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FR2893429B1 - Device and method for immersion lithography - Google Patents

Device and method for immersion lithography

Info

Publication number
FR2893429B1
FR2893429B1 FR0511665A FR0511665A FR2893429B1 FR 2893429 B1 FR2893429 B1 FR 2893429B1 FR 0511665 A FR0511665 A FR 0511665A FR 0511665 A FR0511665 A FR 0511665A FR 2893429 B1 FR2893429 B1 FR 2893429B1
Authority
FR
France
Prior art keywords
device
method
immersion lithography
lithography
immersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0511665A
Other languages
French (fr)
Other versions
FR2893429A1 (en
Inventor
Tsai Sheng Gau
Chun Kuang Chen
Ru Gun Liu
Burn Jeng Lin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiwan Semiconductor Manufacturing Co (TSMC) Ltd
Original Assignee
Taiwan Semiconductor Manufacturing Co (TSMC) Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Manufacturing Co (TSMC) Ltd filed Critical Taiwan Semiconductor Manufacturing Co (TSMC) Ltd
Priority to FR0511665A priority Critical patent/FR2893429B1/en
Publication of FR2893429A1 publication Critical patent/FR2893429A1/en
Application granted granted Critical
Publication of FR2893429B1 publication Critical patent/FR2893429B1/en
Application status is Active legal-status Critical
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
FR0511665A 2005-11-17 2005-11-17 Device and method for immersion lithography Active FR2893429B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0511665A FR2893429B1 (en) 2005-11-17 2005-11-17 Device and method for immersion lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0511665A FR2893429B1 (en) 2005-11-17 2005-11-17 Device and method for immersion lithography

Publications (2)

Publication Number Publication Date
FR2893429A1 FR2893429A1 (en) 2007-05-18
FR2893429B1 true FR2893429B1 (en) 2009-05-08

Family

ID=36582016

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0511665A Active FR2893429B1 (en) 2005-11-17 2005-11-17 Device and method for immersion lithography

Country Status (1)

Country Link
FR (1) FR2893429B1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4582089B2 (en) * 2003-04-11 2010-11-17 株式会社ニコン Liquid injection and recovery system for immersion lithography
JP4428115B2 (en) * 2003-04-11 2010-03-10 株式会社ニコン Immersion lithography system
JP3862678B2 (en) * 2003-06-27 2006-12-27 キヤノン株式会社 Exposure apparatus and device manufacturing method

Also Published As

Publication number Publication date
FR2893429A1 (en) 2007-05-18

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