FR93695E - A method of epitaxial deposition in liquid phase of gallium arsenide. - Google Patents
A method of epitaxial deposition in liquid phase of gallium arsenide.Info
- Publication number
- FR93695E FR93695E FR134422A FR134422A FR93695E FR 93695 E FR93695 E FR 93695E FR 134422 A FR134422 A FR 134422A FR 134422 A FR134422 A FR 134422A FR 93695 E FR93695 E FR 93695E
- Authority
- FR
- France
- Prior art keywords
- liquid phase
- gallium arsenide
- epitaxial deposition
- epitaxial
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/06—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt at least one but not all components of the crystal composition being added
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
- C30B19/061—Tipping system, e.g. by rotation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/10—Controlling or regulating
- C30B19/106—Controlling or regulating adding crystallising material or reactants forming it in situ to the liquid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02395—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02625—Liquid deposition using melted materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR134422A FR93695E (en) | 1967-10-20 | 1967-12-29 | A method of epitaxial deposition in liquid phase of gallium arsenide. |
GB49228/68A GB1242410A (en) | 1967-10-20 | 1968-10-17 | Method of crystallizing a binary semiconductor compound |
SE14025/68A SE338761B (en) | 1967-10-20 | 1968-10-17 | |
CH1556368A CH532959A (en) | 1967-10-20 | 1968-10-17 | Process for crystallizing a binary semiconductor compound |
DE1803731A DE1803731C3 (en) | 1967-10-20 | 1968-10-18 | Process for crystallizing a binary semiconductor compound |
NL6815008A NL6815008A (en) | 1967-10-20 | 1968-10-19 | |
BE722667D BE722667A (en) | 1967-10-20 | 1968-10-21 | |
US769319A US3632431A (en) | 1967-10-20 | 1968-10-21 | Method of crystallizing a binary semiconductor compound |
CA033033A CA920484A (en) | 1967-10-20 | 1968-10-21 | Method of crystallizing a binary semiconductor compound |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR125281A FR1552004A (en) | 1967-10-20 | 1967-10-20 | |
FR134422A FR93695E (en) | 1967-10-20 | 1967-12-29 | A method of epitaxial deposition in liquid phase of gallium arsenide. |
Publications (1)
Publication Number | Publication Date |
---|---|
FR93695E true FR93695E (en) | 1969-05-02 |
Family
ID=26180184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR134422A Expired FR93695E (en) | 1967-10-20 | 1967-12-29 | A method of epitaxial deposition in liquid phase of gallium arsenide. |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR93695E (en) |
-
1967
- 1967-12-29 FR FR134422A patent/FR93695E/en not_active Expired
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR1500728A (en) | Isobutane oxidation liquid phase process | |
FR93225E (en) | Method and device for applying sealing membranes to containers. | |
CH477924A (en) | Method of depositing a liquid on a surface | |
IT947435B (en) | SELECTIVE EPITAXIAL GROWTH PROCESS IN THE LIQUID PHASE | |
CH513577A (en) | Process for cutting standing trees | |
FR93695E (en) | A method of epitaxial deposition in liquid phase of gallium arsenide. | |
FR2331377A1 (en) | REACTOR FOR EPITAXY IN LIQUID PHASE | |
FR93011E (en) | A process for the catalytic liquid phase dehydrogenation of cyclododecanol. | |
FR1508229A (en) | Process for the connection by brewing of a tubing on an aluminum tank and resulting product | |
FR93694E (en) | Liquid phase epitaxial deposition process. | |
FR1227145A (en) | Pipe for transporting extremely cold liquid | |
CH490277A (en) | Method for distilling a saline solution, installation for carrying out the method and application of the method | |
CH468814A (en) | Container for plant pots | |
GB1180314A (en) | Process for the Production of Gallium Arsenide | |
FR1537039A (en) | Method of depositing a liquid on a surface | |
BE770277A (en) | PROCESS FOR THE PASSIVATION OF MESA TYPE PN JUNCTION STRUCTURES | |
FR1522197A (en) | Method for forming an ohmic contact on n-type gallium arsenide | |
FR1413806A (en) | Lightweight packaging for shipping plants in pots | |
FR1410776A (en) | Liquid phase hydrocarbon oligomerization process | |
FR1406762A (en) | Process for obtaining gallium arsenide | |
FR1540013A (en) | Method of forming epitaxial gallium arsenide | |
BE618986A (en) | Device for the gas phase deposition of a semiconductor product on support bars having the same structural network | |
CH494746A (en) | Process for preparing a urea-antibiotic adduct | |
FR96011E (en) | Method for stabilizing the soil. | |
FR1530809A (en) | Process for the hydrogenation of nitriles in the liquid phase |