FR2929747A1 - SUPER-RESOLUTION OPTICAL DISK WITH HIGH READING STABILITY - Google Patents

SUPER-RESOLUTION OPTICAL DISK WITH HIGH READING STABILITY Download PDF

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FR2929747A1
FR2929747A1 FR0801870A FR0801870A FR2929747A1 FR 2929747 A1 FR2929747 A1 FR 2929747A1 FR 0801870 A FR0801870 A FR 0801870A FR 0801870 A FR0801870 A FR 0801870A FR 2929747 A1 FR2929747 A1 FR 2929747A1
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layer
active layer
dielectric
super
interface
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French (fr)
Inventor
Bernard Andre
Berangere Hyot
Fabien Laulagnet
Joseph Pichon
Marie Francoise Armand
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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Priority to FR0801870A priority Critical patent/FR2929747A1/en
Priority to PCT/EP2009/053895 priority patent/WO2009121912A1/en
Publication of FR2929747A1 publication Critical patent/FR2929747A1/en
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G11B7/2578Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G11B2007/25705Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
    • G11B2007/25706Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials containing transition metal elements (Zn, Fe, Co, Ni, Pt)
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G11B2007/25705Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
    • G11B2007/2571Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials containing group 14 elements except carbon (Si, Ge, Sn, Pb)
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G11B2007/25705Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
    • G11B2007/25713Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials containing nitrogen
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G11B2007/25705Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
    • G11B2007/25715Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials containing oxygen

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

L'invention concerne un disque optique à super-résolution à stabilité de lecture élevée. Le disque comprend au moins une couche de protection (102) en surface, un substrat (110) sur lequel est déposé un empilement (120) comprenant au moins une couche active (108) aux propriétés non linéaires réversibles, la couche active (108) étant intercalée entre au moins une première couche diélectrique (104a) déposée sous la couche de protection et une seconde couche diélectrique déposée sur le substrat (110), le disque comprenant en outre une couche d'interface (106) intercalée entre entre au moins une des deux couches diélectriques (104a, 104b) et la couche active (108), la couche d'interface (106) étant constituée d'un matériau choisi parmi les matériaux suivants : ZrO2 ; HfO2 ; TiO2 ; Cr2O3, Si3N4.. L'invention s'applique notamment à la réalisation de disques à super-résolution de ultra-haute densité, en particulier à la réalisation des disques à super-résolution préenregistrés.The invention relates to a super-resolution optical disc with high read stability. The disc comprises at least one protective layer (102) on the surface, a substrate (110) on which is deposited a stack (120) comprising at least one active layer (108) with non-linear reversible properties, the active layer (108) being interposed between at least a first dielectric layer (104a) deposited under the protective layer and a second dielectric layer deposited on the substrate (110), the disc further comprising an interface layer (106) interposed between at least one the two dielectric layers (104a, 104b) and the active layer (108), the interface layer (106) being made of a material selected from the following materials: ZrO2; HfO2; TiO2; Cr2O3, Si3N4. The invention is particularly applicable to the production of ultra-high density super-resolution disks, in particular to the production of pre-recorded super-resolution disks.

Description

Disque optique à super-résolution à stabilité de lecture élevée Super-resolution optical disk with high readability

L'invention concerne un disque optique à super-résolution à stabilité de lecture élevée, c'est-à-dire un disque à super-résolution acceptant un grand nombre de cycles de lecture. L'invention s'applique notamment à la réalisation de disques à super-résolution de ultra-haute densité, en particulier à la réalisation des disques à super-résolution préenregistrés. The invention relates to a super-resolution optical disc with high read stability, that is to say a super-resolution disc that accepts a large number of read cycles. The invention applies in particular to the production of ultra-high density super-resolution disks, in particular to the production of prerecorded super-resolution disks.

