FR857623A - Device comprising a cathode ray tube with magnetic deflection of the cathode beam - Google Patents

Device comprising a cathode ray tube with magnetic deflection of the cathode beam

Info

Publication number
FR857623A
FR857623A FR857623DA FR857623A FR 857623 A FR857623 A FR 857623A FR 857623D A FR857623D A FR 857623DA FR 857623 A FR857623 A FR 857623A
Authority
FR
France
Prior art keywords
cathode
ray tube
magnetic deflection
cathode ray
cathode beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of FR857623A publication Critical patent/FR857623A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70—Arrangements for deflecting ray or beam
    • H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J29/76—Deflecting by magnetic fields only
FR857623D 1938-07-12 1939-07-10 Device comprising a cathode ray tube with magnetic deflection of the cathode beam Expired FR857623A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL212927X 1938-07-12

Publications (1)

Publication Number Publication Date
FR857623A true FR857623A (en) 1940-09-21

Family

ID=19778912

Family Applications (1)

Application Number Title Priority Date Filing Date
FR857623D Expired FR857623A (en) 1938-07-12 1939-07-10 Device comprising a cathode ray tube with magnetic deflection of the cathode beam

Country Status (7)

Country Link
US (1) US2260725A (en)
BE (1) BE435372A (en)
CH (1) CH212927A (en)
DE (1) DE750003C (en)
FR (1) FR857623A (en)
GB (1) GB520374A (en)
NL (1) NL54218C (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3123747A (en) * 1964-03-03 Magnetizable core
DE912822C (en) * 1950-02-14 1954-06-03 Telefunken Gmbh Arrangement for eliminating a dip in the frequency curve of a low-frequency transmission device for a larger frequency range by a transmitter with chamber windings and / or nested windings or by a choke with chamber windings
US5311028A (en) * 1990-08-29 1994-05-10 Nissin Electric Co., Ltd. System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions
US5132544A (en) * 1990-08-29 1992-07-21 Nissin Electric Company Ltd. System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning
US5438203A (en) * 1994-06-10 1995-08-01 Nissin Electric Company System and method for unipolar magnetic scanning of heavy ion beams
US5481116A (en) * 1994-06-10 1996-01-02 Ibis Technology Corporation Magnetic system and method for uniformly scanning heavy ion beams
US5672879A (en) * 1995-06-12 1997-09-30 Glavish; Hilton F. System and method for producing superimposed static and time-varying magnetic fields
US6677599B2 (en) * 2000-03-27 2004-01-13 Applied Materials, Inc. System and method for uniformly implanting a wafer with an ion beam
AU2001270133A1 (en) 2000-06-22 2002-01-02 Proteros, Llc Ion implantation uniformity correction using beam current control

Also Published As

Publication number Publication date
GB520374A (en) 1940-04-22
US2260725A (en) 1941-10-28
BE435372A (en)
CH212927A (en) 1940-12-31
DE750003C (en) 1944-12-11
NL54218C (en)

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