FR84875E - Improvements to the thin-film deposition processes and to the devices for implementing said improved process - Google Patents

Improvements to the thin-film deposition processes and to the devices for implementing said improved process

Info

Publication number
FR84875E
FR84875E FR955784A FR955784A FR84875E FR 84875 E FR84875 E FR 84875E FR 955784 A FR955784 A FR 955784A FR 955784 A FR955784 A FR 955784A FR 84875 E FR84875 E FR 84875E
Authority
FR
France
Prior art keywords
implementing
thin
devices
film deposition
improved process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR955784A
Other languages
French (fr)
Inventor
Lucien Censier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lignes Telegraphiques et Telephoniques LTT SA
Original Assignee
Lignes Telegraphiques et Telephoniques LTT SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lignes Telegraphiques et Telephoniques LTT SA filed Critical Lignes Telegraphiques et Telephoniques LTT SA
Priority to FR955784A priority Critical patent/FR84875E/en
Priority to GB1164A priority patent/GB1017741A/en
Priority to DE19641521356 priority patent/DE1521356A1/en
Application granted granted Critical
Publication of FR84875E publication Critical patent/FR84875E/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
FR955784A 1963-01-22 1963-12-03 Improvements to the thin-film deposition processes and to the devices for implementing said improved process Expired FR84875E (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR955784A FR84875E (en) 1963-12-03 1963-12-03 Improvements to the thin-film deposition processes and to the devices for implementing said improved process
GB1164A GB1017741A (en) 1963-01-22 1964-01-01 Improvements relating to vacuum coating processes
DE19641521356 DE1521356A1 (en) 1963-01-22 1964-01-16 Method of applying thin layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR955784A FR84875E (en) 1963-12-03 1963-12-03 Improvements to the thin-film deposition processes and to the devices for implementing said improved process

Publications (1)

Publication Number Publication Date
FR84875E true FR84875E (en) 1965-04-30

Family

ID=8817937

Family Applications (1)

Application Number Title Priority Date Filing Date
FR955784A Expired FR84875E (en) 1963-01-22 1963-12-03 Improvements to the thin-film deposition processes and to the devices for implementing said improved process

Country Status (1)

Country Link
FR (1) FR84875E (en)

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