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MARINONI
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MARINONI
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Application grantedgrantedCritical
Publication of FR716520ApublicationCriticalpatent/FR716520A/fr
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/20—Exposure; Apparatus therefor
G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
FR716520D1931-05-041931-05-04Perfectionnements aux procédés d'impression en creux
ExpiredFR716520A
(fr)