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NL LAB DE SPAARNESTAD NV
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NL LAB DE SPAARNESTAD NV
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Application filed by NL LAB DE SPAARNESTAD NVfiledCriticalNL LAB DE SPAARNESTAD NV
Application grantedgrantedCritical
Publication of FR791383ApublicationCriticalpatent/FR791383A/fr
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F5/00—Screening processes; Screens therefor
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
FR791383D1935-03-271935-06-17Procédé et couche sensible à la lumière pour la production d'images tramées
ExpiredFR791383A
(fr)