FR466617A - New type of fitting for armament of power line poles - Google Patents
New type of fitting for armament of power line polesInfo
- Publication number
- FR466617A FR466617A FR466617DA FR466617A FR 466617 A FR466617 A FR 466617A FR 466617D A FR466617D A FR 466617DA FR 466617 A FR466617 A FR 466617A
- Authority
- FR
- France
- Prior art keywords
- armament
- fitting
- power line
- new type
- line poles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02G—INSTALLATION OF ELECTRIC CABLES OR LINES, OR OF COMBINED OPTICAL AND ELECTRIC CABLES OR LINES
- H02G7/00—Overhead installations of electric lines or cables
- H02G7/20—Spatial arrangements or dispositions of lines or cables on poles, posts or towers
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR466617T | 1913-12-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR466617A true FR466617A (en) | 1914-05-19 |
Family
ID=1505366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR466617D Expired FR466617A (en) | 1913-12-26 | 1913-12-26 | New type of fitting for armament of power line poles |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR466617A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6001227A (en) * | 1997-11-26 | 1999-12-14 | Applied Materials, Inc. | Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target |
US6139701A (en) * | 1997-11-26 | 2000-10-31 | Applied Materials, Inc. | Copper target for sputter deposition |
US6315872B1 (en) | 1997-11-26 | 2001-11-13 | Applied Materials, Inc. | Coil for sputter deposition |
-
1913
- 1913-12-26 FR FR466617D patent/FR466617A/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6001227A (en) * | 1997-11-26 | 1999-12-14 | Applied Materials, Inc. | Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target |
US6126791A (en) * | 1997-11-26 | 2000-10-03 | Applied Materials, Inc. | Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target |
US6139701A (en) * | 1997-11-26 | 2000-10-31 | Applied Materials, Inc. | Copper target for sputter deposition |
US6171455B1 (en) | 1997-11-26 | 2001-01-09 | Applied Materials Inc. | Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target |
US6228186B1 (en) | 1997-11-26 | 2001-05-08 | Applied Materials, Inc. | Method for manufacturing metal sputtering target for use in DC magnetron so that target has reduced number of conduction anomalies |
US6315872B1 (en) | 1997-11-26 | 2001-11-13 | Applied Materials, Inc. | Coil for sputter deposition |
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