FR3088924B1 - Method for producing a micromechanical component for an interferometer installation and component obtained - Google Patents
Method for producing a micromechanical component for an interferometer installation and component obtained Download PDFInfo
- Publication number
- FR3088924B1 FR3088924B1 FR1913100A FR1913100A FR3088924B1 FR 3088924 B1 FR3088924 B1 FR 3088924B1 FR 1913100 A FR1913100 A FR 1913100A FR 1913100 A FR1913100 A FR 1913100A FR 3088924 B1 FR3088924 B1 FR 3088924B1
- Authority
- FR
- France
- Prior art keywords
- component
- layer
- producing
- sacrificial layer
- applying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000009434 installation Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000005530 etching Methods 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/284—Interference filters of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0002—Arrangements for avoiding sticking of the flexible or moving parts
- B81B3/001—Structures having a reduced contact area, e.g. with bumps or with a textured surface
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Abstract
Titre : Procédé de réalisation d’un composant micromécanique pour une installation d’interféromètre et composant obtenu Procédé consistant à fournir (S1) un support (T1) et y placer (S1a) une couche sacrificielle (O1) avec une résistance à la gravure sur le support (T1) et appliquer (S2) une couche intermédiaire (Z1), appliquer (S3) une couche sacrificielle (O2) qui a une autre résistance à la gravure sur la couche intermédiaire (Z1) ; structurer (S4) la couche sacrificielle (O2), et y modifier la résistance à la gravure, appliquer (S5) une couche intermédiaire (Z2) sur la couche sacrificielle (O2), pour que la couche (Z2) soit parallèle sur la première couche (Z1), et enlever partiellement (S6) la première et/ou la seconde couche sacrificielle (O1, O2) au-dessus ou dans la zone structurée (B2). Figure 1Title: Method for producing a micromechanical component for an interferometer installation and component obtained Method consisting in supplying (S1) a support (T1) and placing (S1a) thereon a sacrificial layer (O1) with an etching resistance on the support (T1) and applying (S2) an intermediate layer (Z1), applying (S3) a sacrificial layer (O2) which has another resistance to etching on the intermediate layer (Z1); structuring (S4) the sacrificial layer (O2), and modifying the etching resistance therein, applying (S5) an intermediate layer (Z2) on the sacrificial layer (O2), so that the layer (Z2) is parallel on the first layer (Z1), and partially removing (S6) the first and/or the second sacrificial layer (O1, O2) above or in the structured zone (B2). Figure 1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102018220463.2 | 2018-11-28 | ||
DE102018220463.2A DE102018220463A1 (en) | 2018-11-28 | 2018-11-28 | Method for producing a micromechanical component for an interferometer device, micromechanical component for an interferometer device and interferometer device |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3088924A1 FR3088924A1 (en) | 2020-05-29 |
FR3088924B1 true FR3088924B1 (en) | 2022-07-08 |
Family
ID=70545917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1913100A Active FR3088924B1 (en) | 2018-11-28 | 2019-11-22 | Method for producing a micromechanical component for an interferometer installation and component obtained |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102018220463A1 (en) |
FR (1) | FR3088924B1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102019217184A1 (en) * | 2019-11-07 | 2021-05-12 | Robert Bosch Gmbh | Method for producing an intermediate component in a micromechanical Fabry-Perot interferometer device, method for producing a micromechanical Fabry-Perot interferometer device and micromechanical Fabry-Perot interferometer device |
CN117003197B (en) * | 2023-09-26 | 2024-03-26 | 之江实验室 | Preparation method of high-temperature inertial chip capable of being integrated on crystal and provided with vertical Fabry-Perot cavity |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7429334B2 (en) * | 2004-09-27 | 2008-09-30 | Idc, Llc | Methods of fabricating interferometric modulators by selectively removing a material |
US7547568B2 (en) * | 2006-02-22 | 2009-06-16 | Qualcomm Mems Technologies, Inc. | Electrical conditioning of MEMS device and insulating layer thereof |
JP4784495B2 (en) | 2006-11-28 | 2011-10-05 | 株式会社デンソー | Optical multilayer mirror and Fabry-Perot interferometer having the same |
US20120235970A1 (en) * | 2011-03-18 | 2012-09-20 | Qualcomm Mems Technologies, Inc. | Thin film desiccant and method of fabrication |
-
2018
- 2018-11-28 DE DE102018220463.2A patent/DE102018220463A1/en active Pending
-
2019
- 2019-11-22 FR FR1913100A patent/FR3088924B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
FR3088924A1 (en) | 2020-05-29 |
DE102018220463A1 (en) | 2020-05-28 |
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Legal Events
Date | Code | Title | Description |
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PLSC | Publication of the preliminary search report |
Effective date: 20201002 |
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PLFP | Fee payment |
Year of fee payment: 3 |
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PLFP | Fee payment |
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PLFP | Fee payment |
Year of fee payment: 5 |