Les disques optiques préenregistrés ou ROM, selon l'acronyme anglo-saxon Read Orily Memory , comportent un substrat structuré recouvert d'une couche réfléchissante, la structure du substrat comprenant une série de marques suffisamment grandes pour être détectées par une tête de lecture optique. Pour certains disques, appelés disques à super-résolution, la structure du substrat comprend des marques théoriquement trop petites pour être détectées par une tête de lecture optique. Aussi, pour rendre possible la détection de ces petites marques, le substrat est recouvert d'un empilement de couches minces, cet empilement étant parfois qualifié d' empilement actif car au moins une couche de l'empilement a des propriétés non linéaires optiques. A titre d'exemple, un disque à super-résolution comporte des petites marques d'une longueur de 80 nm et un empilement actif comprenant une couche de matériau semi-conducteur InSb encapsulée entre deux couches de matériau diélectrique ZnS-SiO2. Le passage d'un laser de haute puissance sur l'empilement actif permet de détecter les petites marques du substrat structuré. Cependant, un problème est posé lorsque des marques d'un disque sont lues un grand nombre de fois car la lecture du disque à haute puissance produit une élévation de la température de l'empilement actif sous le spot laser. La répétition de cet échauffement à chaque cycle de lecture est susceptible de provoquer des changements structurels irréversibles dans les matériaux constituant le disque, et peut se traduire, in fine, par une dégradation de lecture du signal obtenu. Après un nombre de cycles de lecture donné, plusieurs dégradation peuvent survenir, notamment une diffusion de matière entre les couches de l'empilement actif, un décollement progressif des couches minces constituant l'empilement, une modification de la microstructure cristalline du matériau à propriétés non linéaires optiques, ou encore une déformation des marques du substrat structuré. Ainsi, contrairement aux disques ROM n'ayant pas de capacités de lecture par super-résolution, qui peuvent être lus quasiment indéfiniment, les disques ROM à super-résolution acceptent un nombre de cycles de lecture limité. Ce phénomène est particulièrement critique dans le cas de disques à super-résolution. Pre-recorded optical discs or ROMs, according to the acronym Read Orily Memory, comprise a structured substrate covered with a reflective layer, the structure of the substrate comprising a series of marks large enough to be detected by an optical reading head. For some discs, called super-resolution discs, the substrate structure includes marks theoretically too small to be detected by an optical pickup. Also, to make possible the detection of these small marks, the substrate is covered with a stack of thin layers, this stack sometimes being called active stack because at least one layer of the stack has optical nonlinear properties. By way of example, a super-resolution disk comprises small marks with a length of 80 nm and an active stack comprising a layer of InSb semiconductor material encapsulated between two layers of ZnS-SiO2 dielectric material. The passage of a high power laser on the active stack makes it possible to detect the small marks of the structured substrate. However, a problem is raised when marks of a disc are read a large number of times because the reading of the high power disc produces a rise in the temperature of the active stack under the laser spot. The repetition of this heating at each reading cycle is likely to cause irreversible structural changes in the materials constituting the disc, and may ultimately result in a degradation of the reading of the signal obtained. After a given number of read cycles, several degradation can occur, in particular a diffusion of material between the layers of the active stack, a gradual detachment of the thin layers constituting the stack, a modification of the crystalline microstructure of the material with no properties. linear lines, or deformation of the marks of the structured substrate. Thus, unlike ROMs that do not have super-resolution read capabilities, which can be read almost indefinitely, the super-resolution ROMs accept a limited number of read cycles. This phenomenon is particularly critical in the case of super-resolution disks.

