FR2957938B1 - GAS INJECTION DEVICE WITH UNIFORM GAS SPEED - Google Patents

GAS INJECTION DEVICE WITH UNIFORM GAS SPEED

Info

Publication number
FR2957938B1
FR2957938B1 FR1001255A FR1001255A FR2957938B1 FR 2957938 B1 FR2957938 B1 FR 2957938B1 FR 1001255 A FR1001255 A FR 1001255A FR 1001255 A FR1001255 A FR 1001255A FR 2957938 B1 FR2957938 B1 FR 2957938B1
Authority
FR
France
Prior art keywords
gas
injection device
speed
uniform
gas injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1001255A
Other languages
French (fr)
Other versions
FR2957938A1 (en
Inventor
Jacques Constant Stefan Kools
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOOLERHEADZ
Original Assignee
KOOLERHEADZ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1001255A priority Critical patent/FR2957938B1/en
Application filed by KOOLERHEADZ filed Critical KOOLERHEADZ
Priority to PCT/IB2011/051274 priority patent/WO2011121508A1/en
Priority to US13/638,094 priority patent/US9410248B2/en
Priority to EP11717025.8A priority patent/EP2553144B1/en
Priority to EP11716061.4A priority patent/EP2553143B1/en
Priority to PCT/IB2011/051273 priority patent/WO2011121507A1/en
Priority to US13/638,047 priority patent/US8721835B2/en
Publication of FR2957938A1 publication Critical patent/FR2957938A1/en
Application granted granted Critical
Publication of FR2957938B1 publication Critical patent/FR2957938B1/en
Priority to US15/204,404 priority patent/US10221479B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45582—Expansion of gas before it reaches the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B01J4/002—Nozzle-type elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00—Influencing flow of fluids
    • F15D1/08—Influencing flow of fluids of jets leaving an orifice
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2204/00—Aspects relating to feed or outlet devices; Regulating devices for feed or outlet devices
    • B01J2204/002—Aspects relating to feed or outlet devices; Regulating devices for feed or outlet devices the feeding side being of particular interest
FR1001255A 2010-03-29 2010-03-29 GAS INJECTION DEVICE WITH UNIFORM GAS SPEED Active FR2957938B1 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR1001255A FR2957938B1 (en) 2010-03-29 2010-03-29 GAS INJECTION DEVICE WITH UNIFORM GAS SPEED
US13/638,094 US9410248B2 (en) 2010-03-29 2011-03-25 Modular gas injection device
EP11717025.8A EP2553144B1 (en) 2010-03-29 2011-03-25 Gas injection device with uniform gas velocity
EP11716061.4A EP2553143B1 (en) 2010-03-29 2011-03-25 Modular gas injection device
PCT/IB2011/051274 WO2011121508A1 (en) 2010-03-29 2011-03-25 Modular gas injection device
PCT/IB2011/051273 WO2011121507A1 (en) 2010-03-29 2011-03-25 Gas injection device with uniform gas velocity
US13/638,047 US8721835B2 (en) 2010-03-29 2011-03-25 Gas injection device with uniform gas velocity
US15/204,404 US10221479B2 (en) 2010-03-29 2016-07-07 Modular gas injection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1001255A FR2957938B1 (en) 2010-03-29 2010-03-29 GAS INJECTION DEVICE WITH UNIFORM GAS SPEED

Publications (2)

Publication Number Publication Date
FR2957938A1 FR2957938A1 (en) 2011-09-30
FR2957938B1 true FR2957938B1 (en) 2012-10-05

Family

ID=42735569

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1001255A Active FR2957938B1 (en) 2010-03-29 2010-03-29 GAS INJECTION DEVICE WITH UNIFORM GAS SPEED

Country Status (1)

Country Link
FR (1) FR2957938B1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3525527A1 (en) * 1985-07-17 1987-01-29 Vsr Eng Foerdertechnik HIGH-SPEED BLOW-OUT NOZZLE
FI84573C (en) * 1990-03-20 1991-12-27 Raute Oy BLAOSANORDNING FOER VINDSPRIDNING AV SPAONOR.
FR2661554A1 (en) * 1990-04-30 1991-10-31 Philips Electronique Lab Device for introducing gases into the chamber of an epitaxy reactor, reactor chamber including such a gas-introduction device, and use of such a chamber for producing semiconducting layers
GB2286856B (en) * 1994-02-16 1998-09-16 Mitsubishi Electric Corp Blower
US20010032588A1 (en) * 2000-04-21 2001-10-25 Kenji Harafuji Semiconductor film deposition apparatus
US6544869B1 (en) * 2000-06-23 2003-04-08 Matsushita Electric Industrial Co., Ltd. Method and apparatus for depositing semiconductor film and method for fabricating semiconductor device
US7163587B2 (en) * 2002-02-08 2007-01-16 Axcelis Technologies, Inc. Reactor assembly and processing method

Also Published As

Publication number Publication date
FR2957938A1 (en) 2011-09-30

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Legal Events

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Name of requester: ENCAPSULIX, FR

Effective date: 20130415

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