GB0018749D0 - Chemical amplification type negative resist compositions - Google Patents

Chemical amplification type negative resist compositions

Info

Publication number
GB0018749D0
GB0018749D0 GB0018749A GB0018749A GB0018749D0 GB 0018749 D0 GB0018749 D0 GB 0018749D0 GB 0018749 A GB0018749 A GB 0018749A GB 0018749 A GB0018749 A GB 0018749A GB 0018749 D0 GB0018749 D0 GB 0018749D0
Authority
GB
United Kingdom
Prior art keywords
negative resist
resist compositions
chemical amplification
amplification type
type negative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB0018749A
Other versions
GB2352826A (en
GB2352826B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of GB0018749D0 publication Critical patent/GB0018749D0/en
Publication of GB2352826A publication Critical patent/GB2352826A/en
Application granted granted Critical
Publication of GB2352826B publication Critical patent/GB2352826B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
GB0018749A 1999-08-02 2000-07-31 Chemical amplification type negative resist compositions Expired - Fee Related GB2352826B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21842199A JP4348786B2 (en) 1999-08-02 1999-08-02 Chemically amplified negative resist composition

Publications (3)

Publication Number Publication Date
GB0018749D0 true GB0018749D0 (en) 2000-09-20
GB2352826A GB2352826A (en) 2001-02-07
GB2352826B GB2352826B (en) 2002-10-02

Family

ID=16719660

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0018749A Expired - Fee Related GB2352826B (en) 1999-08-02 2000-07-31 Chemical amplification type negative resist compositions

Country Status (5)

Country Link
JP (1) JP4348786B2 (en)
KR (1) KR20010021160A (en)
DE (1) DE10037173A1 (en)
GB (1) GB2352826B (en)
TW (1) TW574621B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4401033B2 (en) * 2001-03-19 2010-01-20 Ａｚエレクトロニックマテリアルズ株式会社 Negative photosensitive resin composition and display device using the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5580695A (en) * 1992-02-25 1996-12-03 Japan Synthetic Rubber Co., Ltd. Chemically amplified resist

Also Published As

Publication number Publication date
TW574621B (en) 2004-02-01
GB2352826A (en) 2001-02-07
KR20010021160A (en) 2001-03-15
JP4348786B2 (en) 2009-10-21
GB2352826B (en) 2002-10-02
JP2001042529A (en) 2001-02-16
DE10037173A1 (en) 2001-02-15

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20040731