GB1057048A - Method of forming superconducting metallic films - Google Patents
Method of forming superconducting metallic filmsInfo
- Publication number
- GB1057048A GB1057048A GB28785/63A GB2878563A GB1057048A GB 1057048 A GB1057048 A GB 1057048A GB 28785/63 A GB28785/63 A GB 28785/63A GB 2878563 A GB2878563 A GB 2878563A GB 1057048 A GB1057048 A GB 1057048A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- metal
- heated
- bead
- molybdenum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A superconducting metallic film of niobium, tantalum or vanadium is formed by vapour depositing the metal at a rate of at least 0.5 microns/ hour on to a substrate (e.g. of copper, aluminium, <PICT:1057048/C6-C7/1> <PICT:1057048/C6-C7/2> quartz, mica or glass) heated to a temperature in excess of 25 DEG C. in a chamber evacuated to a pressure of 1 x 10-5 to 5 x 10-5 mms. of mercury. The initial evaporation getters oxygen and oxygen - containing compounds in the chamber and the metal subsequently deposited forms the superconducting layer. A molybdenum shield may be positioned between the vapour source and substrate during gettering to prevent deposition of oxygen contaminated metal on the substrate. A non-metallic substrate may be heated to above 600 DEG C. during deposition to improve adhesion of the deposited layer. In making superconductive alloys, e.g. of niobium-tin, alternate layers of the metals are deposited and then the temperature of the substrate is raised to alloy the layers by diffusion. Figs. 1 and 5 show apparatus in which the metal to be deposited is heated respectively by electron bombardment and induction. Fig. 1 shows a metal source in the form of a rod 62 with a terminal bead 63, and a substrate 24 on a heating member 22. A heated tungsten wire 41 provides electrons to bombard the bead 63 which is maintained at a positive potential. A molybdenum screen 49 maintained at a negative potential serves to focus the electrons on the bead. Molybdenum shield 83 can be pivoted to shield the substrate from the metal vapour during gettering. A second metal source 73, e.g. of tin, is contained in an heated by a molybdenum wire 72. The substrate may be a wafer or a cylinder, the cylinder being rotated during deposition to ensure the production of a uniform layer over its curved surface. Fig. 5 shows a metal source in the form of a rod 115 with terminal bead 116 heated inductively by a coil 117. A condenser 109 with water inlet 110 and outlet 111 surrounds the top part of the evacuated bell jar 105. Glass rod 119 shadows a portion of the condenser wall to prevent formation of a continuous annular metal deposit thereon, so as to allow effective heating of the metal source.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21429162A | 1962-08-02 | 1962-08-02 | |
US25895563A | 1963-02-12 | 1963-02-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1057048A true GB1057048A (en) | 1967-02-01 |
Family
ID=26908854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB28785/63A Expired GB1057048A (en) | 1962-08-02 | 1963-07-19 | Method of forming superconducting metallic films |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS3928690B1 (en) |
GB (1) | GB1057048A (en) |
NL (1) | NL296188A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3181656A (en) * | 1961-06-30 | 1965-05-04 | Ford Motor Co | Hydraulic plunger type shock absorber having separate jounce and rebound passages |
GB2213501A (en) * | 1987-12-11 | 1989-08-16 | Plessey Co Plc | Production of superconducting thin films by ion beam sputtering from a single ceramic target |
GB2232167A (en) * | 1987-02-24 | 1990-12-05 | Leonard Mark Bianchi | A process for improving high-temperature alloys |
-
0
- NL NL296188D patent/NL296188A/xx unknown
-
1963
- 1963-07-19 GB GB28785/63A patent/GB1057048A/en not_active Expired
- 1963-08-02 JP JP4140363A patent/JPS3928690B1/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3181656A (en) * | 1961-06-30 | 1965-05-04 | Ford Motor Co | Hydraulic plunger type shock absorber having separate jounce and rebound passages |
GB2232167A (en) * | 1987-02-24 | 1990-12-05 | Leonard Mark Bianchi | A process for improving high-temperature alloys |
GB2232167B (en) * | 1987-02-24 | 1991-03-13 | Leonard Mark Bianchi | A process for improving high-temperature alloys |
GB2213501A (en) * | 1987-12-11 | 1989-08-16 | Plessey Co Plc | Production of superconducting thin films by ion beam sputtering from a single ceramic target |
Also Published As
Publication number | Publication date |
---|---|
NL296188A (en) | |
JPS3928690B1 (en) | 1964-12-11 |
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