GB0805846D0 - Planar tape - Google Patents

Planar tape

Info

Publication number
GB0805846D0
GB0805846D0 GBGB0805846.3A GB0805846A GB0805846D0 GB 0805846 D0 GB0805846 D0 GB 0805846D0 GB 0805846 A GB0805846 A GB 0805846A GB 0805846 D0 GB0805846 D0 GB 0805846D0
Authority
GB
United Kingdom
Prior art keywords
planar tape
planar
tape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB0805846.3A
Other versions
GB2458906A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to GB0805846A priority Critical patent/GB2458906A/en
Publication of GB0805846D0 publication Critical patent/GB0805846D0/en
Priority to CN2009801115014A priority patent/CN102007068A/en
Priority to JP2010538247A priority patent/JP2011519729A/en
Priority to PCT/JP2009/057016 priority patent/WO2009123332A1/en
Publication of GB2458906A publication Critical patent/GB2458906A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00634—Processes for shaping materials not provided for in groups B81C1/00444 - B81C1/00626
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/008—Manufacture of substrate-free structures separating the processed structure from a mother substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/2018—Selective epilaxial growth, e.g. simultaneous deposition of mono - and non-mono semiconductor materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0361—Tips, pillars
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/05—Type of movement
    • B81B2203/058—Rotation out of a plane parallel to the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/191—Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/221—Carbon nanotubes
GB0805846A 2008-04-01 2008-04-01 Nanowire manufacture Withdrawn GB2458906A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GB0805846A GB2458906A (en) 2008-04-01 2008-04-01 Nanowire manufacture
CN2009801115014A CN102007068A (en) 2008-04-01 2009-03-30 Planar tape
JP2010538247A JP2011519729A (en) 2008-04-01 2009-03-30 Fabrication of structures with low-dimensional nanostructures
PCT/JP2009/057016 WO2009123332A1 (en) 2008-04-01 2009-03-30 Planar tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0805846A GB2458906A (en) 2008-04-01 2008-04-01 Nanowire manufacture

Publications (2)

Publication Number Publication Date
GB0805846D0 true GB0805846D0 (en) 2008-04-30
GB2458906A GB2458906A (en) 2009-10-07

Family

ID=39387068

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0805846A Withdrawn GB2458906A (en) 2008-04-01 2008-04-01 Nanowire manufacture

Country Status (4)

Country Link
JP (1) JP2011519729A (en)
CN (1) CN102007068A (en)
GB (1) GB2458906A (en)
WO (1) WO2009123332A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2458907A (en) 2008-04-01 2009-10-07 Sharp Kk Device interconnects
GB2459251A (en) 2008-04-01 2009-10-21 Sharp Kk Semiconductor nanowire devices
CN103101877B (en) * 2013-01-28 2016-04-27 北京大学 A kind of method for manufacturing gas sensor based on ordered nano linear array
KR101660364B1 (en) * 2013-11-18 2016-10-11 한국세라믹기술원 Method of manufacturing a substrate and method of manufacturing a light emitting device
CN105632843B (en) * 2014-11-26 2018-06-26 中国科学院宁波材料技术与工程研究所 A kind of three-dimensional is micro-/receive electric mechanical switch and preparation method thereof
US11417729B2 (en) * 2019-08-29 2022-08-16 Taiwan Semiconductor Manufacturing Company, Ltd. Transistors with channels formed of low-dimensional materials and method forming same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001091441A (en) * 1999-07-16 2001-04-06 Japan Science & Technology Corp Nanometer-order mechanical oscillator, manufacturing method thereof, and measurement device using it
US6872645B2 (en) * 2002-04-02 2005-03-29 Nanosys, Inc. Methods of positioning and/or orienting nanostructures
AU2003293511A1 (en) * 2002-12-11 2004-06-30 Arizona Board Of Regents, Acting For And On Behalf Of, Arizona State University Polarization-enhanced detector with gold nanorods for detecting nanoscale rotational motion and method therefor
EP1652218A2 (en) * 2003-08-04 2006-05-03 Nanosys, Inc. System and process for producing nanowire composites and electronic substrates therefrom
US7067328B2 (en) * 2003-09-25 2006-06-27 Nanosys, Inc. Methods, devices and compositions for depositing and orienting nanostructures
CA2572798A1 (en) * 2004-07-07 2006-07-27 Nanosys, Inc. Systems and methods for harvesting and integrating nanowires
JP5028744B2 (en) * 2005-02-15 2012-09-19 富士通株式会社 Method for forming carbon nanotube and method for manufacturing electronic device
JP2006261386A (en) * 2005-03-17 2006-09-28 Matsushita Electric Ind Co Ltd Electromagnetic wave generating device
US7906803B2 (en) * 2005-12-06 2011-03-15 Canon Kabushiki Kaisha Nano-wire capacitor and circuit device therewith
GB2442768A (en) * 2006-10-11 2008-04-16 Sharp Kk A method of encapsulating low dimensional structures
CN101529116A (en) * 2006-10-16 2009-09-09 佛姆法克特股份有限公司 Making and using carbon nanotube probes

Also Published As

Publication number Publication date
CN102007068A (en) 2011-04-06
WO2009123332A1 (en) 2009-10-08
JP2011519729A (en) 2011-07-14
GB2458906A (en) 2009-10-07

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)