Un but de l'invention est d'améliorer la stabilité de lecture d'un disque optique à super-résolution, la qualité du signal délivré lors de sa lecture, et globalement le nombre de cycles de lecture possibles au cours de la vie du disque. A cet effet, l'invention a pour objet un disque de stockage optique à lecture par super-résolution comprenant au moins une couche de protection en surface, un substrat sur lequel est déposé un empilement comprenant au moins une couche active aux propriétés non linéaires réversibles, la couche active étant intercalée entre au moins une première couche diélectrique déposée sous la couche de protection et une seconde couche diélectrique déposée sur le substrat, le disque étant caractérisé en ce qu'au moins une couche d'interface est intercalée entre au moins une des deux couches diélectriques et la couche active, la couche d'interface étant constituée d'un matériau choisi parmi les matériaux suivants : ZrO2 ; HfO2 ; TiO2 ; Cr2O3 Si3N4. An object of the invention is to improve the reading stability of a super-resolution optical disk, the quality of the signal delivered during its reading, and overall the number of possible read cycles during the lifetime of the disk. . For this purpose, the subject of the invention is a super-resolution optical reading disk comprising at least one surface protection layer, a substrate on which is deposited a stack comprising at least one active layer with reversible non-linear properties. the active layer being interposed between at least a first dielectric layer deposited under the protective layer and a second dielectric layer deposited on the substrate, the disc being characterized in that at least one interface layer is interposed between at least one the two dielectric layers and the active layer, the interface layer consisting of a material selected from the following materials: ZrO2; HfO2; TiO2; Cr2O3 Si3N4.

La présence de cette couche d'interface entre la couche active et la couche diélectrique permet notamment de limiter la dégradation du signal lors de l'augmentation du nombre de cycles de lecture effectués. De préférence, le matériau choisi pour la couche d'interface est le ZrO2. Selon un mode de réalisation, ladite couche d'interface est déposée entre la première couche diélectrique et la couche active. Selon un autre mode de réalisation, elle est déposée entre la deuxième couche diélectrique et la couche active. Selon un troisième mode de réalisation, une première couche d'interface est déposée entre la première couche diélectrique et la couche active, et une deuxième couche d'interface est déposée entre la deuxième couche diélectrique et la couche active. Selon un mode de réalisation, chaque couche diélectrique a une épaisseur sensiblement égale à 50 nm, la couche active a une épaisseur sensiblement égale à 20 nm, et la (ou les) couche(s) d'interface a (ont) une épaisseur comprise entre 3 nm et 20 nm. The presence of this interface layer between the active layer and the dielectric layer makes it possible in particular to limit the degradation of the signal when increasing the number of read cycles performed. Preferably, the material chosen for the interface layer is ZrO2. According to one embodiment, said interface layer is deposited between the first dielectric layer and the active layer. According to another embodiment, it is deposited between the second dielectric layer and the active layer. According to a third embodiment, a first interface layer is deposited between the first dielectric layer and the active layer, and a second interface layer is deposited between the second dielectric layer and the active layer. According to one embodiment, each dielectric layer has a thickness substantially equal to 50 nm, the active layer has a thickness substantially equal to 20 nm, and the interface layer (s) has (have) a thickness of between 3 nm and 20 nm.

Selon un mode de réalisation, la somme des épaisseurs de couches d'interface et de couches diélectriques au-dessus de la couche active est sensiblement égale à la somme des épaisseurs de couches d'interface de couches diélectriques en dessous de la couche active. Selon un mode de réalisation, les couches diélectriques comprennent du ZnS-SiO2. According to one embodiment, the sum of the thicknesses of interface layers and dielectric layers above the active layer is substantially equal to the sum of the thicknesses of dielectric layer interface layers below the active layer. According to one embodiment, the dielectric layers comprise ZnS-SiO2.

D'autres caractéristiques apparaîtront à la lecture de la description détaillée donnée à titre d'exemple et non limitative qui suit faite en regard de dessins annexés qui représentent : la figure 1, un premier mode de réalisation vu en coupe d'une structure de disque selon l'invention, la figure 2, un deuxième mode de réalisation vu en coupe d'une structure de disque selon l'invention. Other characteristics will become apparent on reading the detailed description given by way of non-limiting example, which follows, with reference to appended drawings which represent: FIG. 1, a first embodiment seen in section of a disk structure according to the invention, Figure 2, a second embodiment seen in section of a disk structure according to the invention.

La figure 1 présente un premier mode de réalisation d'une structure utilisée dans un disque optique selon l'invention. FIG. 1 shows a first embodiment of a structure used in an optical disk according to the invention.

