FR3014212B1 - Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact - Google Patents

Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact

Info

Publication number
FR3014212B1
FR3014212B1 FR1362065A FR1362065A FR3014212B1 FR 3014212 B1 FR3014212 B1 FR 3014212B1 FR 1362065 A FR1362065 A FR 1362065A FR 1362065 A FR1362065 A FR 1362065A FR 3014212 B1 FR3014212 B1 FR 3014212B1
Authority
FR
France
Prior art keywords
positioning
photolithography mask
optical non
contact method
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1362065A
Other languages
English (en)
Other versions
FR3014212A1 (fr
Inventor
Gilles Fresquet
Guenael Ribette
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unity Semiconductor SAS
Original Assignee
Fogale Nanotech SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1362065A priority Critical patent/FR3014212B1/fr
Application filed by Fogale Nanotech SA filed Critical Fogale Nanotech SA
Priority to US15/039,833 priority patent/US9897927B2/en
Priority to JP2016536580A priority patent/JP2016539375A/ja
Priority to EP14814785.3A priority patent/EP3077873B1/fr
Priority to PCT/EP2014/076009 priority patent/WO2015082363A1/fr
Priority to SG11201604325RA priority patent/SG11201604325RA/en
Priority to KR1020167015942A priority patent/KR20160093021A/ko
Priority to CN201480066168.0A priority patent/CN105829971B/zh
Priority to TW103141887A priority patent/TWI636345B/zh
Publication of FR3014212A1 publication Critical patent/FR3014212A1/fr
Application granted granted Critical
Publication of FR3014212B1 publication Critical patent/FR3014212B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR1362065A 2013-12-04 2013-12-04 Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact Expired - Fee Related FR3014212B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1362065A FR3014212B1 (fr) 2013-12-04 2013-12-04 Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact
JP2016536580A JP2016539375A (ja) 2013-12-04 2014-11-28 非接触光学的方法を用いてフォトリソグラフィマスクを位置付けるための装置および方法
EP14814785.3A EP3077873B1 (fr) 2013-12-04 2014-11-28 Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact
PCT/EP2014/076009 WO2015082363A1 (fr) 2013-12-04 2014-11-28 Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact
US15/039,833 US9897927B2 (en) 2013-12-04 2014-11-28 Device and method for positioning a photolithography mask by a contactless optical method
SG11201604325RA SG11201604325RA (en) 2013-12-04 2014-11-28 Device and method for positioning a photolithography mask by means of a contactless optical method
KR1020167015942A KR20160093021A (ko) 2013-12-04 2014-11-28 비접촉 광학 방법을 이용한 포토리소그래피 마스크를 위치시키기 위한 방법 및 장치
CN201480066168.0A CN105829971B (zh) 2013-12-04 2014-11-28 用于通过无接触式光学法定位光刻掩模的装置和方法
TW103141887A TWI636345B (zh) 2013-12-04 2014-12-03 藉由非接觸式光學方法用以定位光刻遮罩的裝置和方法以及用於曝光晶圓的工具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1362065A FR3014212B1 (fr) 2013-12-04 2013-12-04 Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact

Publications (2)

Publication Number Publication Date
FR3014212A1 FR3014212A1 (fr) 2015-06-05
FR3014212B1 true FR3014212B1 (fr) 2017-05-26

Family

ID=50029106

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1362065A Expired - Fee Related FR3014212B1 (fr) 2013-12-04 2013-12-04 Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact

Country Status (9)

Country Link
US (1) US9897927B2 (fr)
EP (1) EP3077873B1 (fr)
JP (1) JP2016539375A (fr)
KR (1) KR20160093021A (fr)
CN (1) CN105829971B (fr)
FR (1) FR3014212B1 (fr)
SG (1) SG11201604325RA (fr)
TW (1) TWI636345B (fr)
WO (1) WO2015082363A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107208996B (zh) * 2014-12-12 2020-04-07 沃思测量技术股份有限公司 用于测量工件的特征的方法和设备
US10473714B2 (en) * 2017-03-06 2019-11-12 Asm Technology Singapore Pte Ltd Method and apparatus for aligning electronic components
CN108036732B (zh) * 2017-11-30 2020-05-26 中国科学院光电技术研究所 一种基于超分辨光刻的间隙检测装置
CN110557968A (zh) * 2018-04-03 2019-12-10 应用材料公司 用于对准基板的设备、系统和方法
DE102018114860A1 (de) * 2018-06-20 2019-12-24 Precitec Optronik Gmbh Vorrichtung und Verfahren zur optischen Vermessung eines Messobjekts
FR3093560B1 (fr) * 2019-03-05 2021-10-29 Fogale Nanotech Procédé et dispositif de mesure d’interfaces d’un élément optique
KR102199964B1 (ko) * 2019-04-30 2021-01-07 한양대학교 에리카산학협력단 근접 노광을 위한 기판 변형 장치 및 이를 이용한 근접 노광을 위한 기판 변형 방법
EP3800505A1 (fr) * 2019-10-03 2021-04-07 ASML Netherlands B.V. Système de mesure et procédé de caractérisation d'un dispositif de placement de motif
US11852464B2 (en) * 2021-12-20 2023-12-26 Mloptic Corp. Chromatic confocal sensor with imaging capability for 6-axis spatial allocation calibration

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
US4636626A (en) * 1983-01-14 1987-01-13 Nippon Kogaku K.K. Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication
DE69013790T2 (de) * 1989-08-04 1995-05-04 Canon Kk Verfahren und Vorrichtung zur Positionsbestimmung.
US5808742A (en) * 1995-05-31 1998-09-15 Massachusetts Institute Of Technology Optical alignment apparatus having multiple parallel alignment marks
JP2004165723A (ja) * 2002-11-08 2004-06-10 Olympus Corp 電子撮像装置
US7650029B2 (en) * 2004-11-23 2010-01-19 Hewlett-Packard Development Company, L.P. Multiple layer alignment sensing
US7800761B2 (en) * 2006-04-12 2010-09-21 Massachusetts Institute Of Technology Infrared interferometric-spatial-phase imaging using backside wafer marks
US7535646B2 (en) * 2006-11-17 2009-05-19 Eastman Kodak Company Light emitting device with microlens array
NL1036683A1 (nl) * 2008-04-14 2009-10-15 Asml Netherlands Bv Focus sensor, inspection apparatus, lithographic apparatus and control system.
JP2011164503A (ja) * 2010-02-15 2011-08-25 Hitachi Displays Ltd 表示装置
JP5736672B2 (ja) * 2010-06-03 2015-06-17 株式会社ニコン 光学部品及び分光測光装置
JP5424267B2 (ja) * 2010-08-06 2014-02-26 株式会社ブイ・テクノロジー マイクロレンズ露光装置
US8419233B2 (en) * 2011-05-10 2013-04-16 Applied Lighting Company Lampshade structure for LED lamps
US9760020B2 (en) * 2012-11-21 2017-09-12 Kla-Tencor Corporation In-situ metrology

Also Published As

Publication number Publication date
FR3014212A1 (fr) 2015-06-05
JP2016539375A (ja) 2016-12-15
CN105829971B (zh) 2017-09-08
TWI636345B (zh) 2018-09-21
WO2015082363A1 (fr) 2015-06-11
US9897927B2 (en) 2018-02-20
US20160377995A1 (en) 2016-12-29
CN105829971A (zh) 2016-08-03
KR20160093021A (ko) 2016-08-05
SG11201604325RA (en) 2016-07-28
EP3077873B1 (fr) 2018-02-14
EP3077873A1 (fr) 2016-10-12
TW201527908A (zh) 2015-07-16

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