FR2948229B1 - METHOD FOR CALIBRATING A NIGHT OVEN AND RECRYSTALLIZING GERMANIUM USING SUCH A METHOD - Google Patents

METHOD FOR CALIBRATING A NIGHT OVEN AND RECRYSTALLIZING GERMANIUM USING SUCH A METHOD

Info

Publication number
FR2948229B1
FR2948229B1 FR0954887A FR0954887A FR2948229B1 FR 2948229 B1 FR2948229 B1 FR 2948229B1 FR 0954887 A FR0954887 A FR 0954887A FR 0954887 A FR0954887 A FR 0954887A FR 2948229 B1 FR2948229 B1 FR 2948229B1
Authority
FR
France
Prior art keywords
recrystallizing
calibrating
germanium
night
oven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0954887A
Other languages
French (fr)
Other versions
FR2948229A1 (en
Inventor
Stephane Koffel
Alain Claverie
Pascal Scheiblin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0954887A priority Critical patent/FR2948229B1/en
Priority to PCT/EP2010/060248 priority patent/WO2011006975A1/en
Publication of FR2948229A1 publication Critical patent/FR2948229A1/en
Application granted granted Critical
Publication of FR2948229B1 publication Critical patent/FR2948229B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Especially adapted for treating semiconductor wafers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/02—Furnaces of a kind not covered by any preceding group specially designed for laboratory use
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Clinical Laboratory Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Recrystallisation Techniques (AREA)
FR0954887A 2009-07-15 2009-07-15 METHOD FOR CALIBRATING A NIGHT OVEN AND RECRYSTALLIZING GERMANIUM USING SUCH A METHOD Expired - Fee Related FR2948229B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0954887A FR2948229B1 (en) 2009-07-15 2009-07-15 METHOD FOR CALIBRATING A NIGHT OVEN AND RECRYSTALLIZING GERMANIUM USING SUCH A METHOD
PCT/EP2010/060248 WO2011006975A1 (en) 2009-07-15 2010-07-15 Method for calibrating an annealing furnace and germanium recrystallization using such a method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0954887A FR2948229B1 (en) 2009-07-15 2009-07-15 METHOD FOR CALIBRATING A NIGHT OVEN AND RECRYSTALLIZING GERMANIUM USING SUCH A METHOD

Publications (2)

Publication Number Publication Date
FR2948229A1 FR2948229A1 (en) 2011-01-21
FR2948229B1 true FR2948229B1 (en) 2011-11-25

Family

ID=41667524

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0954887A Expired - Fee Related FR2948229B1 (en) 2009-07-15 2009-07-15 METHOD FOR CALIBRATING A NIGHT OVEN AND RECRYSTALLIZING GERMANIUM USING SUCH A METHOD

Country Status (2)

Country Link
FR (1) FR2948229B1 (en)
WO (1) WO2011006975A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113281304B (en) * 2021-04-01 2023-11-21 上海新昇半导体科技有限公司 Annealing furnace cooling rate calibration method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6993407B2 (en) * 2003-10-02 2006-01-31 Taiwan Semiconductor Manufacturing Company Method and system for analyzing semiconductor fabrication

Also Published As

Publication number Publication date
WO2011006975A1 (en) 2011-01-20
FR2948229A1 (en) 2011-01-21

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20130329