Le disque comprend un substrat 110 recouvert d'un empilement 120 de couches minces, une couche protectrice transparente 102 étant déposée sur l'empilement. A titre illustratif, des valeurs numériques sont données pour le disque de la figure 1. Le disque est adapté à être lu par une tête optique d'ouverture numérique égale à 0.85, dont la limite de résolution est 120 nm, la tête produisant un faisceau laser dont la longueur d'onde est égale à 405 nm. L'information portée par le disque est formée par le substrat structuré, celui-ci comprenant des séquences codées sous la forme de marques espacées, les marques ayant des longueurs comprises entre 2T et 9T, T étant une dimension élémentaire égale, dans l'exemple, à 40 nm, contre 160 nm pour le format classique Blu-Ray. Les petites marques, dont la longueur est égale à 2T ou 3T, ont donc une longueur respectivement égale à 80 nm et 120 nm, inférieure ou égale à la limite de résolution de la tête optique. Par conséquent, l'effet de super-résolution est nécessaire à la détection de ces petites marques. The disc comprises a substrate 110 covered with a stack 120 of thin layers, a transparent protective layer 102 being deposited on the stack. By way of illustration, numerical values are given for the disk of FIG. 1. The disk is adapted to be read by an optical head with a numerical aperture equal to 0.85, whose resolution limit is 120 nm, the head producing a beam laser whose wavelength is equal to 405 nm. The information carried by the disk is formed by the structured substrate, the latter comprising coded sequences in the form of spaced marks, the marks having lengths between 2T and 9T, T being an equal elementary dimension, in the example , at 40 nm, against 160 nm for the classic Blu-Ray format. The small marks, whose length is equal to 2T or 3T, therefore have a length equal to 80 nm and 120 nm, respectively, less than or equal to the resolution limit of the optical head. Therefore, the super-resolution effect is necessary for the detection of these small marks.

Le substrat 110 est formé, par exemple, d'un matériau polymère comme le polycarbonate;, ou de verre qui porte des marques physiques en creux et bosses représentant l'information stockée. La couche protectrice 102 est formée, dans l'exemple, d'un polycarbonate, de préférence d'une épaisseur de l'ordre de 100 micromètres. The substrate 110 is formed, for example, of a polymeric material such as polycarbonate, or glass which bears hollow physical marks and bumps representing the stored information. The protective layer 102 is formed, in the example, of a polycarbonate, preferably of a thickness of the order of 100 micrometers.

