FR2986011A1 - DEEP MICROGRAPH PROCESS - Google Patents
DEEP MICROGRAPH PROCESS Download PDFInfo
- Publication number
- FR2986011A1 FR2986011A1 FR1250631A FR1250631A FR2986011A1 FR 2986011 A1 FR2986011 A1 FR 2986011A1 FR 1250631 A FR1250631 A FR 1250631A FR 1250631 A FR1250631 A FR 1250631A FR 2986011 A1 FR2986011 A1 FR 2986011A1
- Authority
- FR
- France
- Prior art keywords
- deep
- micrograph
- chemical species
- plasma
- plasma consisting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Catalysts (AREA)
- ing And Chemical Polishing (AREA)
Abstract
L'invention se rapporte à un procédé de microgravure profonde par plasma d'un objet en titane, selon lequel on le grave alternativement à l'aide d'un premier plasma constitué d'au moins une première espèce chimique, puis d'un second plasma constitué d'au moins une seconde espèce chimique, caractérisé par le fait que ladite première espèce chimique est à base de chlore, tandis que la seconde est à base de fluor.The invention relates to a method of deep microgravure by plasma of a titanium object, according to which it is etched alternately with the aid of a first plasma consisting of at least a first chemical species, then a second plasma consisting of at least a second chemical species, characterized in that said first chemical species is based on chlorine, while the second is based on fluorine.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1250631A FR2986011B1 (en) | 2012-01-23 | 2012-01-23 | DEEP MICROGRAPH PROCESS |
PCT/EP2013/051094 WO2013110583A1 (en) | 2012-01-23 | 2013-01-22 | Method for deep micro-etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1250631A FR2986011B1 (en) | 2012-01-23 | 2012-01-23 | DEEP MICROGRAPH PROCESS |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2986011A1 true FR2986011A1 (en) | 2013-07-26 |
FR2986011B1 FR2986011B1 (en) | 2014-02-14 |
Family
ID=47594773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1250631A Expired - Fee Related FR2986011B1 (en) | 2012-01-23 | 2012-01-23 | DEEP MICROGRAPH PROCESS |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR2986011B1 (en) |
WO (1) | WO2013110583A1 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040207074A1 (en) * | 2003-04-16 | 2004-10-21 | The Regents Of The University Of California | Metal MEMS devices and methods of making same |
US20100125254A1 (en) * | 2005-09-30 | 2010-05-20 | The Regents Of The University Of California | Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced |
EP2256549A1 (en) * | 2009-05-29 | 2010-12-01 | Obducat AB | Fabrication of Metallic Stamps for Replication Technology |
-
2012
- 2012-01-23 FR FR1250631A patent/FR2986011B1/en not_active Expired - Fee Related
-
2013
- 2013-01-22 WO PCT/EP2013/051094 patent/WO2013110583A1/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040207074A1 (en) * | 2003-04-16 | 2004-10-21 | The Regents Of The University Of California | Metal MEMS devices and methods of making same |
US20100125254A1 (en) * | 2005-09-30 | 2010-05-20 | The Regents Of The University Of California | Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced |
EP2256549A1 (en) * | 2009-05-29 | 2010-12-01 | Obducat AB | Fabrication of Metallic Stamps for Replication Technology |
Non-Patent Citations (2)
Title |
---|
FRANCESCO FRACASSI ET AL: "Chemistry of titanium dry etching in fluorinated and chlorinated gases", PURE & APPL. CHEM., vol. 64, no. 5, 1 January 1992 (1992-01-01), pages 703 - 707, XP055046869 * |
ZHANG Y ET AL: "Single-Mask, Flip-Bonded Titanium-On-Glass (FBTOG) Technology for Wafer-Level Batch Fabrication of Suspended High-Aspect-Ratio Bulk Titanium Microstructures", PROCEDIA CHEMISTRY, ELSEVIER, AMSTERDAM, NL, vol. 1, no. 1, 1 September 2009 (2009-09-01), pages 758 - 761, XP026799656, ISSN: 1876-6196, [retrieved on 20090901] * |
Also Published As
Publication number | Publication date |
---|---|
WO2013110583A1 (en) | 2013-08-01 |
FR2986011B1 (en) | 2014-02-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20150930 |