GB1020328A - Processing of semiconductor devices - Google Patents

Processing of semiconductor devices

Info

Publication number
GB1020328A
GB1020328A GB5052264A GB5052264A GB1020328A GB 1020328 A GB1020328 A GB 1020328A GB 5052264 A GB5052264 A GB 5052264A GB 5052264 A GB5052264 A GB 5052264A GB 1020328 A GB1020328 A GB 1020328A
Authority
GB
United Kingdom
Prior art keywords
semi
slices
conductor
devices
diffused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5052264A
Inventor
John Colin Fox
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB5052264A priority Critical patent/GB1020328A/en
Publication of GB1020328A publication Critical patent/GB1020328A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Abstract

1,020,328. Semi-conductor devices. STANDARD TELEPHONES & CABLES Ltd. Dec. 11, 1964, No. 50522/64. Heading H1K. In a method of making a semi-conductor device a semi-conductor body is etched to remove surface contamination, and subsequently lifetime reducing impurity is applied to the surface of the body and diffused into the body. The semi-conductor body must be protected from the action of light between these two steps because the action of light gives rise to surface conditions which inhibit the introduction of lifetime reducing impurities. Resultant devices would have random variations in their switching properties. In the embodiment described silicon slices containing partially formed planar transistors are individually subjected to the following treatment which was carried out in subdued lighting. Each slice is cleaned in boiling concentrated sulphuric acid, washed in de-ionized water, etched in aqueous ammonium bifluoride to remove any oxide film, washed with de-ionized water, and blown dry with an air jet. (At this stage the slices may be stored in the dark in water or in a solution containing free hydrofluoric acid.) Still in subdued lighting the slices are loaded in a vacuum evaporator and gold deposited on one surface of each of the slices and diffused in. A similar treatment may be given to germanium devices but an alternative oxide-removing etchant to aqueous ammonium bifluoride may be needed.
GB5052264A 1964-12-11 1964-12-11 Processing of semiconductor devices Expired GB1020328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB5052264A GB1020328A (en) 1964-12-11 1964-12-11 Processing of semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5052264A GB1020328A (en) 1964-12-11 1964-12-11 Processing of semiconductor devices

Publications (1)

Publication Number Publication Date
GB1020328A true GB1020328A (en) 1966-02-16

Family

ID=10456209

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5052264A Expired GB1020328A (en) 1964-12-11 1964-12-11 Processing of semiconductor devices

Country Status (1)

Country Link
GB (1) GB1020328A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1988567A1 (en) * 2006-02-01 2008-11-05 Tohoku University Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1988567A1 (en) * 2006-02-01 2008-11-05 Tohoku University Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface
EP1988567A4 (en) * 2006-02-01 2009-12-02 Univ Tohoku Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface
US8268735B2 (en) 2006-02-01 2012-09-18 Tohoku University Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface

Similar Documents

Publication Publication Date Title
GB1208574A (en) Methods of manufacturing semiconductor devices
GB864705A (en) Improvements in or relating to methods of producing silicon bodies
GB1225061A (en) Manufacturing semiconductor devices
GB955018A (en) Low capacitance semiconductor devices
US3909325A (en) Polycrystalline etch
US3813311A (en) Process for etching silicon wafers
GB1020328A (en) Processing of semiconductor devices
US3445924A (en) Method for fabricating insulated-gate field effect transistors having controlled operating characteristics
KR100197339B1 (en) Method of removing damaged crystal areas from silicon wafers
US3607477A (en) Etchants,the treatment of moncrystalline semiconductor wafers therewith and semiconductor devices incorporating such wafers
US4052253A (en) Semiconductor-oxide etchant
GB1209914A (en) Improvements in or relating to semi-conductor devices
US3784424A (en) Process for boron containing glasses useful with semiconductor devices
GB1106787A (en) Improvements in semiconductor devices
US2935781A (en) Manufacture of germanium translators
US3767493A (en) Two-step photo-etching method for semiconductors
US3007830A (en) Surface treatments of semiconductive bodies
US2698780A (en) Method of treating germanium for translating devices
GB1264879A (en)
GB1383165A (en) Manufacturing semiconductor devices
KR900001065B1 (en) Surface treatment of semiconductor device
GB1059039A (en) Method of treating the surface of semiconductor material
US3523819A (en) Method for treating the surface of semiconductor device
GB1031451A (en) Controlled rectifiers
SU152034A1 (en) The method of processing the pn junctions of semiconductor devices