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Publication of FR859973ApublicationCriticalpatent/FR859973A/fr
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/20—Exposure; Apparatus therefor
G03F7/24—Curved surfaces
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FR859973D1939-02-031939-02-03Dispositif pour le report photomécanique de motifs sur les cylindres servant à l'obtention de cylindres d'impression
ExpiredFR859973A
(fr)