05-02 1965-04-29 Improvements in semiconductor injection recombination radiation sources

Country Status (3)

Country Link
DE (1) DE1489430A1 (en)
GB (1) GB1057992A (en)
NL (1) NL6404898A (en)

Also Published As

Publication number Publication date
DE1489430A1 (en) 1969-07-24
NL6404898A (en) 1965-11-03

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