FR2986011A1 - DEEP MICROGRAPH PROCESS - Google Patents

DEEP MICROGRAPH PROCESS Download PDF

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Publication number
FR2986011A1
FR2986011A1 FR1250631A FR1250631A FR2986011A1 FR 2986011 A1 FR2986011 A1 FR 2986011A1 FR 1250631 A FR1250631 A FR 1250631A FR 1250631 A FR1250631 A FR 1250631A FR 2986011 A1 FR2986011 A1 FR 2986011A1
Authority
FR
France
Prior art keywords
deep
micrograph
chemical species
plasma
plasma consisting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR1250631A
Other languages
French (fr)
Other versions
FR2986011B1 (en
Inventor
Remi Dussart
Philippe Lefaucheux
Thomas Tillocher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR1250631A priority Critical patent/FR2986011B1/en
Priority to PCT/EP2013/051094 priority patent/WO2013110583A1/en
Publication of FR2986011A1 publication Critical patent/FR2986011A1/en
Application granted granted Critical
Publication of FR2986011B1 publication Critical patent/FR2986011B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Catalysts (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

L'invention se rapporte à un procédé de microgravure profonde par plasma d'un objet en titane, selon lequel on le grave alternativement à l'aide d'un premier plasma constitué d'au moins une première espèce chimique, puis d'un second plasma constitué d'au moins une seconde espèce chimique, caractérisé par le fait que ladite première espèce chimique est à base de chlore, tandis que la seconde est à base de fluor.The invention relates to a method of deep microgravure by plasma of a titanium object, according to which it is etched alternately with the aid of a first plasma consisting of at least a first chemical species, then a second plasma consisting of at least a second chemical species, characterized in that said first chemical species is based on chlorine, while the second is based on fluorine.

FR1250631A 2012-01-23 2012-01-23 DEEP MICROGRAPH PROCESS Expired - Fee Related FR2986011B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR1250631A FR2986011B1 (en) 2012-01-23 2012-01-23 DEEP MICROGRAPH PROCESS
PCT/EP2013/051094 WO2013110583A1 (en) 2012-01-23 2013-01-22 Method for deep micro-etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1250631A FR2986011B1 (en) 2012-01-23 2012-01-23 DEEP MICROGRAPH PROCESS

Publications (2)

Publication Number Publication Date
FR2986011A1 true FR2986011A1 (en) 2013-07-26
FR2986011B1 FR2986011B1 (en) 2014-02-14

Family

ID=47594773

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1250631A Expired - Fee Related FR2986011B1 (en) 2012-01-23 2012-01-23 DEEP MICROGRAPH PROCESS

Country Status (2)

Country Link
FR (1) FR2986011B1 (en)
WO (1) WO2013110583A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040207074A1 (en) * 2003-04-16 2004-10-21 The Regents Of The University Of California Metal MEMS devices and methods of making same
US20100125254A1 (en) * 2005-09-30 2010-05-20 The Regents Of The University Of California Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced
EP2256549A1 (en) * 2009-05-29 2010-12-01 Obducat AB Fabrication of Metallic Stamps for Replication Technology

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040207074A1 (en) * 2003-04-16 2004-10-21 The Regents Of The University Of California Metal MEMS devices and methods of making same
US20100125254A1 (en) * 2005-09-30 2010-05-20 The Regents Of The University Of California Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced
EP2256549A1 (en) * 2009-05-29 2010-12-01 Obducat AB Fabrication of Metallic Stamps for Replication Technology

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
FRANCESCO FRACASSI ET AL: "Chemistry of titanium dry etching in fluorinated and chlorinated gases", PURE & APPL. CHEM., vol. 64, no. 5, 1 January 1992 (1992-01-01), pages 703 - 707, XP055046869 *
ZHANG Y ET AL: "Single-Mask, Flip-Bonded Titanium-On-Glass (FBTOG) Technology for Wafer-Level Batch Fabrication of Suspended High-Aspect-Ratio Bulk Titanium Microstructures", PROCEDIA CHEMISTRY, ELSEVIER, AMSTERDAM, NL, vol. 1, no. 1, 1 September 2009 (2009-09-01), pages 758 - 761, XP026799656, ISSN: 1876-6196, [retrieved on 20090901] *

Also Published As

Publication number Publication date
WO2013110583A1 (en) 2013-08-01
FR2986011B1 (en) 2014-02-14

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Effective date: 20150930