L'empilement 120 de couches minces comprend une première couche diélectrique 104a, une couche d'interface 106, une couche active 108, et une seconde couche diélectrique 104b, dans l'ordre, du côté de la couche protectrice 102 vers le côté substrat 110. L'empilement 120 permet d'obtenir l'effet de super-résolution souhaité en étant modifié sous l'effet d'un laser haute puissance. Plus précisément, c'est la couche active 108 qui permet d'obtenir cet effet de super-résolution car elle présente des propriétés non linéaires optiques à la longueur d'onde de travail. La couche active 108 de l'exemple est constituée du composé InSb ; cette couche 108 peut également comprendre un ou plusieurs autres matériaux semi-conducteurs dopés ou non, tels que les composés GaSb ou ZnO. Selon un autre mode de réalisation, la couche active 108 comprend des matériaux à changement de phase tels que le composé AgInSbTe ou le composé GeSbTe. Dans l'exemple, la couche active 108 a une épaisseur de 20 nm. Quant aux couches diélectriques 104a, 104b encadrant la couche active 108, elles permettent notamment d'ajuster les propriétés optiques du disque, mais également d'isoler thermiquement la couche active 108. Dans l'exemple les couches diélectriques 104a, 104b sont formées du composé ZnS-SiO2. D'autres matériaux sont envisageables pour constituer ces couches diélectriques 104a, 104b, ces matériaux étant de préférence, des matériaux diélectriques tels que les composés Si3N4, AIN, HfO2, TiO2 ou encore SiO2. Dans l'exemple, la première couche diélectrique 104a a une épaisseur égale à 35 nm et la seconde couche diélectrique 104b a une épaisseur sensiblement égale à 50 nm. Contrairement aux disques à super-résolution classique, le disque 35 selon l'invention comporte une couche d'interface 106 intercalée de préférence entre la première couche diélectrique 104a et la couche active 108, mais la couche d'interface pourrait aussi, bien que ce soit moins favorable, être intercalée entre la deuxième couche diélectrique 104b et la couche active 108. C'est la présence de cette couche d'interface 106 qui permet, d'une part, d'augmenter la qualité du signal de lecture et, d'autre part, d'améliorer la stabilité en lecture du disque et donc le nombre de cycles de lecture possible au cours de la durée de vie du disque. La couche d'interface 106 présente une faible absorption, de manière à ne pas perturber le processus optique permettant la lecture du disque à super-résolution. Dans l'exemple, cette couche est en ZrO2. Selon un autre mode de réalisation, la couche d'interface 106 comprend un ou plusieurs matériaux diélectriques choisis parmi les oxydes HfO2, TiO2, Cr203, ou Si3N4. L'épaisseur de la couche d'interface 106 est comprise entre 3 nm et 50 nm, de préférence entre 5 nm et 20 nm. Dans l'exemple, l'épaisseur de cette 15 couche d'interface 106 est égale à 15 nm, l'épaisseur de la première couche diélectrique 104a étant ajustée en fonction de l'épaisseur de la couche d'interface 106, de sorte que l'épaisseur totale de matériaux diélectriques de chaque côté de la couche active 108 est égale à 50 nm. Selon un autre mode de réalisation, plusieurs couches d'interface 20 sont disposées entre la première couche diélectrique 104a et la couche active 108. Pour un disque réalisé selon cette configuration et lu à la vitesse de 2,65 m/s, le taux d'erreur binaire TEB (bit error rate BER en anglais) du signal de lecture obtenu est égal à 4.103. En fixant le taux d'erreur maximum 25 TEBmax acceptable à 6.10-3, la stabilité de lecture du disque est ici comprise comme le nombre de cycles de lecture admis avant que le taux d'erreur TEB du signal dépasse TEBmax. Or, avec un disque à super-résolution classique, c'est à dire avec un empilement actif sans couche d'interface 106, la stabilité de lecture du disque est de l'ordre de 3000 cycles de lecture. La stabilité 30 augmente avec une couche d'interface située entre la deuxième couche diélectrique et la couche active. Elle augmente encore et atteint plus de 20000 cycles si la couche d'interface est située entre le laser et la couche active donc entre la première couche diélectrique et la couche active. De plus, la qualité du signal de lecture est améliorée lors des premiers cycles. 