FR3064731B1 - OXIDIZATION OVEN - Google Patents

OXIDIZATION OVEN Download PDF

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Publication number
FR3064731B1
FR3064731B1 FR1752684A FR1752684A FR3064731B1 FR 3064731 B1 FR3064731 B1 FR 3064731B1 FR 1752684 A FR1752684 A FR 1752684A FR 1752684 A FR1752684 A FR 1752684A FR 3064731 B1 FR3064731 B1 FR 3064731B1
Authority
FR
France
Prior art keywords
torch
oxidization
oven
oxidization oven
furnace tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1752684A
Other languages
French (fr)
Other versions
FR3064731A1 (en
Inventor
Arnaud Henault
Anne-Sophie Cocchi
Julien Paillas
Joel Bottiero
Didier Landru
Oleg Kokongchuck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soitec SA
Original Assignee
Soitec SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soitec SA filed Critical Soitec SA
Priority to FR1752684A priority Critical patent/FR3064731B1/en
Priority to TW107110561A priority patent/TW201837411A/en
Priority to PCT/EP2018/000146 priority patent/WO2018177601A1/en
Publication of FR3064731A1 publication Critical patent/FR3064731A1/en
Application granted granted Critical
Publication of FR3064731B1 publication Critical patent/FR3064731B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Especially adapted for treating semiconductor wafers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0033—Heating elements or systems using burners
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection

Abstract

L'invention concerne un four d'oxydation de plaques semiconductrices comprenant une torche 12 connectée à un tube de four 11 par une connection fluidique 14 et un moyen pour ajuster un flux de gaz en aval de la torche 12 en direction du tube de four 11.The invention relates to a semiconductor wafer oxidation furnace comprising a torch 12 connected to a furnace tube 11 by a fluidic connection 14 and means for adjusting a gas flow downstream from the torch 12 towards the furnace tube 11. .

FR1752684A 2017-03-30 2017-03-30 OXIDIZATION OVEN Active FR3064731B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR1752684A FR3064731B1 (en) 2017-03-30 2017-03-30 OXIDIZATION OVEN
TW107110561A TW201837411A (en) 2017-03-30 2018-03-27 Oxidation furnace
PCT/EP2018/000146 WO2018177601A1 (en) 2017-03-30 2018-03-29 Oxidation furnace

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1752684A FR3064731B1 (en) 2017-03-30 2017-03-30 OXIDIZATION OVEN
FR1752684 2017-03-30

Publications (2)

Publication Number Publication Date
FR3064731A1 FR3064731A1 (en) 2018-10-05
FR3064731B1 true FR3064731B1 (en) 2021-01-01

Family

ID=58739239

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1752684A Active FR3064731B1 (en) 2017-03-30 2017-03-30 OXIDIZATION OVEN

Country Status (3)

Country Link
FR (1) FR3064731B1 (en)
TW (1) TW201837411A (en)
WO (1) WO2018177601A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0710935U (en) * 1993-07-24 1995-02-14 ヤマハ株式会社 Vertical heat treatment furnace
US5777300A (en) * 1993-11-19 1998-07-07 Tokyo Electron Kabushiki Kaisha Processing furnace for oxidizing objects
US6221791B1 (en) * 1999-06-02 2001-04-24 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and method for oxidizing silicon substrates

Also Published As

Publication number Publication date
FR3064731A1 (en) 2018-10-05
WO2018177601A1 (en) 2018-10-04
TW201837411A (en) 2018-10-16

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