GB1056786A - Light-sensitive photographic materials - Google Patents

Light-sensitive photographic materials

Info

Publication number
GB1056786A
GB1056786A GB1445864A GB1445864A GB1056786A GB 1056786 A GB1056786 A GB 1056786A GB 1445864 A GB1445864 A GB 1445864A GB 1445864 A GB1445864 A GB 1445864A GB 1056786 A GB1056786 A GB 1056786A
Authority
GB
United Kingdom
Prior art keywords
ferrocene
mono
light
bis
prepared
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1445864A
Inventor
Jean-Pierre Camille Ger Dubosc
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of GB1056786A publication Critical patent/GB1056786A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00—Metallocenes
    • C07F17/02—Metallocenes of metals of Groups 8, 9 or 10 of the Periodic Table
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/735—Organo-metallic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Mono- and bis-(p-N,N-dimethyl amino cinnamoyl) ferrocene are prepared by reacting mono- and diacetyl ferrocene respectively with p-N,N-dimethyl amino benzaldehyde, the mono- and di-acetyl ferrocene having been obtained by reacting ferrocene with acetyl chloride. Similarly mono- and bis-(5-phenyl-penta-2,4-dienoyl) ferrocene are prepared using cinnamic aldehyde and bis-(p-hydroxy ethoxy-cinnamoyl)-ferrocene is prepared using p-hydroxy ethoxy-benzaldehyde.
GB1445864A 1963-04-09 1964-04-08 Light-sensitive photographic materials Expired GB1056786A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR930965A FR1361470A (en) 1963-04-09 1963-04-09 Photographic products based on cyclopentadienyl compounds and novel compounds which can be used for their manufacture

Publications (1)

Publication Number Publication Date
GB1056786A true GB1056786A (en) 1967-01-25

Family

ID=8801267

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1445864A Expired GB1056786A (en) 1963-04-09 1964-04-08 Light-sensitive photographic materials

Country Status (2)

Country Link
FR (1) FR1361470A (en)
GB (1) GB1056786A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2497584B1 (en) * 1981-01-06 1987-09-04 Inst Elementoorganicheskikh So PHOTOSENSITIVE FORMULATION FOR RECORDING MATERIAL

Also Published As

Publication number Publication date
FR1361470A (en) 1964-05-22

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