35 Par ailleurs, comme l'illustre la figure 2 présentant un deuxième mode de réalisation vu en coupe d'une structure de disque selon l'invention, la couche active 108 peut être encadrée par deux couches d'interface 106a, 106b placées respectivement au-dessus de la couche active 108 et au- dessous d'icelle. Ainsi, par rapport au premier mode de réalisation présenté en figure 1, une deuxième couche d'interface 106b, placée du côté du substrat 110 a été ajoutée. Cette deuxième couche d'interface 106b permet d'améliorer le gain sur l'amplitude du signal de lecture et d'améliorer encore le nombre de 10 lectures possibles. The thin film stack 120 comprises a first dielectric layer 104a, an interface layer 106, an active layer 108, and a second dielectric layer 104b, in order, on the side of the protective layer 102 towards the substrate side 110. The stack 120 makes it possible to obtain the desired super-resolution effect by being modified under the effect of a high power laser. More precisely, it is the active layer 108 that makes it possible to obtain this super-resolution effect because it exhibits optical non-linear properties at the working wavelength. The active layer 108 of the example consists of the compound InSb; this layer 108 may also comprise one or more other doped or non-doped semiconductor materials, such as GaSb or ZnO compounds. According to another embodiment, the active layer 108 comprises phase-change materials such as the AgInSbTe compound or the GeSbTe compound. In the example, the active layer 108 has a thickness of 20 nm. As for the dielectric layers 104a, 104b flanking the active layer 108, they make it possible in particular to adjust the optical properties of the disk, but also to thermally isolate the active layer 108. In the example, the dielectric layers 104a, 104b are formed from the compound ZnS-SiO2. Other materials are conceivable for constituting these dielectric layers 104a, 104b, these materials being preferably dielectric materials such as compounds Si3N4, AlN, HfO2, TiO2 or SiO2. In the example, the first dielectric layer 104a has a thickness equal to 35 nm and the second dielectric layer 104b has a thickness substantially equal to 50 nm. Unlike conventional super-resolution disks, the disk 35 according to the invention comprises an interface layer 106 interposed preferably between the first dielectric layer 104a and the active layer 108, but the interface layer could also, although this is less favorable, be interposed between the second dielectric layer 104b and the active layer 108. It is the presence of this interface layer 106 which allows, on the one hand, to increase the quality of the read signal and, d on the other hand, to improve the reading stability of the disc and thus the number of possible playback cycles during the lifetime of the disc. The interface layer 106 has a low absorption, so as not to disturb the optical process for reading the super-resolution disk. In the example, this layer is in ZrO2. According to another embodiment, the interface layer 106 comprises one or more dielectric materials chosen from the oxides HfO2, TiO2, Cr203, or Si3N4. The thickness of the interface layer 106 is between 3 nm and 50 nm, preferably between 5 nm and 20 nm. In the example, the thickness of this interface layer 106 is equal to 15 nm, the thickness of the first dielectric layer 104a being adjusted according to the thickness of the interface layer 106, so that the total thickness of dielectric materials on each side of the active layer 108 is equal to 50 nm. According to another embodiment, a plurality of interface layers 20 are arranged between the first dielectric layer 104a and the active layer 108. For a disk made according to this configuration and read at a speed of 2.65 m / s, the BER BER bit error rate of the read signal obtained is equal to 4.103. By setting the maximum error rate TEBmax acceptable at 6.10-3, the reading stability of the disk is here understood as the number of read cycles allowed before the error rate TEB of the signal exceeds TEBmax. However, with a conventional super-resolution disk, ie with an active stack without an interface layer 106, the reading stability of the disk is of the order of 3000 read cycles. Stability increases with an interface layer located between the second dielectric layer and the active layer. It increases again and reaches more than 20000 cycles if the interface layer is located between the laser and the active layer and therefore between the first dielectric layer and the active layer. In addition, the quality of the read signal is improved during the first cycles. Furthermore, as illustrated in FIG. 2, showing a second embodiment seen in section of a disk structure according to the invention, the active layer 108 may be framed by two interface layers 106a, 106b placed respectively at above the active layer 108 and below it. Thus, with respect to the first embodiment shown in FIG. 1, a second interface layer 106b, placed on the side of the substrate 110 has been added. This second interface layer 106b makes it possible to improve the gain on the amplitude of the read signal and to further improve the number of possible readings.

