GB1057048A - Method of forming superconducting metallic films - Google Patents

Method of forming superconducting metallic films

Info

Publication number
GB1057048A
GB1057048A GB28785/63A GB2878563A GB1057048A GB 1057048 A GB1057048 A GB 1057048A GB 28785/63 A GB28785/63 A GB 28785/63A GB 2878563 A GB2878563 A GB 2878563A GB 1057048 A GB1057048 A GB 1057048A
Authority
GB
United Kingdom
Prior art keywords
substrate
metal
heated
bead
molybdenum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB28785/63A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1057048A publication Critical patent/GB1057048A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices

Abstract

A superconducting metallic film of niobium, tantalum or vanadium is formed by vapour depositing the metal at a rate of at least 0.5 microns/ hour on to a substrate (e.g. of copper, aluminium, <PICT:1057048/C6-C7/1> <PICT:1057048/C6-C7/2> quartz, mica or glass) heated to a temperature in excess of 25 DEG C. in a chamber evacuated to a pressure of 1 x 10-5 to 5 x 10-5 mms. of mercury. The initial evaporation getters oxygen and oxygen - containing compounds in the chamber and the metal subsequently deposited forms the superconducting layer. A molybdenum shield may be positioned between the vapour source and substrate during gettering to prevent deposition of oxygen contaminated metal on the substrate. A non-metallic substrate may be heated to above 600 DEG C. during deposition to improve adhesion of the deposited layer. In making superconductive alloys, e.g. of niobium-tin, alternate layers of the metals are deposited and then the temperature of the substrate is raised to alloy the layers by diffusion. Figs. 1 and 5 show apparatus in which the metal to be deposited is heated respectively by electron bombardment and induction. Fig. 1 shows a metal source in the form of a rod 62 with a terminal bead 63, and a substrate 24 on a heating member 22. A heated tungsten wire 41 provides electrons to bombard the bead 63 which is maintained at a positive potential. A molybdenum screen 49 maintained at a negative potential serves to focus the electrons on the bead. Molybdenum shield 83 can be pivoted to shield the substrate from the metal vapour during gettering. A second metal source 73, e.g. of tin, is contained in an heated by a molybdenum wire 72. The substrate may be a wafer or a cylinder, the cylinder being rotated during deposition to ensure the production of a uniform layer over its curved surface. Fig. 5 shows a metal source in the form of a rod 115 with terminal bead 116 heated inductively by a coil 117. A condenser 109 with water inlet 110 and outlet 111 surrounds the top part of the evacuated bell jar 105. Glass rod 119 shadows a portion of the condenser wall to prevent formation of a continuous annular metal deposit thereon, so as to allow effective heating of the metal source.
GB28785/63A 1962-08-02 1963-07-19 Method of forming superconducting metallic films Expired GB1057048A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21429162A 1962-08-02 1962-08-02
US25895563A 1963-02-12 1963-02-12

Publications (1)

Publication Number Publication Date
GB1057048A true GB1057048A (en) 1967-02-01

Family

ID=26908854

Family Applications (1)

Application Number Title Priority Date Filing Date
GB28785/63A Expired GB1057048A (en) 1962-08-02 1963-07-19 Method of forming superconducting metallic films

Country Status (3)

Country Link
JP (1) JPS3928690B1 (en)
GB (1) GB1057048A (en)
NL (1) NL296188A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3181656A (en) * 1961-06-30 1965-05-04 Ford Motor Co Hydraulic plunger type shock absorber having separate jounce and rebound passages
GB2213501A (en) * 1987-12-11 1989-08-16 Plessey Co Plc Production of superconducting thin films by ion beam sputtering from a single ceramic target
GB2232167A (en) * 1987-02-24 1990-12-05 Leonard Mark Bianchi A process for improving high-temperature alloys

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3181656A (en) * 1961-06-30 1965-05-04 Ford Motor Co Hydraulic plunger type shock absorber having separate jounce and rebound passages
GB2232167A (en) * 1987-02-24 1990-12-05 Leonard Mark Bianchi A process for improving high-temperature alloys
GB2232167B (en) * 1987-02-24 1991-03-13 Leonard Mark Bianchi A process for improving high-temperature alloys
GB2213501A (en) * 1987-12-11 1989-08-16 Plessey Co Plc Production of superconducting thin films by ion beam sputtering from a single ceramic target

Also Published As

Publication number Publication date
JPS3928690B1 (en) 1964-12-11
NL296188A (en)

Similar Documents

Publication Publication Date Title
US2688564A (en) Method of forming cadmium sulfide photoconductive cells
US2732313A (en) Titanium
US2732312A (en) Method of making a coated transparent
US3669861A (en) R. f. discharge cleaning to improve adhesion
GB934408A (en) Methods of depositing metals by evaporation
GB1057048A (en) Method of forming superconducting metallic films
US2065570A (en) Electrode structure
US2192418A (en) Method of manufacturing photoelectrically sensitive layers
US3328200A (en) Method of forming superconducting metallic films
US2967962A (en) Television and like camera tubes
US3436258A (en) Method of forming an insulated ground plane for a cryogenic device
US2778485A (en) Vacuum tube getter body material
US3451845A (en) Method for producing thin films of rare earth chalcogenides
US3736242A (en) Sputtering technique
US2449493A (en) Attaining high vacuum in photoelectric tubes
US3481778A (en) Method of forming a superconducting metallic film
US3325307A (en) Method of forming superconductive niobium films
US3436256A (en) Method of forming a superconducting metallic film
US1568694A (en) Photo-electric device
US3243627A (en) Photocathode on bveled end plate of electron tube
US3519481A (en) Method for forming thin films having superconductive contacts
US2131187A (en) Method of producing finely divided metallic layers
US3084010A (en) Manufacture of electron discharge tubes having a photo-conductive target
US2152809A (en) Method of producing finely divided metallic layers
US2079477A (en) Photoelectric tube