FR2895208B1 - Procede de production de plasma par decharge capacitive associe a un plasma annexe a decharge distribuee, et systeme de mise en oeuvre associe - Google Patents

Procede de production de plasma par decharge capacitive associe a un plasma annexe a decharge distribuee, et systeme de mise en oeuvre associe

Info

Publication number
FR2895208B1
FR2895208B1 FR0512802A FR0512802A FR2895208B1 FR 2895208 B1 FR2895208 B1 FR 2895208B1 FR 0512802 A FR0512802 A FR 0512802A FR 0512802 A FR0512802 A FR 0512802A FR 2895208 B1 FR2895208 B1 FR 2895208B1
Authority
FR
France
Prior art keywords
plasma
discharge
implementing system
distributed apparatus
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0512802A
Other languages
English (en)
Other versions
FR2895208A1 (fr
Inventor
Thierry Leon Lagarde
Romaric Corbin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
H.E.F., FR
Original Assignee
Metal Process SARL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metal Process SARL filed Critical Metal Process SARL
Priority to FR0512802A priority Critical patent/FR2895208B1/fr
Publication of FR2895208A1 publication Critical patent/FR2895208A1/fr
Application granted granted Critical
Publication of FR2895208B1 publication Critical patent/FR2895208B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32091Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3266Magnetic control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3266Magnetic control means
    • H01J37/32678Electron cyclotron resonance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405Magnetron sputtering
    • H01J37/3408Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
FR0512802A 2005-12-16 2005-12-16 Procede de production de plasma par decharge capacitive associe a un plasma annexe a decharge distribuee, et systeme de mise en oeuvre associe Active FR2895208B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0512802A FR2895208B1 (fr) 2005-12-16 2005-12-16 Procede de production de plasma par decharge capacitive associe a un plasma annexe a decharge distribuee, et systeme de mise en oeuvre associe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0512802A FR2895208B1 (fr) 2005-12-16 2005-12-16 Procede de production de plasma par decharge capacitive associe a un plasma annexe a decharge distribuee, et systeme de mise en oeuvre associe

Publications (2)

Publication Number Publication Date
FR2895208A1 FR2895208A1 (fr) 2007-06-22
FR2895208B1 true FR2895208B1 (fr) 2008-06-27

Family

ID=36794410

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0512802A Active FR2895208B1 (fr) 2005-12-16 2005-12-16 Procede de production de plasma par decharge capacitive associe a un plasma annexe a decharge distribuee, et systeme de mise en oeuvre associe

Country Status (1)

Country Link
FR (1) FR2895208B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2922358B1 (fr) * 2007-10-16 2013-02-01 Hydromecanique & Frottement Procede de traitement de surface d'au moins une piece au moyen de sources elementaires de plasma par resonance cyclotronique electronique

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144133A (ja) * 1983-02-07 1984-08-18 Hitachi Ltd プラズマドライ処理装置
US5496455A (en) * 1993-09-16 1996-03-05 Applied Material Sputtering using a plasma-shaping magnet ring
US5659276A (en) * 1995-07-12 1997-08-19 Shin-Etsu Chemical Co., Ltd. Magnetic field generator for magnetron plasma
FR2797372B1 (fr) * 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
US7467598B2 (en) * 2001-04-09 2008-12-23 Tegal Corporation System for, and method of, etching a surface on a wafer
JP3729769B2 (ja) * 2001-10-11 2005-12-21 東京エレクトロン株式会社 プラズマ処理装置

Also Published As

Publication number Publication date
FR2895208A1 (fr) 2007-06-22

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TP Transmission of property
CD Change of name or company name

Owner name: BOREAL PLASMAS, FR

Effective date: 20110916

TP Transmission of property

Owner name: H.E.F., FR

Effective date: 20120515

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