La lecture des disques à super-résolution implique généralement le traitement de signaux d'amplitude très faible, signaux parfois difficilement exploitables avec des circuits électroniques conventionnels. Un avantage de 15 la structure du disque selon l'invention est que la qualité du signal de lecture est améliorée, y compris lors des premiers cycles de lecture, ce qui facilite le traitement des signaux. 20 The reading of the super-resolution discs generally involves the processing of signals of very low amplitude, signals that are sometimes difficult to exploit with conventional electronic circuits. An advantage of the disk structure according to the invention is that the quality of the read signal is improved, including during the first read cycles, which facilitates the processing of the signals. 20

Claims (7)

REVENDICATIONS1. Disque de stockage optique à lecture par super-résolution comprenant au moins une couche de protection (102) en surface, un substrat (110) sur lequel est déposé un ernpilement (120) comprenant au moins une couche active (108) aux propriétés non linéaires réversibles, la couche active (108) étant intercalée entre au moins une première couche diélectrique (104a) déposée sous la couche de protection et une seconde couche diélectrique déposée sur le substrat (110), le disque étant caractérisé en ce qu'au moins une couche d'interface (106) est intercalée entre au moins une des deux couches diélectriques (104a, 104b) et la couche active (108), la couche d'interface (106) étant constituée d'un matériau choisi parmi les matériaux suivants : ZrO2 ; HfO2 ; TiO2 ; Cr2O3 ; Si3N4. REVENDICATIONS1. Super-resolution optical storage disc comprising at least one protective layer (102) on the surface, a substrate (110) on which is deposited an elongation (120) comprising at least one active layer (108) with non-linear properties reversible, the active layer (108) being interposed between at least a first dielectric layer (104a) deposited under the protective layer and a second dielectric layer deposited on the substrate (110), the disc being characterized in that at least one interface layer (106) is interposed between at least one of the two dielectric layers (104a, 104b) and the active layer (108), the interface layer (106) being made of a material selected from the following materials: ZrO2; HfO2; TiO2; Cr2O3; Si3N4. 2. Disque de stockage optique selon la revendication 1, caractérisé en ce 15 que ladite couche d'interface (106a) est déposée entre la première couche diélectrique (104a) et la couche active (108). An optical storage disk according to claim 1, characterized in that said interface layer (106a) is deposited between the first dielectric layer (104a) and the active layer (108). 3. Disque de stockage selon la revendication 1, caractérisé en ce que ladite couche d'interface (106b) est déposée entre la deuxième couche 20 diélectrique (104b) et la couche active (108). 3. Storage disk according to claim 1, characterized in that said interface layer (106b) is deposited between the second dielectric layer (104b) and the active layer (108). 4. Disque de stockage selon la revendication 1, caractérisé en ce qu'une première couche d'interface (106a) est déposée entre la première couche diélectrique (104a) et la couche active, et une deuxième couche d'interface 25 (106b) est déposée entre la deuxième couche diélectrique (104b) et la couche active. Storage disk according to claim 1, characterized in that a first interface layer (106a) is deposited between the first dielectric layer (104a) and the active layer, and a second interface layer (106b). is deposited between the second dielectric layer (104b) and the active layer. 5. Disque de stockage optique selon l'une des revendications 1 à 4, caractérisé en ce que chaque couche diélectrique (104a, 104b) a une 30 épaisseur sensiblement égale à 50 nm, la couche active (108) a une épaisseur sensiblement égale à 20 nm, et la couche d'interface (106a, 106b) a une épaisseur comprise entre 3 nm et 50 nm, de préférence entre 5 et 20 nm. 5. Optical storage disk according to one of claims 1 to 4, characterized in that each dielectric layer (104a, 104b) has a thickness substantially equal to 50 nm, the active layer (108) has a thickness substantially equal to 20 nm, and the interface layer (106a, 106b) has a thickness of between 3 nm and 50 nm, preferably between 5 and 20 nm. 6. Disque de stockage optique selon l'une quelconque des revendications précédentes, caractérisé en ce que la somme des épaisseurs de couches d'interfaces (106) et de couches diélectriques (104a) au-dessus de la couche active (108) est sensiblement égale à la somme des épaisseurs de couches d'interfaces (106) et de couches diélectriques (104b) en dessous de la couche active (108). An optical storage disk according to any one of the preceding claims, characterized in that the sum of the thicknesses of interface layers (106) and dielectric layers (104a) above the active layer (108) is substantially equal to the sum of the thicknesses of interface layers (106) and dielectric layers (104b) below the active layer (108). 7. Disque de stockage optique selon l'une quelconque des revendications précédentes, caractérisé en ce que les couches diélectriques (104a, 104b) comprennent du ZnS-SiO2. An optical storage disk according to any one of the preceding claims, characterized in that the dielectric layers (104a, 104b) comprise ZnS-SiO2.
FR0801870A 2008-04-04 2008-04-04 SUPER-RESOLUTION OPTICAL DISK WITH HIGH READING STABILITY Withdrawn FR2929747A1 (en)

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