GB0618564D0 - Exposure tool and method - Google Patents

Exposure tool and method

Info

Publication number
GB0618564D0
GB0618564D0 GB0618564A GB0618564A GB0618564D0 GB 0618564 D0 GB0618564 D0 GB 0618564D0 GB 0618564 A GB0618564 A GB 0618564A GB 0618564 A GB0618564 A GB 0618564A GB 0618564 D0 GB0618564 D0 GB 0618564D0
Authority
GB
United Kingdom
Prior art keywords
exposure tool
exposure
tool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0618564A
Other versions
GB2442017A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Exitech Ltd
Original Assignee
Exitech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Exitech Ltd filed Critical Exitech Ltd
Priority to GB0618564A priority Critical patent/GB2442017A/en
Publication of GB0618564D0 publication Critical patent/GB0618564D0/en
Priority to PCT/GB2007/003513 priority patent/WO2008035046A1/en
Priority to TW96134838A priority patent/TW200825635A/en
Publication of GB2442017A publication Critical patent/GB2442017A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB0618564A 2006-09-20 2006-09-20 Repeating pattern exposure Withdrawn GB2442017A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB0618564A GB2442017A (en) 2006-09-20 2006-09-20 Repeating pattern exposure
PCT/GB2007/003513 WO2008035046A1 (en) 2006-09-20 2007-09-17 Exposure tool and method
TW96134838A TW200825635A (en) 2006-09-20 2007-09-19 Exposure tool and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0618564A GB2442017A (en) 2006-09-20 2006-09-20 Repeating pattern exposure

Publications (2)

Publication Number Publication Date
GB0618564D0 true GB0618564D0 (en) 2006-11-01
GB2442017A GB2442017A (en) 2008-03-26

Family

ID=37421337

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0618564A Withdrawn GB2442017A (en) 2006-09-20 2006-09-20 Repeating pattern exposure

Country Status (3)

Country Link
GB (1) GB2442017A (en)
TW (1) TW200825635A (en)
WO (1) WO2008035046A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI755963B (en) * 2020-06-23 2022-02-21 國立成功大學 Method and apparatus for forming three-dimensional micro-structure

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4785192A (en) * 1984-06-21 1988-11-15 American Telephone And Telegraph Company, At&T Bell Laboratories Maintaining optical signals in prescribed alignment with respect to workpiece in movable equipment
EP0829036B9 (en) * 1996-04-01 2001-07-25 ASM Lithography B.V. Lithographic scanning exposure projection apparatus
JP4372576B2 (en) * 2003-03-19 2009-11-25 シャープ株式会社 Exposure mask and pattern exposure method
GB2422679A (en) * 2005-01-28 2006-08-02 Exitech Ltd Exposure method and tool

Also Published As

Publication number Publication date
TW200825635A (en) 2008-06-16
WO2008035046A1 (en) 2008-03-27
GB2442017A (en) 2008-03-26

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)